CH580990A5 - - Google Patents

Info

Publication number
CH580990A5
CH580990A5 CH300074A CH300074A CH580990A5 CH 580990 A5 CH580990 A5 CH 580990A5 CH 300074 A CH300074 A CH 300074A CH 300074 A CH300074 A CH 300074A CH 580990 A5 CH580990 A5 CH 580990A5
Authority
CH
Switzerland
Application number
CH300074A
Original Assignee
Ebauches Sa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebauches Sa filed Critical Ebauches Sa
Priority to CH300074A priority Critical patent/CH580990A5/xx
Priority to DE2507953A priority patent/DE2507953C3/de
Priority to US05/554,458 priority patent/US4036171A/en
Priority to JP50026449A priority patent/JPS50121172A/ja
Publication of CH580990A5 publication Critical patent/CH580990A5/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
CH300074A 1974-03-04 1974-03-04 CH580990A5 (hr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
CH300074A CH580990A5 (hr) 1974-03-04 1974-03-04
DE2507953A DE2507953C3 (de) 1974-03-04 1975-02-25 Vorrichtung zum Aufdampfen von Schichten auf Substrate im Vakuum
US05/554,458 US4036171A (en) 1974-03-04 1975-03-03 Vacuum deposition through plural masks on plural substrates
JP50026449A JPS50121172A (hr) 1974-03-04 1975-03-04

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH300074A CH580990A5 (hr) 1974-03-04 1974-03-04

Publications (1)

Publication Number Publication Date
CH580990A5 true CH580990A5 (hr) 1976-10-29

Family

ID=4246379

Family Applications (1)

Application Number Title Priority Date Filing Date
CH300074A CH580990A5 (hr) 1974-03-04 1974-03-04

Country Status (4)

Country Link
US (1) US4036171A (hr)
JP (1) JPS50121172A (hr)
CH (1) CH580990A5 (hr)
DE (1) DE2507953C3 (hr)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2740129A1 (de) * 1976-09-18 1978-03-23 Claude John Lancelot Hunt Verfahren und vorrichtung zur metallbedampfung
DE2847632A1 (de) * 1977-11-19 1979-05-23 Claude John Lancelot Hunt Vakuummetallisierungsvorrichtung
DE2917841A1 (de) * 1979-05-03 1980-11-13 Leybold Heraeus Gmbh & Co Kg Verdampfer fuer vakuumaufdampfanlagen
WO1982000542A1 (en) * 1980-08-04 1982-02-18 Behn R Device for making superposed metal layers and micaceous polymer layers,laterally off set relative to one another
US4492180A (en) * 1981-03-16 1985-01-08 Applied Magnetics Corporation Apparatus for indexing and registering a selected deposition mask to a substrate and method therefor
US4633810A (en) * 1981-09-21 1987-01-06 Applied Magnetics Corp. Apparatus for accurately registering a first member and a second member in an interdependent relationship
US4583488A (en) * 1984-03-23 1986-04-22 International Business Machines Corporation Variable axis rotary drive vacuum deposition system
TW422743B (en) * 1999-12-09 2001-02-21 Hon Hai Prec Ind Co Ltd Masking tool for painting the case of electronic devices
JP4068377B2 (ja) * 2002-03-29 2008-03-26 株式会社ニデック 真空蒸着装置
DE10239163A1 (de) * 2002-08-23 2004-03-04 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung und Verfahren zur Ausbildung von Gradientenschichten auf Substraten in einer Vakuumkammer
US6923868B2 (en) * 2003-09-23 2005-08-02 Gba S.A. Installation for electron-ray coatication of coatings
KR101084268B1 (ko) * 2009-09-25 2011-11-16 삼성모바일디스플레이주식회사 기판 센터링 장치 및 이를 구비한 유기물 증착 시스템
US10204820B2 (en) * 2014-05-21 2019-02-12 Cost Effective Equipment Llc Multi-size adaptable spin chuck system
RU2590747C2 (ru) * 2014-11-25 2016-07-10 ОАО "Научно-исследовательский институт электронных приборов" Установка для напыления в вакууме топологического тонкоплёночного рисунка гибридной микросхемы на подложку

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2767682A (en) * 1951-03-22 1956-10-23 Syntron Co Vaporizing apparatus for producing selenium rectifiers
US2975753A (en) * 1958-11-18 1961-03-21 Nat Res Corp Vacuum coating apparatus
US3023727A (en) * 1959-09-10 1962-03-06 Ibm Substrate processing apparatus
US3117025A (en) * 1961-08-31 1964-01-07 Space Technology Lab Inc Thin filming apparatus
US3238918A (en) * 1961-12-26 1966-03-08 Lear Siegler Inc Vacuum deposition chamber for multiple operations
US3336898A (en) * 1962-11-16 1967-08-22 Burroughs Corp Vapor deposition apparatus
US3352282A (en) * 1965-07-23 1967-11-14 Bendix Corp Vacuum deposit device including means to register and manipulate mask and substrate elements
US3598083A (en) * 1969-10-27 1971-08-10 Varian Associates Complex motion mechanism for thin film coating apparatuses
US3853091A (en) * 1973-12-03 1974-12-10 Ibm Thin film coating apparatus

Also Published As

Publication number Publication date
US4036171A (en) 1977-07-19
DE2507953B2 (de) 1979-01-25
JPS50121172A (hr) 1975-09-22
DE2507953A1 (de) 1975-09-11
DE2507953C3 (de) 1979-09-13

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Legal Events

Date Code Title Description
PL Patent ceased
PL Patent ceased