CH576808A5 - - Google Patents

Info

Publication number
CH576808A5
CH576808A5 CH76173A CH76173A CH576808A5 CH 576808 A5 CH576808 A5 CH 576808A5 CH 76173 A CH76173 A CH 76173A CH 76173 A CH76173 A CH 76173A CH 576808 A5 CH576808 A5 CH 576808A5
Authority
CH
Switzerland
Application number
CH76173A
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of CH576808A5 publication Critical patent/CH576808A5/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/26—Materials of the light emitting region
    • H01L33/30—Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table
    • H01L33/305—Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table characterised by the doping materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
    • H01L21/225—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a solid phase, e.g. a doped oxide layer
    • H01L21/2258—Diffusion into or out of AIIIBV compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/049—Equivalence and options
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/056—Gallium arsenide
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/065—Gp III-V generic compounds-processing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/106—Masks, special
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/914—Doping
    • Y10S438/923—Diffusion through a layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/971—Stoichiometric control of host substrate composition

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Led Devices (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Recrystallisation Techniques (AREA)
CH76173A 1972-03-23 1973-01-19 CH576808A5 (lt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2214224A DE2214224C3 (de) 1972-03-23 1972-03-23 Verfahren zur Bildung von pn-Übergängen in III-V-Halbleiter-Einkristallen

Publications (1)

Publication Number Publication Date
CH576808A5 true CH576808A5 (lt) 1976-06-30

Family

ID=5839948

Family Applications (1)

Application Number Title Priority Date Filing Date
CH76173A CH576808A5 (lt) 1972-03-23 1973-01-19

Country Status (11)

Country Link
US (1) US3925121A (lt)
JP (1) JPS5231147B2 (lt)
AT (1) AT317316B (lt)
CA (1) CA1002433A (lt)
CH (1) CH576808A5 (lt)
DE (1) DE2214224C3 (lt)
FR (1) FR2176669B1 (lt)
GB (1) GB1388641A (lt)
IT (1) IT981579B (lt)
NL (1) NL7217305A (lt)
SE (1) SE378156B (lt)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4099997A (en) * 1976-06-21 1978-07-11 Rca Corporation Method of fabricating a semiconductor device
JPS6030204Y2 (ja) * 1981-07-29 1985-09-11 東京パ−ツ株式会社 ブラシ付蓋を有する粘性液用容器
JPS6057923A (ja) * 1983-09-09 1985-04-03 Nippon Telegr & Teleph Corp <Ntt> 化合物半導体結晶の均質化方法
US4502898A (en) * 1983-12-21 1985-03-05 At&T Bell Laboratories Diffusion procedure for semiconductor compound
US4634474A (en) * 1984-10-09 1987-01-06 At&T Bell Laboratories Coating of III-V and II-VI compound semiconductors
JPS62441U (lt) * 1985-06-20 1987-01-06
EP0377940B1 (en) * 1989-01-13 1994-11-17 Kabushiki Kaisha Toshiba Compound semiconductor material and semiconductor element using the same and method of manufacturing the semiconductor element
US6297538B1 (en) 1998-03-23 2001-10-02 The University Of Delaware Metal-insulator-semiconductor field effect transistor having an oxidized aluminum nitride gate insulator formed on a gallium nitride or silicon substrate
US7439609B2 (en) * 2004-03-29 2008-10-21 Cree, Inc. Doping of gallium nitride by solid source diffusion and resulting gallium nitride structures
US9275854B2 (en) * 2013-08-07 2016-03-01 Globalfoundries Inc. Compound semiconductor integrated circuit and method to fabricate same

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3245847A (en) * 1962-11-19 1966-04-12 Hughes Aircraft Co Method of producing stable gallium arsenide and semiconductor diodes made therefrom
US3255056A (en) * 1963-05-20 1966-06-07 Rca Corp Method of forming semiconductor junction
US3298879A (en) * 1964-03-23 1967-01-17 Rca Corp Method of fabricating a semiconductor by masking
US3408238A (en) * 1965-06-02 1968-10-29 Texas Instruments Inc Use of both silicon oxide and phosphorus oxide to mask against diffusion of indium or gallium into germanium semiconductor device
US3422322A (en) * 1965-08-25 1969-01-14 Texas Instruments Inc Drift transistor
GB1098564A (en) * 1966-09-20 1968-01-10 Standard Telephones Cables Ltd A method for producing gallium arsenide devices
US3537921A (en) * 1967-02-28 1970-11-03 Motorola Inc Selective hydrofluoric acid etching and subsequent processing
JPS4915903B1 (lt) * 1969-08-18 1974-04-18
US3660156A (en) * 1970-08-19 1972-05-02 Monsanto Co Semiconductor doping compositions

Also Published As

Publication number Publication date
DE2214224C3 (de) 1978-05-03
DE2214224B2 (de) 1977-09-08
FR2176669B1 (lt) 1977-02-25
SE378156B (lt) 1975-08-18
FR2176669A1 (lt) 1973-11-02
DE2214224A1 (de) 1973-10-04
NL7217305A (lt) 1973-09-25
JPS499184A (lt) 1974-01-26
IT981579B (it) 1974-10-10
USB339218I5 (lt) 1975-01-28
US3925121A (en) 1975-12-09
GB1388641A (en) 1975-03-26
AT317316B (de) 1974-08-26
CA1002433A (en) 1976-12-28
JPS5231147B2 (lt) 1977-08-12

Similar Documents

Publication Publication Date Title
JPS5330495B2 (lt)
FR2176669B1 (lt)
FR2178751A1 (lt)
JPS49485A (lt)
JPS5145550B2 (lt)
JPS4962855A (lt)
JPS4938040U (lt)
JPS4972035A (lt)
JPS5147662Y2 (lt)
JPS519509Y2 (lt)
JPS5442105B2 (lt)
JPS4962587U (lt)
JPS48112200U (lt)
JPS4995371U (lt)
JPS4986897A (lt)
JPS4986617A (lt)
CH589413A5 (lt)
CH569076A5 (lt)
CH561786A5 (lt)
BG18292A1 (lt)
CH594010A5 (lt)
CH593329A5 (lt)
CH591524A5 (lt)
CH591445A5 (lt)
CH590812A5 (lt)

Legal Events

Date Code Title Description
PL Patent ceased