CH574120A5 - - Google Patents

Info

Publication number
CH574120A5
CH574120A5 CH1428272A CH1428272A CH574120A5 CH 574120 A5 CH574120 A5 CH 574120A5 CH 1428272 A CH1428272 A CH 1428272A CH 1428272 A CH1428272 A CH 1428272A CH 574120 A5 CH574120 A5 CH 574120A5
Authority
CH
Switzerland
Application number
CH1428272A
Original Assignee
Basf Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Ag filed Critical Basf Ag
Publication of CH574120A5 publication Critical patent/CH574120A5/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68Preparation processes not covered by groups G03F1/20 - G03F1/50

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
CH1428272A 1971-10-01 1972-09-29 CH574120A5 (cg-RX-API-DMAC10.html)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19712149055 DE2149055A1 (de) 1971-10-01 1971-10-01 Verfahren zur herstellung von druckplatten

Publications (1)

Publication Number Publication Date
CH574120A5 true CH574120A5 (cg-RX-API-DMAC10.html) 1976-03-31

Family

ID=5821187

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1428272A CH574120A5 (cg-RX-API-DMAC10.html) 1971-10-01 1972-09-29

Country Status (8)

Country Link
US (1) US3836368A (cg-RX-API-DMAC10.html)
JP (1) JPS4842801A (cg-RX-API-DMAC10.html)
BE (1) BE789476A (cg-RX-API-DMAC10.html)
CH (1) CH574120A5 (cg-RX-API-DMAC10.html)
DE (1) DE2149055A1 (cg-RX-API-DMAC10.html)
FR (1) FR2156677B3 (cg-RX-API-DMAC10.html)
GB (1) GB1401790A (cg-RX-API-DMAC10.html)
NL (1) NL7213246A (cg-RX-API-DMAC10.html)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4123272A (en) * 1977-05-17 1978-10-31 E. I. Du Pont De Nemours And Company Double-negative positive-working photohardenable elements
US4782006A (en) * 1985-12-16 1988-11-01 Canon Kabushiki Kaisha Optical recording employing diacetylene compound and dye to form and visualize a latent image
US5672465A (en) * 1990-04-09 1997-09-30 Jp Laboratories, Inc. Polyethyleneimine binder complex films
US5420000A (en) * 1990-04-09 1995-05-30 Jp Laboratories, Inc. Heat fixable high energy radiation imaging film
US5139928A (en) * 1990-10-23 1992-08-18 Isp Investments Inc. Imageable recording films
US5731112A (en) * 1996-05-23 1998-03-24 Isp Investments Inc. Processless diacetylenic salt films capable of developing a black image
JPH10272750A (ja) * 1997-03-28 1998-10-13 Brother Ind Ltd 製版用原稿シートの製造方法
DE10028790A1 (de) * 2000-06-15 2001-12-20 Heidelberg Instruments Mikrotechnik Gmbh Verfahren zum lithographischen Belichten von Leiterplattensubstraten
US20120282552A1 (en) * 2011-05-04 2012-11-08 Eynat Matzner Method for offset imaging
US9797771B2 (en) 2013-03-21 2017-10-24 Isp Investments Inc. Diacetylene film sensitized with photoinitiator and applications of the film
US10782613B2 (en) 2018-04-19 2020-09-22 International Business Machines Corporation Polymerizable self-assembled monolayers for use in atomic layer deposition

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL101499C (cg-RX-API-DMAC10.html) * 1951-08-20
US3451816A (en) * 1965-06-16 1969-06-24 American Cyanamid Co Photographic dodging method
US3442648A (en) * 1965-06-16 1969-05-06 American Cyanamid Co Photographic dodging method
US3501302A (en) * 1966-06-06 1970-03-17 Battelle Development Corp Photosensitive polyacetylenic system and method of exposure
US3501308A (en) * 1966-07-01 1970-03-17 Battelle Development Corp Photosensitive crystalline polyacetylenic sensitized with a pi-acid
US3723121A (en) * 1970-11-03 1973-03-27 Du Pont Process for recording images with laser beams

Also Published As

Publication number Publication date
DE2149055A1 (de) 1973-04-05
JPS4842801A (cg-RX-API-DMAC10.html) 1973-06-21
FR2156677B3 (cg-RX-API-DMAC10.html) 1975-10-17
FR2156677A1 (cg-RX-API-DMAC10.html) 1973-06-01
NL7213246A (cg-RX-API-DMAC10.html) 1973-04-03
GB1401790A (en) 1975-07-30
BE789476A (fr) 1973-03-29
US3836368A (en) 1974-09-17

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Legal Events

Date Code Title Description
PL Patent ceased
PL Patent ceased