CH542439A - Verfahren zur kontinuierlichen, fotometrischen Messung - Google Patents
Verfahren zur kontinuierlichen, fotometrischen MessungInfo
- Publication number
- CH542439A CH542439A CH854072A CH854072A CH542439A CH 542439 A CH542439 A CH 542439A CH 854072 A CH854072 A CH 854072A CH 854072 A CH854072 A CH 854072A CH 542439 A CH542439 A CH 542439A
- Authority
- CH
- Switzerland
- Prior art keywords
- continuous
- photometric measurement
- photometric
- measurement
- Prior art date
Links
- 238000000034 method Methods 0.000 title 1
- 238000005375 photometry Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/10—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void
- G01J1/20—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void intensity of the measured or reference value being varied to equalise their effects at the detectors, e.g. by varying incidence angle
- G01J1/28—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void intensity of the measured or reference value being varied to equalise their effects at the detectors, e.g. by varying incidence angle using variation of intensity or distance of source
- G01J1/30—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void intensity of the measured or reference value being varied to equalise their effects at the detectors, e.g. by varying incidence angle using variation of intensity or distance of source using electric radiation detectors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
- G01N21/49—Scattering, i.e. diffuse reflection within a body or fluid
- G01N21/53—Scattering, i.e. diffuse reflection within a body or fluid within a flowing fluid, e.g. smoke
- G01N21/532—Scattering, i.e. diffuse reflection within a body or fluid within a flowing fluid, e.g. smoke with measurement of scattering and transmission
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19712138519 DE2138519C3 (de) | 1971-08-02 | 1971-08-02 | Vorrichtung zur kontinuierlichen, fotometrischen Messung |
Publications (1)
Publication Number | Publication Date |
---|---|
CH542439A true CH542439A (de) | 1973-09-30 |
Family
ID=5815496
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CH854072A CH542439A (de) | 1971-08-02 | 1972-06-08 | Verfahren zur kontinuierlichen, fotometrischen Messung |
Country Status (4)
Country | Link |
---|---|
CH (1) | CH542439A (de) |
DE (1) | DE2138519C3 (de) |
FR (1) | FR2148030A1 (de) |
NL (1) | NL7209415A (de) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4199260A (en) * | 1978-08-21 | 1980-04-22 | Technicon Instruments Corporation | Apparatus and method for determining the concentration in a sample |
DE3005923A1 (de) * | 1980-02-16 | 1981-09-03 | Compur-Electronic GmbH, 8000 München | Photometrisches verfahren und photometrische vorrichtung zur bestimmung von reaktionsablaeufen |
JPS59100862A (ja) * | 1982-12-01 | 1984-06-11 | Hitachi Ltd | 自動分析装置 |
DE3838820A1 (de) * | 1988-11-17 | 1990-05-23 | Gerhard Lorenz | Abgleich des mess- und vergleichlichtstrahles bei lichtelektrischen photometern |
-
1971
- 1971-08-02 DE DE19712138519 patent/DE2138519C3/de not_active Expired
-
1972
- 1972-06-08 CH CH854072A patent/CH542439A/de not_active IP Right Cessation
- 1972-07-06 NL NL7209415A patent/NL7209415A/xx unknown
- 1972-07-26 FR FR7226826A patent/FR2148030A1/fr not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
DE2138519B2 (de) | 1974-01-24 |
NL7209415A (de) | 1973-02-06 |
FR2148030A1 (de) | 1973-03-11 |
DE2138519C3 (de) | 1975-03-20 |
DE2138519A1 (de) | 1973-02-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PL | Patent ceased |