CH542286A - Sulfuric acid galvanic bath for depositing crack-free and thick rhodium layers - Google Patents

Sulfuric acid galvanic bath for depositing crack-free and thick rhodium layers

Info

Publication number
CH542286A
CH542286A CH503270A CH503270A CH542286A CH 542286 A CH542286 A CH 542286A CH 503270 A CH503270 A CH 503270A CH 503270 A CH503270 A CH 503270A CH 542286 A CH542286 A CH 542286A
Authority
CH
Switzerland
Prior art keywords
crack
depositing
free
sulfuric acid
galvanic bath
Prior art date
Application number
CH503270A
Other languages
German (de)
Inventor
Kreuter Erika
Wolfgang Dipl Chem Zilske
Original Assignee
Degussa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Degussa filed Critical Degussa
Publication of CH542286A publication Critical patent/CH542286A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Chemically Coating (AREA)
  • Electrolytic Production Of Metals (AREA)
CH503270A 1969-05-02 1970-04-06 Sulfuric acid galvanic bath for depositing crack-free and thick rhodium layers CH542286A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE1922421A DE1922421C3 (en) 1969-05-02 1969-05-02 Galvanic bath for the deposition of crack-free and thick rhodium layers

Publications (1)

Publication Number Publication Date
CH542286A true CH542286A (en) 1973-09-30

Family

ID=5733057

Family Applications (1)

Application Number Title Priority Date Filing Date
CH503270A CH542286A (en) 1969-05-02 1970-04-06 Sulfuric acid galvanic bath for depositing crack-free and thick rhodium layers

Country Status (6)

Country Link
AT (1) AT293811B (en)
CH (1) CH542286A (en)
DE (1) DE1922421C3 (en)
ES (1) ES378675A1 (en)
FR (1) FR2030835A5 (en)
GB (1) GB1244720A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1244025B (en) * 1966-05-14 1967-07-06 Walfried Dost Dipl Ing Sound emitter with housing
US4789437A (en) * 1986-07-11 1988-12-06 University Of Hong Kong Pulse electroplating process
US5522932A (en) * 1993-05-14 1996-06-04 Applied Materials, Inc. Corrosion-resistant apparatus
US5891253A (en) * 1993-05-14 1999-04-06 Applied Materials, Inc. Corrosion resistant apparatus

Also Published As

Publication number Publication date
AT293811B (en) 1971-10-25
DE1922421B2 (en) 1972-06-15
DE1922421C3 (en) 1974-04-04
DE1922421A1 (en) 1970-11-05
FR2030835A5 (en) 1970-11-13
GB1244720A (en) 1971-09-02
ES378675A1 (en) 1972-07-16

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Legal Events

Date Code Title Description
PL Patent ceased