CH537096A - Appareil de masquage optique d'une couche photosensible - Google Patents
Appareil de masquage optique d'une couche photosensibleInfo
- Publication number
- CH537096A CH537096A CH1275771A CH1275771A CH537096A CH 537096 A CH537096 A CH 537096A CH 1275771 A CH1275771 A CH 1275771A CH 1275771 A CH1275771 A CH 1275771A CH 537096 A CH537096 A CH 537096A
- Authority
- CH
- Switzerland
- Prior art keywords
- objective
- semi
- objectives
- mask
- optical masking
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 title claims description 45
- 230000000873 masking effect Effects 0.000 title claims description 18
- 230000005855 radiation Effects 0.000 claims description 14
- 239000012528 membrane Substances 0.000 claims description 4
- 239000004065 semiconductor Substances 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 3
- 230000001678 irradiating effect Effects 0.000 claims 1
- 230000004304 visual acuity Effects 0.000 description 13
- 239000011347 resin Substances 0.000 description 7
- 229920005989 resin Polymers 0.000 description 7
- 230000004075 alteration Effects 0.000 description 6
- 230000008901 benefit Effects 0.000 description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910044991 metal oxide Inorganic materials 0.000 description 3
- 150000004706 metal oxides Chemical class 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 201000009310 astigmatism Diseases 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 230000003071 parasitic effect Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000002775 capsule Substances 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7110838A FR2130955A6 (enExample) | 1971-03-26 | 1971-03-26 | |
| FR7126053A FR2146512A6 (enExample) | 1971-07-16 | 1971-07-16 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH537096A true CH537096A (fr) | 1973-05-15 |
Family
ID=26216288
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH1275771A CH537096A (fr) | 1971-03-26 | 1971-08-31 | Appareil de masquage optique d'une couche photosensible |
Country Status (5)
| Country | Link |
|---|---|
| BE (1) | BE772057A (enExample) |
| CH (1) | CH537096A (enExample) |
| DD (1) | DD94438A5 (enExample) |
| IT (1) | IT939372B (enExample) |
| NL (1) | NL7112018A (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AT406100B (de) * | 1996-08-08 | 2000-02-25 | Thallner Erich | Kontaktbelichtungsverfahren zur herstellung von halbleiterbausteinen |
-
1971
- 1971-08-31 CH CH1275771A patent/CH537096A/fr not_active IP Right Cessation
- 1971-09-01 NL NL7112018A patent/NL7112018A/xx unknown
- 1971-09-01 BE BE772057A patent/BE772057A/xx unknown
- 1971-09-03 IT IT5265471A patent/IT939372B/it active
- 1971-09-03 DD DD15752971A patent/DD94438A5/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| DD94438A5 (enExample) | 1972-12-12 |
| NL7112018A (enExample) | 1972-09-28 |
| IT939372B (it) | 1973-02-10 |
| BE772057A (fr) | 1972-01-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| FR2482285A1 (fr) | Procede et dispositif d'alignement d'un masque et d'une tranche notamment pour la fabrication de circuits integres | |
| TWI337255B (en) | Inspection apparatus, lithographic system provided with the inspection apparatus and a method for inspecting a sample | |
| US6819423B2 (en) | High spatial resolution infrared ellipsometer | |
| TWI646401B (zh) | 帶有簡化光學元件的極紫外線（ｅｕｖ）基板檢查系統及其製造方法 | |
| US3698808A (en) | Optical masking device | |
| EP0401351B1 (fr) | Procede et dispositif de mesure optique | |
| CN101715539B (zh) | 单偏振器聚焦光束椭偏计 | |
| EP3938766B1 (en) | Strontium tetraborate as optical coating material | |
| EP0015173A1 (fr) | Système optique d'alignement de deux motifs et photorépéteur utilisant un tel système | |
| WO1991005218A1 (en) | Correlation microscope | |
| US7957058B2 (en) | Microscope | |
| US5864139A (en) | Confocal microspectrometer system | |
| FR2760085A1 (fr) | Dispositif et procede de mesures tridimensionnelles et d'observation in situ d'une couche superficielle deposee sur un empilement de couches minces | |
| EP0156683B1 (fr) | Appareil de microlithographie optique à système d'alignement local | |
| EP0030878A1 (fr) | Système optique d'alignement de deux motifs et photorépéteur mettant en oeuvre un tel système | |
| CH537096A (fr) | Appareil de masquage optique d'une couche photosensible | |
| EP0502752B1 (fr) | Appareil de spectrométrie | |
| EP1972983B1 (fr) | Dispositif d`imagerie à balayage pour microscopie confocale à soustraction d`images | |
| CH656723A5 (fr) | Microscope speculaire. | |
| JPH05340869A (ja) | 薄膜測定器 | |
| JP2018204957A (ja) | 光学部材の光学特性測定装置 | |
| EP0088691B1 (fr) | Dispositif d'alignement pour machines de fabrication de circuits intégrés | |
| FR2816714A1 (fr) | Procede et dispositif de depot de couches minces | |
| EP1770426B1 (fr) | Ensemble modifiable de trous microscopiques | |
| WO2025014705A1 (en) | Sample thickness metrology using focused beam interference |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PL | Patent ceased |