CH527209A - Anti-inflammatory analgesic antipyretic oxazole - Google Patents
Anti-inflammatory analgesic antipyretic oxazoleInfo
- Publication number
- CH527209A CH527209A CH1868171A CH1868171A CH527209A CH 527209 A CH527209 A CH 527209A CH 1868171 A CH1868171 A CH 1868171A CH 1868171 A CH1868171 A CH 1868171A CH 527209 A CH527209 A CH 527209A
- Authority
- CH
- Switzerland
- Prior art keywords
- oxazole
- phenyl
- chlorophenyl
- alkyl
- radical
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D263/00—Heterocyclic compounds containing 1,3-oxazole or hydrogenated 1,3-oxazole rings
- C07D263/02—Heterocyclic compounds containing 1,3-oxazole or hydrogenated 1,3-oxazole rings not condensed with other rings
- C07D263/30—Heterocyclic compounds containing 1,3-oxazole or hydrogenated 1,3-oxazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
- C07D263/34—Heterocyclic compounds containing 1,3-oxazole or hydrogenated 1,3-oxazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K31/00—Medicinal preparations containing organic active ingredients
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D263/00—Heterocyclic compounds containing 1,3-oxazole or hydrogenated 1,3-oxazole rings
- C07D263/02—Heterocyclic compounds containing 1,3-oxazole or hydrogenated 1,3-oxazole rings not condensed with other rings
- C07D263/30—Heterocyclic compounds containing 1,3-oxazole or hydrogenated 1,3-oxazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
- C07D263/32—Heterocyclic compounds containing 1,3-oxazole or hydrogenated 1,3-oxazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/04—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in markedly acid liquids
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
- C23G1/04—Cleaning or pickling metallic material with solutions or molten salts with acid solutions using inhibitors
- C23G1/06—Cleaning or pickling metallic material with solutions or molten salts with acid solutions using inhibitors organic inhibitors
- C23G1/068—Cleaning or pickling metallic material with solutions or molten salts with acid solutions using inhibitors organic inhibitors compounds containing a C=C bond
Abstract
Oxazole derivatives - (I) Y = phenyl-, benzyl- which may be subst. by up to 2 hal- or CF3 - Z = -CR1R2R3 - R1 = H-, C1-3 alkyl- - R2 = H-, C1-3 alkyl-, C2-6 alkoxycarbonyl- - R3 = CO2R4 or -CONHR5 - R4 = H-, alkyl-, dialkylaminoalkyl-, benzyl-, phenyl-, R5 = H-, -OH, -NH2, dialkylaminoalkyl-, alkoxycarbonylalkyl-, carboxyalkyl-particularly aluminium 2-(4-chlorophenyl) oxazol-4-acetate. - Anti-inflammatory, analgesic, antipyretic. - A mixture of 2(4-chlorophenyl)-4-cyanomethyl-oxazole, dry ethanol and conc. H2SO4 is heated for 10 hours at 100 deg.C. The solution is poured into ice-water and the mixture filtered to yield solid ethyl 2-(4-chlorophenyl)oxazol-4-yl acetate.
Description
Verfahren zur Herstellung von Oxazolyl-alkancarbonsäureamiden Die Erfindung betrifft ein Verfahren zur Herstellung von neuen Oxazolyl-alkancarbonsäureamiden mit ent zündungshemmenden, schmerzstillen und antipyretischen Eigenschaften.
Gemäss der Erfindung werden Oxazolyl-alkancarbon- säeuramide der Formel
EMI0001.0002
und ihre Salze hergestellt, in welcher Y einen Phenyl- oder Benzyrest, die im Benzolring gegebenenfalls durch ein oder zwei Halogenatome oder den Trifluormethyl- rest substituiert sind, und R1 und R2, die einander gleich oder voneinander verschieden sein können, Wasserstoff oder einen Alkylrest mit höchstens 3 Kohlenstoffatomen bedeuten.
Der Oxazolkern wird wie folgt numeriert:
EMI0001.0007
Es ist aus der obigen Formel ohne weiteres ersichtlich, dass die Gruppe -CR1R1-CONH2 in der 4-Stellung steht, wenn Y in der 2-Stellung steht, und in der 2-Stellung, wenn Y in der 4-Stellung steht.
Die in Y gegebenenfalls vorhandenen Substituenten können z.B. aus Fluor-, Chlor- und Bromatomen gewählt werden. Stellt R1 oder R2 ein Alkylradikal mit höch stens 3 C-Atomen dar, so kann dieses z.B. das Methyl radikal sein. Als Beispiele von Salzen kann man pharmazeutisch zulässige Säureadditionssalze, z.B. Hydrochloride, Hy- drobromide, Sulfate oder Phosphate, erwähnen.
Das erfindungsgemässe Verfahren besteht darin, dass man eine Verbindung der Formel
EMI0001.0011
in welcher Y, R1 und R2 die obige Bedeutung besitzen, hydrolysiert.
Die Hydrolyse des Nitrils kann mittels einer Säure, wie einer anorganischen Säure, z.B. Schwefelsäure, durchgeführt werden.
Die Verfahrensprodukte können nach an sich be kannten Methoden in pharmazeutisch zulässige Säure additionssalze übergeführt werden.
Die Erfindung wird im folgenden anhand von Aus führungsbeispielen näher erläutert, wobei die Mengen angaben auf das Gewicht bezogen sind.
<I>Beispiel 1</I> Eine Lösung von 1 Teil 2-(4-Chlorphenyl)-4-cyano- methyloxazol in 8 Teilen konzentrierter Schwefelsäure wird 4 Stunden auf Umgebungstemperatur gehalten. Die Lösung wird dann in 50 Teile Wasser eingegossen, und die entstehende Mischung wird filtriert. Der feste Rück stand wird aus wässerigem Methanol umkristallisiert. Somit erhält man 2-(4-Chlorphenyl)-oxazol-4-ylacetamid, Smp. 193 - 1941>C.
Auf gleiche Weise erhält man 2-Phenyloxazol-4-yl- acetamid, Smp. 184 - 185 C, aus 4-Cyanomethyl-2-phe- nyloxazol. <I>Beispiel 2</I> Bei Wiederholung des Verfahrens gemäss Beispiel 1 mit 2-(3-Chlorphenyl)-4-cyanomethyloxazol als Aus gangsstoff erhält man 2-(3-Chlorphenyl)-oxazol-4-ylacet- amid, Smp. 175 - 177 C.
Process for the production of oxazolylalkanecarboxamides The invention relates to a process for the production of new oxazolylalkanecarboxamides with anti-inflammatory, analgesic and antipyretic properties.
According to the invention, oxazolyl-alkanecarboxylic acid amides of the formula
EMI0001.0002
and their salts are prepared in which Y is a phenyl or benzy radical, which is optionally substituted in the benzene ring by one or two halogen atoms or the trifluoromethyl radical, and R1 and R2, which can be the same or different, are hydrogen or an alkyl radical mean at most 3 carbon atoms.
The oxazole nucleus is numbered as follows:
EMI0001.0007
It is readily apparent from the above formula that the group -CR1R1-CONH2 is in the 4-position when Y is in the 2-position and in the 2-position when Y is in the 4-position.
The substituents optionally present in Y can e.g. can be selected from fluorine, chlorine and bromine atoms. If R1 or R2 represents an alkyl radical with a maximum of 3 carbon atoms, this can e.g. the methyl will be radical. As examples of salts there can be used pharmaceutically acceptable acid addition salts, e.g. Mention hydrochlorides, hydrobromides, sulfates or phosphates.
The inventive method consists in that one compound of the formula
EMI0001.0011
in which Y, R1 and R2 have the above meaning, hydrolyzed.
The hydrolysis of the nitrile can be carried out by means of an acid such as an inorganic acid, e.g. Sulfuric acid.
The products of the process can be converted into pharmaceutically acceptable acid addition salts by methods known per se.
The invention is explained in more detail below with reference to exemplary embodiments from, the amounts given being based on weight.
<I> Example 1 </I> A solution of 1 part 2- (4-chlorophenyl) -4-cyano-methyloxazole in 8 parts concentrated sulfuric acid is kept at ambient temperature for 4 hours. The solution is then poured into 50 parts of water and the resulting mixture is filtered. The solid residue is recrystallized from aqueous methanol. This gives 2- (4-chlorophenyl) oxazol-4-ylacetamide, m.p. 193-1941> C.
2-Phenyloxazol-4-yl-acetamide, melting point 184-185 ° C., is obtained in the same way from 4-cyanomethyl-2-phenyloxazole. <I> Example 2 </I> When the process according to Example 1 is repeated with 2- (3-chlorophenyl) -4-cyanomethyloxazole as the starting material, 2- (3-chlorophenyl) -oxazol-4-ylacetamide, m.p. . 175 - 177 C.
Claims (1)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US504056A US3401120A (en) | 1965-10-23 | 1965-10-23 | Corrosion inhibitors |
GB4378666A GB1139940A (en) | 1966-09-30 | 1966-09-30 | Oxazole derivatives |
CH1361967A CH507974A (en) | 1965-10-23 | 1967-09-29 | Anti-inflammatory analgesic antipyretic oxazole |
CH416070A CH526574A (en) | 1965-10-23 | 1967-09-29 | Process for the preparation of oxazolylalkanecarboxamides |
Publications (1)
Publication Number | Publication Date |
---|---|
CH527209A true CH527209A (en) | 1972-08-31 |
Family
ID=27428746
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CH1868171A CH527209A (en) | 1965-10-23 | 1967-09-29 | Anti-inflammatory analgesic antipyretic oxazole |
Country Status (1)
Country | Link |
---|---|
CH (1) | CH527209A (en) |
-
1967
- 1967-09-29 CH CH1868171A patent/CH527209A/en not_active IP Right Cessation
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Legal Events
Date | Code | Title | Description |
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PL | Patent ceased |