CH520957A - Method of making a bimetallic planographic printing plate - Google Patents

Method of making a bimetallic planographic printing plate

Info

Publication number
CH520957A
CH520957A CH1379268A CH1379268A CH520957A CH 520957 A CH520957 A CH 520957A CH 1379268 A CH1379268 A CH 1379268A CH 1379268 A CH1379268 A CH 1379268A CH 520957 A CH520957 A CH 520957A
Authority
CH
Switzerland
Prior art keywords
bimetallic
making
printing plate
planographic printing
planographic
Prior art date
Application number
CH1379268A
Other languages
German (de)
Inventor
Seth Burnett Leo
William West Fred
John Radimer Kenneth
Original Assignee
Fmc Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fmc Corp filed Critical Fmc Corp
Publication of CH520957A publication Critical patent/CH520957A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
CH1379268A 1967-09-18 1968-09-16 Method of making a bimetallic planographic printing plate CH520957A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US66864867A 1967-09-18 1967-09-18

Publications (1)

Publication Number Publication Date
CH520957A true CH520957A (en) 1972-03-31

Family

ID=24683196

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1379268A CH520957A (en) 1967-09-18 1968-09-16 Method of making a bimetallic planographic printing plate

Country Status (8)

Country Link
AT (1) AT287742B (en)
BE (1) BE720748A (en)
CH (1) CH520957A (en)
DE (1) DE1797352A1 (en)
ES (1) ES358264A1 (en)
FR (1) FR1597523A (en)
GB (1) GB1217719A (en)
NL (1) NL6813382A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004004865B4 (en) * 2004-01-30 2008-01-10 Qimonda Ag Antireflective layer coated with a photoresist containing cinnamic acid-based polymers for 157 nm photolithography

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004004865B4 (en) * 2004-01-30 2008-01-10 Qimonda Ag Antireflective layer coated with a photoresist containing cinnamic acid-based polymers for 157 nm photolithography
US7405028B2 (en) 2004-01-30 2008-07-29 Infineon Technologies, Ag Polymers based on cinnamic acid as a bottom antireflective coating for 157 NM photolithography

Also Published As

Publication number Publication date
FR1597523A (en) 1970-06-29
BE720748A (en) 1969-03-12
GB1217719A (en) 1970-12-31
DE1797352A1 (en) 1971-03-18
AT287742B (en) 1971-02-10
NL6813382A (en) 1969-03-20
ES358264A1 (en) 1970-04-01

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Legal Events

Date Code Title Description
PL Patent ceased