CH510744A - Device for displaying the layer thickness of a substance deposited in electrolytic baths - Google Patents

Device for displaying the layer thickness of a substance deposited in electrolytic baths

Info

Publication number
CH510744A
CH510744A CH835370A CH835370A CH510744A CH 510744 A CH510744 A CH 510744A CH 835370 A CH835370 A CH 835370A CH 835370 A CH835370 A CH 835370A CH 510744 A CH510744 A CH 510744A
Authority
CH
Switzerland
Prior art keywords
displaying
layer thickness
substance deposited
electrolytic baths
baths
Prior art date
Application number
CH835370A
Other languages
German (de)
Inventor
Lieber Hans-Wilhelm Ing Dr
Krames Rolf
Original Assignee
Oelsch Fernsteuergeraete
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oelsch Fernsteuergeraete filed Critical Oelsch Fernsteuergeraete
Publication of CH510744A publication Critical patent/CH510744A/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
    • G01B7/02—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness
    • G01B7/06—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
CH835370A 1969-08-01 1970-06-04 Device for displaying the layer thickness of a substance deposited in electrolytic baths CH510744A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19691939125 DE1939125B2 (en) 1969-08-01 1969-08-01 DEVICE FOR DISPLAYING THE THICKNESS OF A SUBSTANCE DEPOSITED IN AN ELECTROLYTIC BATH

Publications (1)

Publication Number Publication Date
CH510744A true CH510744A (en) 1971-07-31

Family

ID=5741583

Family Applications (1)

Application Number Title Priority Date Filing Date
CH835370A CH510744A (en) 1969-08-01 1970-06-04 Device for displaying the layer thickness of a substance deposited in electrolytic baths

Country Status (5)

Country Link
US (1) US3669868A (en)
CH (1) CH510744A (en)
DE (1) DE1939125B2 (en)
FR (1) FR2057701A5 (en)
GB (1) GB1295121A (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2936247A1 (en) * 1979-09-07 1981-03-19 Siemens AG, 1000 Berlin und 8000 München DEVICE FOR THE GALVANIC DEPOSITION OF A METAL LAYER WITH A PREFERRED LAYER THICKNESS
US4495558A (en) * 1982-06-25 1985-01-22 General Electric Company Method and apparatus for determining oxide film thickness
US4479980A (en) * 1983-12-16 1984-10-30 International Business Machines Corporation Plating rate monitor
US4755744A (en) * 1986-01-21 1988-07-05 Rohrback Corporation Plated sensor for monitoring corrosion or electroplating
FR2609333B1 (en) * 1987-01-06 1991-07-19 Pechiney Aluminium DEVICE FOR MONITORING THE CONTINUITY OF A METAL COATING ON A METAL WIRE OF DIFFERENT NATURE
US4882537A (en) * 1988-05-09 1989-11-21 Rohrback Cosasco Systems, Inc. Method and apparatus for reducing interference in an electrical resistance probe during electrolytic plating
US5059908A (en) * 1990-05-31 1991-10-22 Capital Controls Company, Inc. Amperimetric measurement with cell electrode deplating
JP2000232078A (en) * 1999-02-10 2000-08-22 Toshiba Corp Plating method and apparatus

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1527095A (en) * 1923-10-12 1925-02-17 Lawrence C Turnock Method and apparatus for coating
US1712284A (en) * 1925-12-17 1929-05-07 Lawrence C Turnock Method and apparatus for electrodeposition
US2657177A (en) * 1950-07-10 1953-10-27 United States Steel Corp Plating thickness regulator
US3081194A (en) * 1959-08-07 1963-03-12 Gen Motors Corp Plating thickness indicating apparatus and method
US3365379A (en) * 1965-04-13 1968-01-23 Lockheed Aircraft Corp Method and apparatus for controlling the anodization of film resistors

Also Published As

Publication number Publication date
DE1939125B2 (en) 1972-02-24
US3669868A (en) 1972-06-13
DE1939125A1 (en) 1970-11-12
GB1295121A (en) 1972-11-01
FR2057701A5 (en) 1971-05-21

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Legal Events

Date Code Title Description
PL Patent ceased