CH505208A - Process for the electrolytic deposition of ruthenium - Google Patents

Process for the electrolytic deposition of ruthenium

Info

Publication number
CH505208A
CH505208A CH1464270A CH1464270A CH505208A CH 505208 A CH505208 A CH 505208A CH 1464270 A CH1464270 A CH 1464270A CH 1464270 A CH1464270 A CH 1464270A CH 505208 A CH505208 A CH 505208A
Authority
CH
Switzerland
Prior art keywords
ruthenium
electrolytic deposition
electrolytic
deposition
Prior art date
Application number
CH1464270A
Other languages
French (fr)
Inventor
Satyanarayan Reddy Gadhireddy
Taimsalu Parn
Original Assignee
Int Nickel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Int Nickel Ltd filed Critical Int Nickel Ltd
Publication of CH505208A publication Critical patent/CH505208A/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00Nitrogen; Compounds thereof
    • C01B21/082Compounds containing nitrogen and non-metals and optionally metals
    • C01B21/083Compounds containing nitrogen and non-metals and optionally metals containing one or more halogen atoms
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01GCOMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G55/00Compounds of ruthenium, rhodium, palladium, osmium, iridium, or platinum
    • C01G55/002Compounds containing, besides ruthenium, rhodium, palladium, osmium, iridium, or platinum, two or more other elements, with the exception of oxygen or hydrogen
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/50Electroplating: Baths therefor from solutions of platinum group metals
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00Crystal-structural characteristics
    • C01P2002/70Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • C01P2002/72Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00Crystal-structural characteristics
    • C01P2002/70Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • C01P2002/74Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by peak-intensities or a ratio thereof only
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00Crystal-structural characteristics
    • C01P2002/80Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
    • C01P2002/82Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by IR- or Raman-data
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/80Particles consisting of a mixture of two or more inorganic phases
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/40Electric properties
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/42Magnetic properties
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/80Compositional purity
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/80Compositional purity
    • C01P2006/82Compositional purity water content

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
CH1464270A 1967-10-18 1968-10-04 Process for the electrolytic deposition of ruthenium CH505208A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB4747767 1967-10-18
GB20908/68A GB1244309A (en) 1967-10-18 1967-10-18 Electrodeposition of ruthenium
GB5642867 1967-12-12

Publications (1)

Publication Number Publication Date
CH505208A true CH505208A (en) 1971-03-31

Family

ID=27257929

Family Applications (2)

Application Number Title Priority Date Filing Date
CH1464270A CH505208A (en) 1967-10-18 1968-10-04 Process for the electrolytic deposition of ruthenium
CH1484868A CH498775A (en) 1967-10-18 1968-10-04 Process for preparing a complex ruthenium compound

Family Applications After (1)

Application Number Title Priority Date Filing Date
CH1484868A CH498775A (en) 1967-10-18 1968-10-04 Process for preparing a complex ruthenium compound

Country Status (9)

Country Link
US (1) US3576724A (en)
JP (1) JPS4927960B1 (en)
BE (1) BE722559A (en)
CH (2) CH505208A (en)
DE (1) DE1803524A1 (en)
FR (1) FR1602538A (en)
GB (1) GB1244309A (en)
NL (1) NL6814650A (en)
SE (1) SE354877B (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1407592A (en) * 1971-12-17 1975-09-24 Int Nickel Ltd Electrodeposition of ruthenium
GB1520140A (en) * 1976-06-08 1978-08-02 Inco Europ Ltd Electrodeposition of ruthenium
US4082624A (en) * 1976-12-03 1978-04-04 Bell Telephone Laboratories, Incorporated Articles electrodeposited with ruthenium and processes of producing such articles
US4297178A (en) * 1979-04-10 1981-10-27 The International Nickel Company, Inc. Ruthenium electroplating and baths and compositions therefor
JPS5775191A (en) * 1980-10-18 1982-05-11 Kurita Water Ind Ltd Air diffuser
US5693427A (en) * 1995-12-22 1997-12-02 Baldwin Hardware Corporation Article with protective coating thereon
US5783313A (en) * 1995-12-22 1998-07-21 Baldwin Hardware Corporation Coated Article
DE19741990C1 (en) * 1997-09-24 1999-04-29 Degussa Electrolyte for low-stress, crack-free ruthenium coatings
EP1975282B1 (en) * 2007-03-28 2009-11-18 Umicore Galvanotechnik GmbH Electrolyte and method for electroplating decorative and technical layers of black ruthenium.
DE102011105207B4 (en) 2011-06-17 2015-09-10 Umicore Galvanotechnik Gmbh Electrolyte and its use for the deposition of black ruthenium coatings and coatings and articles obtained therefrom
RU2538492C1 (en) * 2013-08-06 2015-01-10 Александр Владимирович Ермаков Method of manufacturing of cathode plate of tantalum capacitor with porous anode
CN107021464B (en) * 2017-06-07 2019-10-15 王晓波 A kind of method of the synthetic method and electronic component surface plating ruthenium of [μ-nitrogen-is bis- (hydration of tetrachloro one ruthenium)] acid potassium
AT523922B1 (en) 2020-09-08 2022-01-15 Iwg Ing W Garhoefer Ges M B H Electrolyte bath for palladium-ruthenium coatings
CN113106507B (en) * 2021-04-15 2022-03-08 电子科技大学 Ruthenium electroplating solution for filling micro-nano grooves and blind holes and preparation method
CN116874042B (en) * 2023-08-28 2024-05-07 中铁建发展集团有限公司 Preparation method of ruthenium/sludge-based biochar/foam nickel cathode material, and product and application thereof

Also Published As

Publication number Publication date
US3576724A (en) 1971-04-27
NL6814650A (en) 1969-04-22
JPS4927960B1 (en) 1974-07-22
BE722559A (en) 1969-04-18
FR1602538A (en) 1970-12-21
SE354877B (en) 1973-03-26
DE1803524A1 (en) 1969-05-22
GB1244309A (en) 1971-08-25
CH498775A (en) 1970-11-15

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Legal Events

Date Code Title Description
PL Patent ceased