CH493863A - Lichtempfindliches Kopiermaterial - Google Patents
Lichtempfindliches KopiermaterialInfo
- Publication number
- CH493863A CH493863A CH1607766A CH1607766A CH493863A CH 493863 A CH493863 A CH 493863A CH 1607766 A CH1607766 A CH 1607766A CH 1607766 A CH1607766 A CH 1607766A CH 493863 A CH493863 A CH 493863A
- Authority
- CH
- Switzerland
- Prior art keywords
- copying material
- photosensitive copying
- photosensitive
- copying
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/675—Compositions containing polyhalogenated compounds as photosensitive substances
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B23/00—Methine or polymethine dyes, e.g. cyanine dyes
- C09B23/0075—Methine or polymethine dyes, e.g. cyanine dyes the polymethine chain being part of an heterocyclic ring
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
- G03F7/0295—Photolytic halogen compounds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/116—Redox or dye sensitizer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
- Y10S430/121—Nitrogen in heterocyclic ring
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/122—Sulfur compound containing
- Y10S430/123—Sulfur in heterocyclic ring
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/124—Carbonyl compound containing
- Y10S430/125—Carbonyl in heterocyclic compound
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/126—Halogen compound containing
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Organic Chemistry (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DEK57618A DE1286898B (de) | 1965-11-10 | 1965-11-10 | Lichtempfindliche Schicht |
Publications (1)
Publication Number | Publication Date |
---|---|
CH493863A true CH493863A (de) | 1970-07-15 |
Family
ID=7228328
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CH1607766A CH493863A (de) | 1965-11-10 | 1966-11-08 | Lichtempfindliches Kopiermaterial |
Country Status (9)
Country | Link |
---|---|
US (1) | US3563749A (de) |
AT (1) | AT267553B (de) |
BE (1) | BE689439A (de) |
CH (1) | CH493863A (de) |
DE (1) | DE1286898B (de) |
FR (1) | FR1498943A (de) |
GB (1) | GB1149260A (de) |
NL (1) | NL6615355A (de) |
SE (1) | SE327138B (de) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3769023A (en) * | 1971-05-07 | 1973-10-30 | Horizons Inc | Light sensitive reproduction and electron beam sensitive material |
US4021242A (en) * | 1975-08-15 | 1977-05-03 | Horizons Incorporated, A Division Of Horizons Research Incorporated | Negative working photoresist material comprising a N-vinyl monomer, an organic halogen compound photoactivator and a maleic anhydride modified rosin and the use thereof |
US4065315A (en) * | 1976-04-26 | 1977-12-27 | Dynachem Corporation | Phototropic dye system and photosensitive compositions containing the same |
JPS5664335A (en) * | 1979-10-29 | 1981-06-01 | Fuji Photo Film Co Ltd | Photosensitive composition |
DE3541534A1 (de) * | 1985-11-25 | 1987-05-27 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch |
JP2571113B2 (ja) * | 1988-12-29 | 1997-01-16 | 富士写真フイルム株式会社 | 光重合性組成物 |
JP2764769B2 (ja) * | 1991-06-24 | 1998-06-11 | 富士写真フイルム株式会社 | 光重合性組成物 |
US5609992A (en) * | 1994-11-01 | 1997-03-11 | Fuji Photo Film Co., Ltd. | Photopolymerizable composition |
US20040091713A1 (en) * | 2000-06-09 | 2004-05-13 | Toshihiro Suwa | Adherable fluorine-containing material sheet, adhesive fluorine-containing material sheet, and adhering method and adhesion structure of fluorine-containing material sheet |
US7582407B2 (en) * | 2007-07-09 | 2009-09-01 | Eastman Kodak Company | Imageable elements with low pH developer solubility |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1175896B (de) * | 1958-11-24 | 1964-08-13 | Aviation Louis Breguet Sa | Leuchttafel fuer das gleichzeitige Anzeigen einer Mehrzahl von festen und/oder zeitlich veraender-lichen Informationen |
US3109736A (en) * | 1962-04-06 | 1963-11-05 | Horizons Inc | Light-sensitive merocyanine dye base compositions |
-
1965
- 1965-11-10 DE DEK57618A patent/DE1286898B/de active Pending
-
1966
- 1966-10-31 NL NL6615355A patent/NL6615355A/xx unknown
- 1966-11-07 AT AT1028366A patent/AT267553B/de active
- 1966-11-07 US US592286A patent/US3563749A/en not_active Expired - Lifetime
- 1966-11-08 BE BE689439D patent/BE689439A/xx unknown
- 1966-11-08 CH CH1607766A patent/CH493863A/de not_active IP Right Cessation
- 1966-11-08 SE SE15280/66A patent/SE327138B/xx unknown
- 1966-11-09 FR FR83037A patent/FR1498943A/fr not_active Expired
- 1966-11-09 GB GB50141/66A patent/GB1149260A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
FR1498943A (fr) | 1967-10-20 |
BE689439A (de) | 1967-05-08 |
AT267553B (de) | 1969-01-10 |
GB1149260A (en) | 1969-04-23 |
SE327138B (de) | 1970-08-10 |
US3563749A (en) | 1971-02-16 |
DE1286898B (de) | 1969-01-09 |
NL6615355A (de) | 1967-05-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
AT288860B (de) | Xerographisches Entwicklermaterial | |
AT305024B (de) | Lichtempfindliches Kopiermaterial | |
FR1499525A (fr) | Matières photographiques photosensibles | |
AT300554B (de) | Xerographisches Entwicklermaterial | |
AT302036B (de) | Xerographisches Entwicklermaterial | |
AT314350B (de) | Lichtempfindliches Kopiermaterial | |
AT267317B (de) | Lichtempfindliches Reproduktionsmaterial | |
AT255255B (de) | Lichtempfindliches Kopiermaterial | |
AT271194B (de) | Lichtempfindliches Diazotypiematerial | |
AT278520B (de) | Lichtempfindliches Kopiermaterial | |
CH474779A (fr) | Matériel photographique | |
CH487426A (de) | Lichtempfindliches Material | |
AT267553B (de) | Lichtempfindliches Kopiermaterial | |
FR1498072A (fr) | Duplicateur électro-photographique | |
DE1797495B2 (de) | Elektrophotographisches aufzeichnungsmaterial | |
CH466040A (de) | Lichtempfindliches elektrophotographisches Material | |
CH439960A (de) | Lichtempfindliches Kopiermaterial | |
CH477708A (fr) | Matériel photosensible | |
CH483656A (de) | Lichtempfindliches Diazotypiematerial | |
AT279348B (de) | Lichtempfindliches Kopiermaterial | |
CH474780A (de) | Lichtempfindliches Material | |
AT276085B (de) | Lichtempfindliches Kopiermaterial | |
CH472708A (de) | Lichtempfindliches elektrophotographisches Material | |
CH516180A (de) | Xerographisches Entwicklermaterial | |
FR1463728A (fr) | Matières photoconductrices |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PL | Patent ceased |