CH477904A - Verfahren zur Durchführung von Reaktionen unter Beteiligung einer Gasphase - Google Patents
Verfahren zur Durchführung von Reaktionen unter Beteiligung einer GasphaseInfo
- Publication number
- CH477904A CH477904A CH1644564A CH1644564A CH477904A CH 477904 A CH477904 A CH 477904A CH 1644564 A CH1644564 A CH 1644564A CH 1644564 A CH1644564 A CH 1644564A CH 477904 A CH477904 A CH 477904A
- Authority
- CH
- Switzerland
- Prior art keywords
- carrying
- gas phase
- reactions involving
- out reactions
- involving
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/04—Oxides; Hydroxides
- C01G23/047—Titanium dioxide
- C01G23/07—Producing by vapour phase processes, e.g. halide oxidation
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
- C01B13/14—Methods for preparing oxides or hydroxides in general
- C01B13/20—Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state
- C01B13/22—Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state of halides or oxyhalides
- C01B13/28—Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state of halides or oxyhalides using a plasma or an electric discharge
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
- C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B35/00—Boron; Compounds thereof
- C01B35/02—Boron; Borides
- C01B35/04—Metal borides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/51—Particles with a specific particle size distribution
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/51—Particles with a specific particle size distribution
- C01P2004/52—Particles with a specific particle size distribution highly monodisperse size distribution
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/60—Optical properties, e.g. expressed in CIELAB-values
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Environmental & Geological Engineering (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geology (AREA)
- Silicon Compounds (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
- Silicates, Zeolites, And Molecular Sieves (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEF0041672 | 1964-01-04 | ||
| DEF44366A DE1244127B (de) | 1964-11-04 | 1964-11-04 | Verfahren und Vorrichtung zur Durchfuehrung von Gasphasenreaktionen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH477904A true CH477904A (de) | 1969-09-15 |
Family
ID=25976099
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH1644564A CH477904A (de) | 1964-01-04 | 1964-12-21 | Verfahren zur Durchführung von Reaktionen unter Beteiligung einer Gasphase |
Country Status (7)
| Country | Link |
|---|---|
| AT (1) | AT256789B (OSRAM) |
| BE (1) | BE657866A (OSRAM) |
| CH (1) | CH477904A (OSRAM) |
| FR (1) | FR1419425A (OSRAM) |
| GB (1) | GB1092885A (OSRAM) |
| NL (1) | NL6415333A (OSRAM) |
| NO (1) | NO118373B (OSRAM) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6994837B2 (en) | 2001-04-24 | 2006-02-07 | Tekna Plasma Systems, Inc. | Plasma synthesis of metal oxide nanopowder and apparatus therefor |
| US20020155059A1 (en) * | 2001-04-24 | 2002-10-24 | Tekna Plasma Systems Inc. | Plasma synthesis of titanium dioxide nanopowder and powder doping and surface modification process |
-
1964
- 1964-12-21 CH CH1644564A patent/CH477904A/de not_active IP Right Cessation
- 1964-12-31 NL NL6415333A patent/NL6415333A/xx unknown
-
1965
- 1965-01-01 GB GB13465A patent/GB1092885A/en not_active Expired
- 1965-01-02 NO NO15620965A patent/NO118373B/no unknown
- 1965-01-04 FR FR685A patent/FR1419425A/fr not_active Expired
- 1965-01-04 BE BE657866A patent/BE657866A/xx unknown
- 1965-01-04 AT AT965A patent/AT256789B/de active
Also Published As
| Publication number | Publication date |
|---|---|
| AT256789B (de) | 1967-09-11 |
| GB1092885A (en) | 1967-11-29 |
| NL6415333A (OSRAM) | 1965-07-05 |
| FR1419425A (fr) | 1965-11-26 |
| BE657866A (OSRAM) | 1965-07-05 |
| NO118373B (OSRAM) | 1969-12-22 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PL | Patent ceased |