CH477904A - Verfahren zur Durchführung von Reaktionen unter Beteiligung einer Gasphase - Google Patents

Verfahren zur Durchführung von Reaktionen unter Beteiligung einer Gasphase

Info

Publication number
CH477904A
CH477904A CH1644564A CH1644564A CH477904A CH 477904 A CH477904 A CH 477904A CH 1644564 A CH1644564 A CH 1644564A CH 1644564 A CH1644564 A CH 1644564A CH 477904 A CH477904 A CH 477904A
Authority
CH
Switzerland
Prior art keywords
carrying
gas phase
reactions involving
out reactions
involving
Prior art date
Application number
CH1644564A
Other languages
English (en)
Inventor
Hans Dr Zirngibl
Karl Dr Braendle
Peter Dipl Ing Beumer
Walter Dipl Ing Weidmann
Original Assignee
Bayer Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DEF44366A external-priority patent/DE1244127B/de
Application filed by Bayer Ag filed Critical Bayer Ag
Publication of CH477904A publication Critical patent/CH477904A/de

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01GCOMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G23/00Compounds of titanium
    • C01G23/04Oxides; Hydroxides
    • C01G23/047Titanium dioxide
    • C01G23/07Producing by vapour phase processes, e.g. halide oxidation
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/14Methods for preparing oxides or hydroxides in general
    • C01B13/20Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state
    • C01B13/22Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state of halides or oxyhalides
    • C01B13/28Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state of halides or oxyhalides using a plasma or an electric discharge
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00Nitrogen; Compounds thereof
    • C01B21/06Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C01B33/183Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B35/00Boron; Compounds thereof
    • C01B35/02Boron; Borides
    • C01B35/04Metal borides
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/51Particles with a specific particle size distribution
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/51Particles with a specific particle size distribution
    • C01P2004/52Particles with a specific particle size distribution highly monodisperse size distribution
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/60Particles characterised by their size
    • C01P2004/61Micrometer sized, i.e. from 1-100 micrometer
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/60Particles characterised by their size
    • C01P2004/62Submicrometer sized, i.e. from 0.1-1 micrometer
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/60Optical properties, e.g. expressed in CIELAB-values
CH1644564A 1964-01-04 1964-12-21 Verfahren zur Durchführung von Reaktionen unter Beteiligung einer Gasphase CH477904A (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DEF0041672 1964-01-04
DEF44366A DE1244127B (de) 1964-11-04 1964-11-04 Verfahren und Vorrichtung zur Durchfuehrung von Gasphasenreaktionen

Publications (1)

Publication Number Publication Date
CH477904A true CH477904A (de) 1969-09-15

Family

ID=25976099

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1644564A CH477904A (de) 1964-01-04 1964-12-21 Verfahren zur Durchführung von Reaktionen unter Beteiligung einer Gasphase

Country Status (7)

Country Link
AT (1) AT256789B (de)
BE (1) BE657866A (de)
CH (1) CH477904A (de)
FR (1) FR1419425A (de)
GB (1) GB1092885A (de)
NL (1) NL6415333A (de)
NO (1) NO118373B (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020155059A1 (en) * 2001-04-24 2002-10-24 Tekna Plasma Systems Inc. Plasma synthesis of titanium dioxide nanopowder and powder doping and surface modification process
US6994837B2 (en) 2001-04-24 2006-02-07 Tekna Plasma Systems, Inc. Plasma synthesis of metal oxide nanopowder and apparatus therefor

Also Published As

Publication number Publication date
NO118373B (de) 1969-12-22
FR1419425A (fr) 1965-11-26
GB1092885A (en) 1967-11-29
NL6415333A (de) 1965-07-05
BE657866A (de) 1965-07-05
AT256789B (de) 1967-09-11

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Legal Events

Date Code Title Description
PL Patent ceased