CH476744A - Process for the preparation of substituted 2- (2'-hydroxyphenyl) benzotriazole compounds - Google Patents
Process for the preparation of substituted 2- (2'-hydroxyphenyl) benzotriazole compoundsInfo
- Publication number
- CH476744A CH476744A CH273765A CH273765A CH476744A CH 476744 A CH476744 A CH 476744A CH 273765 A CH273765 A CH 273765A CH 273765 A CH273765 A CH 273765A CH 476744 A CH476744 A CH 476744A
- Authority
- CH
- Switzerland
- Prior art keywords
- groups
- acid
- substituted
- formula
- radical
- Prior art date
Links
- FJGQBLRYBUAASW-UHFFFAOYSA-N 2-(benzotriazol-2-yl)phenol Chemical class OC1=CC=CC=C1N1N=C2C=CC=CC2=N1 FJGQBLRYBUAASW-UHFFFAOYSA-N 0.000 title claims description 4
- 238000000034 method Methods 0.000 title claims description 4
- 238000002360 preparation method Methods 0.000 title claims description 3
- -1 2-amino-2'-hydroxy-1,1'-azobenzene compound Chemical class 0.000 claims description 38
- 125000001931 aliphatic group Chemical group 0.000 claims description 11
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 9
- 150000001875 compounds Chemical class 0.000 claims description 9
- 125000003545 alkoxy group Chemical group 0.000 claims description 8
- 125000000217 alkyl group Chemical group 0.000 claims description 5
- 125000004390 alkyl sulfonyl group Chemical group 0.000 claims description 4
- 125000005843 halogen group Chemical group 0.000 claims description 4
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 claims description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 125000004122 cyclic group Chemical group 0.000 claims description 2
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 2
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 claims description 2
- 238000006798 ring closing metathesis reaction Methods 0.000 claims description 2
- 150000001733 carboxylic acid esters Chemical class 0.000 claims 1
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 description 10
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- 150000003254 radicals Chemical class 0.000 description 8
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- 125000001424 substituent group Chemical group 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 229960000583 acetic acid Drugs 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 239000011241 protective layer Substances 0.000 description 4
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 239000012362 glacial acetic acid Substances 0.000 description 3
- 239000004611 light stabiliser Substances 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- YZGQDNOIGFBYKF-UHFFFAOYSA-N Ethoxyacetic acid Chemical compound CCOCC(O)=O YZGQDNOIGFBYKF-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Natural products OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical class C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 2
- 125000003262 carboxylic acid ester group Chemical class [H]C([H])([*:2])OC(=O)C([H])([H])[*:1] 0.000 description 2
- 239000012876 carrier material Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 description 2
- 229940106681 chloroacetic acid Drugs 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- NZNMSOFKMUBTKW-UHFFFAOYSA-N cyclohexanecarboxylic acid Chemical compound OC(=O)C1CCCCC1 NZNMSOFKMUBTKW-UHFFFAOYSA-N 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 125000006125 ethylsulfonyl group Chemical group 0.000 description 2
- 150000002430 hydrocarbons Chemical group 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- LPNBBFKOUUSUDB-UHFFFAOYSA-N p-toluic acid Chemical compound CC1=CC=C(C(O)=O)C=C1 LPNBBFKOUUSUDB-UHFFFAOYSA-N 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- SZHOJFHSIKHZHA-UHFFFAOYSA-N tridecanoic acid Chemical compound CCCCCCCCCCCCC(O)=O SZHOJFHSIKHZHA-UHFFFAOYSA-N 0.000 description 2
- ZDPHROOEEOARMN-UHFFFAOYSA-N undecanoic acid Chemical compound CCCCCCCCCCC(O)=O ZDPHROOEEOARMN-UHFFFAOYSA-N 0.000 description 2
- YKYIFUROKBDHCY-ONEGZZNKSA-N (e)-4-ethoxy-1,1,1-trifluorobut-3-en-2-one Chemical group CCO\C=C\C(=O)C(F)(F)F YKYIFUROKBDHCY-ONEGZZNKSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- 125000003363 1,3,5-triazinyl group Chemical group N1=C(N=CN=C1)* 0.000 description 1
- RLYCRLGLCUXUPO-UHFFFAOYSA-N 2,6-diaminotoluene Chemical compound CC1=C(N)C=CC=C1N RLYCRLGLCUXUPO-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- SWFNPENEBHAHEB-UHFFFAOYSA-N 2-amino-4-chlorophenol Chemical compound NC1=CC(Cl)=CC=C1O SWFNPENEBHAHEB-UHFFFAOYSA-N 0.000 description 1
- ZKURLLZBGZTMKX-UHFFFAOYSA-N 2-ethylsulfanylbutanoic acid Chemical compound CCSC(CC)C(O)=O ZKURLLZBGZTMKX-UHFFFAOYSA-N 0.000 description 1
- WLJVXDMOQOGPHL-PPJXEINESA-N 2-phenylacetic acid Chemical compound O[14C](=O)CC1=CC=CC=C1 WLJVXDMOQOGPHL-PPJXEINESA-N 0.000 description 1
- ONPJWQSDZCGSQM-UHFFFAOYSA-N 2-phenylprop-2-enoic acid Chemical compound OC(=O)C(=C)C1=CC=CC=C1 ONPJWQSDZCGSQM-UHFFFAOYSA-N 0.000 description 1
- DHXNZYCXMFBMHE-UHFFFAOYSA-N 3-bromopropanoic acid Chemical compound OC(=O)CCBr DHXNZYCXMFBMHE-UHFFFAOYSA-N 0.000 description 1
- XMIIGOLPHOKFCH-UHFFFAOYSA-N 3-phenylpropionic acid Chemical compound OC(=O)CCC1=CC=CC=C1 XMIIGOLPHOKFCH-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- JLLYLQLDYORLBB-UHFFFAOYSA-N 5-bromo-n-methylthiophene-2-sulfonamide Chemical compound CNS(=O)(=O)C1=CC=C(Br)S1 JLLYLQLDYORLBB-UHFFFAOYSA-N 0.000 description 1
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Natural products OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- XTUVJUMINZSXGF-UHFFFAOYSA-N N-methylcyclohexylamine Chemical compound CNC1CCCCC1 XTUVJUMINZSXGF-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 230000032912 absorption of UV light Effects 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 235000011054 acetic acid Nutrition 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 125000004414 alkyl thio group Chemical group 0.000 description 1
- MDFFNEOEWAXZRQ-UHFFFAOYSA-N aminyl Chemical class [NH2] MDFFNEOEWAXZRQ-UHFFFAOYSA-N 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 125000004659 aryl alkyl thio group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 125000004104 aryloxy group Chemical group 0.000 description 1
- JPYQFYIEOUVJDU-UHFFFAOYSA-N beclamide Chemical compound ClCCC(=O)NCC1=CC=CC=C1 JPYQFYIEOUVJDU-UHFFFAOYSA-N 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- 150000001565 benzotriazoles Chemical class 0.000 description 1
- 125000000051 benzyloxy group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])O* 0.000 description 1
- UCMIRNVEIXFBKS-UHFFFAOYSA-N beta-alanine Chemical class NCCC(O)=O UCMIRNVEIXFBKS-UHFFFAOYSA-N 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000005518 carboxamido group Chemical group 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 229930016911 cinnamic acid Natural products 0.000 description 1
- 235000013985 cinnamic acid Nutrition 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- BWFPGXWASODCHM-UHFFFAOYSA-N copper monosulfide Chemical compound [Cu]=S BWFPGXWASODCHM-UHFFFAOYSA-N 0.000 description 1
- JZCCFEFSEZPSOG-UHFFFAOYSA-L copper(II) sulfate pentahydrate Chemical compound O.O.O.O.O.[Cu+2].[O-]S([O-])(=O)=O JZCCFEFSEZPSOG-UHFFFAOYSA-L 0.000 description 1
- OMZSGWSJDCOLKM-UHFFFAOYSA-N copper(II) sulfide Chemical compound [S-2].[Cu+2] OMZSGWSJDCOLKM-UHFFFAOYSA-N 0.000 description 1
- 125000000000 cycloalkoxy group Chemical group 0.000 description 1
- 125000005366 cycloalkylthio group Chemical group 0.000 description 1
- VZFUCHSFHOYXIS-UHFFFAOYSA-N cycloheptane carboxylic acid Natural products OC(=O)C1CCCCCC1 VZFUCHSFHOYXIS-UHFFFAOYSA-N 0.000 description 1
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 1
- GHVNFZFCNZKVNT-UHFFFAOYSA-N decanoic acid Chemical compound CCCCCCCCCC(O)=O GHVNFZFCNZKVNT-UHFFFAOYSA-N 0.000 description 1
- UZBQIPPOMKBLAS-UHFFFAOYSA-N diethylazanide Chemical compound CC[N-]CC UZBQIPPOMKBLAS-UHFFFAOYSA-N 0.000 description 1
- QLACLEPYLWLNTD-UHFFFAOYSA-N dihydrocinnamic acid Natural products COc1ccc(CCC(O)=O)c(O)c1OC QLACLEPYLWLNTD-UHFFFAOYSA-N 0.000 description 1
- KZNICNPSHKQLFF-UHFFFAOYSA-N dihydromaleimide Natural products O=C1CCC(=O)N1 KZNICNPSHKQLFF-UHFFFAOYSA-N 0.000 description 1
- QKIUAMUSENSFQQ-UHFFFAOYSA-N dimethylazanide Chemical compound C[N-]C QKIUAMUSENSFQQ-UHFFFAOYSA-N 0.000 description 1
- JBKVHLHDHHXQEQ-UHFFFAOYSA-N epsilon-caprolactam Chemical group O=C1CCCCCN1 JBKVHLHDHHXQEQ-UHFFFAOYSA-N 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical group 0.000 description 1
- 230000009931 harmful effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 150000002431 hydrogen Chemical group 0.000 description 1
- YAQXGBBDJYBXKL-UHFFFAOYSA-N iron(2+);1,10-phenanthroline;dicyanide Chemical compound [Fe+2].N#[C-].N#[C-].C1=CN=C2C3=NC=CC=C3C=CC2=C1.C1=CN=C2C3=NC=CC=C3C=CC2=C1 YAQXGBBDJYBXKL-UHFFFAOYSA-N 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 150000003951 lactams Chemical group 0.000 description 1
- 235000021190 leftovers Nutrition 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- RMIODHQZRUFFFF-UHFFFAOYSA-N methoxyacetic acid Chemical compound COCC(O)=O RMIODHQZRUFFFF-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- MGJXBDMLVWIYOQ-UHFFFAOYSA-N methylazanide Chemical compound [NH-]C MGJXBDMLVWIYOQ-UHFFFAOYSA-N 0.000 description 1
- 125000004170 methylsulfonyl group Chemical group [H]C([H])([H])S(*)(=O)=O 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- WQEPLUUGTLDZJY-UHFFFAOYSA-N n-Pentadecanoic acid Natural products CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 description 1
- 125000006606 n-butoxy group Chemical group 0.000 description 1
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052979 sodium sulfide Inorganic materials 0.000 description 1
- GRVFOGOEDUUMBP-UHFFFAOYSA-N sodium sulfide (anhydrous) Chemical compound [Na+].[Na+].[S-2] GRVFOGOEDUUMBP-UHFFFAOYSA-N 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000001384 succinic acid Substances 0.000 description 1
- 229960002317 succinimide Drugs 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D403/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00
- C07D403/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings
- C07D403/04—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings directly linked by a ring-member-to-ring-member bond
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
- C07D249/16—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
- C07D249/18—Benzotriazoles
- C07D249/20—Benzotriazoles with aryl radicals directly attached in position 2
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D403/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00
- C07D403/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings
- C07D403/10—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings linked by a carbon chain containing aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D403/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00
- C07D403/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings
- C07D403/12—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings linked by a chain containing hetero atoms as chain links
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
- C08K5/3472—Five-membered rings
- C08K5/3475—Five-membered rings condensed with carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K15/00—Anti-oxidant compositions; Compositions inhibiting chemical change
- C09K15/04—Anti-oxidant compositions; Compositions inhibiting chemical change containing organic compounds
- C09K15/30—Anti-oxidant compositions; Compositions inhibiting chemical change containing organic compounds containing heterocyclic ring with at least one nitrogen atom as ring member
Landscapes
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- Organic Chemistry (AREA)
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Description
Verfahren zur Herstellung von substituierten 2-(2'-Hydroxyphenyl)-benztriazolverbindungen Es wurde gefunden, dass man wertvolle Lichtschutz mittel erhält, wenn man eine 2-Amino-2'-hydroxy-1,1'- azobenzolverbindung der Formel I
EMI0001.0002
in der X die Gruppen
EMI0001.0004
bedeutet und in Stellung 4, 5 oder 4' steht, worin R einen von farberzeugenden Gruppen freien Acylrest oder cyclischen Kohlensäureimid- rest und R, Wasserstoff, Cycloalkyl oder einen von farberzeugenden Gruppen freien aliphati schen oder araliphatischen Rest bedeutet, und Y -CO-, -CS- und -S02- und 2 -R2-, R3-O-, worin R2, Ra und R4 aliphatische
EMI0001.0007
Reste sind,
D -CO- oder eine gegebenenfalls durch Al kylgruppen substituierte Methylengruppe bedeutet, und in Formel I der Kern A in den Stellungen 4, 5 und 6 durch Alkyl-, Alkoxygruppen oder Halogenatome, und, wenn X nicht im Kern A steht, auch durch Carboxyl-, Carbonsäureester-, Carbonsäure- amid-, Sulfonsäureamid- oder Alkylsulfonyl- gruppen, und der Kern Bin den Stellungen 3', 4' und 5' durch Koh lenwasserstoffgruppen, Alkoxygruppen oder Halogenatome substituiert sein kann, unter Ringschluss zu einer Verbindung der Formel II oxydiert
EMI0001.0014
worin X in Stellung 4 oder 4' steht.
Der Benzolring A kann, wie erwähnt, in den Stel lungen 4, 5 und 6 noch durch Alkylgruppen, wie Me thyl-, Äthyl-, iso-Butylgruppen, Alkoxygruppen, wie Methoxy- und Butoxygruppen, Halogene, wie Chlor und Brom, und, wenn X nicht im Kern A steht, auch durch Carboxylgruppen, Carbonsäureestergruppen, namentlich Carbonsäurealkylestergruppen, wie Carbomethoxy-, Carboäthoxy-, Carbopropoxy- oder Carbobutoxygrup- pen, gegebenenfalls am Stickstoff aliphatisch, cycloali- phatisch oder araliphatisch substituierte Carbonsäure- amid-, oder Sulfonsäureamidgruppen,
wie Carbonsäure- oder Sulfonsäureamid-, -methylamid-, -äthylamid-, -cy- clohexylamid-, -benzylamid-, -dimethylamid-, -diäthyl- amid-, N-methyl-N-cyclohexylamid-, -γ-methoxypropyl- amid-, -piperidid- oder -morpholidgruppen,sowie Alkyl- sulfonylgruppen, wie Methylsulfonyl- oder Äthylsulfo- nylgruppen enthalten.
Der Benzolring B kann in den Stellungen 3', 4' und 5' noch durch Kohlenwasserstoffgruppen, wie Methyl-, Äthyl-, Benzyl-, α-Phenyl-äthyl-, Cyclohexyl- oder Phe nylgruppen, Alkoxygruppen, wie Methoxy-, Äthoxy-, Propoxy-, Isopropoxy- oder n-Butoxygruppen oder Ha logene, wie Chlor oder Brom, substituiert sein.
Besonders langwellig absorbierende Benztriazolver- bindungen werden erhalten, wenn acidifizierende Sub- stituenten in 4- oder in 5-Stellung, basifizierende Sub- stituenten in 3'- und/oder 5'-Stellung eingeführt werden. Benztriazolverbindungen mit besonders hoher molarer Extinktion im Bereich von 330-350 mg werden erhal ten, wenn basifizierende Substituenten in der 4'- und/ oder 5-Stellung stehen. Die molare Absorption im Be reich von 300 mg wird durch gegebenenfalls weitersub stituierte Alkylsubstituenten gefördert.
Beispiele für basifizierende Substituenten sind Al- koxygruppen, wie die Methoxy-, Isopropoxy-, Cyclo- hexyloxy- und Benzyloxygruppen; Beispiele für acidifi- zierende Substituenten sind Alkylsulfonylgruppen, wie die Methyl- und Äthylsulfonylgruppe, Sulfonsäureamid- gruppen, wie die Sulfonsäuremethyl-, -butyl- und -cyclo- hexylamidgruppe, sowie die Carboxylgruppe und ihre Ester oder Amide.
Der mit R bezeichnete, von farberzeugenden Grup pen freie Rest einer organischen Säure ist beispielsweise verkörpert durch einen Carbonsäurerest der Formel R2-CO-, einen Kohlensäuremonoesterrest der Formel R3-OCO-, einen Carbamoyl- oder Thiocarbamoylrest der Formel
EMI0002.0020
beziehungsweise
EMI0002.0021
einen Sulfonsäurerest der Formel R3-SO2- sowie einen cyclischen Kohlensäureimidrest der Formel
EMI0002.0022
worin A einen 5- oder 6gliedrigen Ring von aromati schem Charakter ergänzt, vorzugsweise einen 1,3,5-Tri- azinyl-(2)-rest der Formel
EMI0002.0025
In diesen Acylresten bedeuten R2, R3, R4, R, und R" unabhängig voneinander je einen organischen Rest, zum Beispiel einen aliphatischen, cycloaliphatischen,
araliphatischen oder aromatischen Rest, R2 und R4 aus- serdem noch Wasserstoff und R, und Re auch einen Alkoxy-, Cycloalkoxy-, Aralkoxy- oder Aryloxy-, Alkyl- thio-, Cycloalkylthio-, Aralkylthio- oder Arylthiorest oder einen gegebenenfalls aliphatisch, cycloaliphatisch, araliphatisch oder aromatisch substituierten Aminorest.
Der Rest R2-CO- kann von einer gegebenenfalls substituierten, aliphatischen gesättigten einbasischen Carbonsäure, zum Beispiel Ameisensäure, Essigsäure, Propionsäure, Buttersäure, Pentancarbonsäure, Heptan- carbonsäure, Nonancarbonsäure, Undecancarbonsäure, Tridecancarbonsäure, Pentadecancarbonsäure, Hepta- decancarbonsäure, Chlor- oder Bromessigsäure, a- oder ss-Chlor- oder a- oder ss-Brompropionsäure, Methoxy- oder Äthoxyessigsäure,
Methyl- oder Äthylmerkapto- buttersäure oder gegebenenfalls N-substituierten Amino- essigsäuren oder ss-Aminopropionsäuren, von einer ali phatischen gesättigten mehrbasischen gegebenenfalls substituierten Carbonsäure, insbesondere von einem Monoester einer solchen Säure, beispielsweise von Oxal säuremonomethyl- oder -monoäthylester oder Bernstein säuremonomethyl- oder -monoäthylester; von einer ali phatischen ungesättigten einbasischen gegebenenfalls substituierten Carbonsäure, zum Beispiel Acryl- oder Methacrylsäure;
von einer aliphatischen, ungesättigten mehrbasischen, gegebenenfalls substituierten Carbon- säure, insbesondere von einem Monoester einer solchen Säure, wie Maleinsäure- oder Fumarsäure-monomethyl- oder Monoäthylester; von einer cycloaliphatischen Car- bonsäure, zum Beispiel Cyclohexancarbonsäure; von einer araliphatischen Carbonsäure, wie Phenylessig säure, Dihydrozimtsäure, α-Phenylacrylsäure oder Zimt säure oder von einer aromatischen Carbonsäure, wie Benzoesäure, p-Toluylsäure oder Phthalsäuremonoalkyl- ester abgeleitet sein.
Als Carbamoyl- beziehungsweise Thiocarbamoyl- reste enthalten erfindungsgemässe Verbindungen bei spielsweise N-Methyl-, N-Äthyl-, N-Propyl-, N-Butyl-, N-Cyclohexyl-, N-Benzyl-, N-Phenyl-, N,N-Dimethyl-, N,N-Diäthyl-, N,N-Dipropyl-, N,N-Dibutyl-, N,N-Dicy- clohexyl-, N,N-Dibenzyl-, N-Methyl-N-äthyl- oder N- Methyl-N-phenylcarbamoyl- oder -thiocarbamoylgrup- pen.
Der Rest R3SO2- leitet sich insbesondere von aro matischen Sulfonsäuren, beispielsweise von Benzol- oder p-Toluolsulfonsäure ab.
Beispiele für Reste der Formel
EMI0002.0059
sind der 4,6-Bis-methylamino-, 4,6-Bis-äthylamino-, 4,6- Bis-propylamino-, 4,6-Bis-butylamino-, 4,6-Bis-dimetyi- amino-, 4,6-Bis-diäthylamino-, 4,6-Bis-dipropylamino- oder 4,6-Bis-dibutylamino-, 4-Amino-6-N,N-dimethyl- amino-, 4-Amino-6-N-methyl-N-äthylamino-, 4-Amino- 6-N-methyl-N-propylamino-, 4-Amino-6-N-methyl-N- butylamino-, 4-Amino-6-N-methyl-N-hexylamino-,
4- Amino-6-N-methyl-N-octylamino-, 4,6-Bis-methylmer- kapto-, 4-Methylmerkapto-6-dodecylmerkapto-, 4-Me- thoxy-6-methylamino- oder der 4-Äthoxy-6-äthylamino- 1,3,5-triazinyl-(2)-rest.
Wenn R1 ein Cycloalkylrest oder ein von farberzeu- genden Gruppen freier aliphatischer oder araliphatischer Rest ist, so bedeutet es zum Beispiel die Methyl- oder Äthylgruppe, die Cyclohexylgruppe oder die Benzyl gruppe. Wenn R1 und der Acylrest zusammen mit dem Stickstoff einen Ring bilden, so handelt es sich zum Beispiel um einen Lactamring, etwa den Caprolactam- ring oder einen cyclischen Imidrest, etwa den Succin- imidrest.
Die Oxydation der Verbindung der Formel 1 zur Triazolverbindung wird nach an sich bekannten Metho den, zum Beispiel mit Cu(II)-salzen in alkalischem Mit tel ausgeführt.
Die neuen substituierten 2-(2'-Hydroxyphenyl)- benztriazolverbindungen der Formel II sind, je nach Substitution, farblos bis leicht gelbstichig gefärbt und absorbieren UV-Licht. Gegenüber vorbekannten Ver bindungen ähnlicher Konstitution zeigen sie eine ver besserte Absorption von UV-Licht. Besonders geeignet sind sie deshalb in allen Fällen, wo eine möglichst ge ringe UV-Transparenz gewünscht wird.
Bezüglich Lichtechtheit sind die 5-Acylamidoverbin- dungen besonders günstig. Im allgemeinen nimmt die Lichtechtheit sowohl bei den 5-Acylamido- als auch bei den 4'-Acylamidoverbindungen in folgender Reihenfolge zu: Triazinylamino > Carbonsäureamido # Sulfon- säureamidoverbindungen; d. h., je saurer die dem Acyl- rest entsprechende freie Säure ist, desto besser ist die Lichtechtheit.
Die neuen UV-Absorber werden den lichtempfind lichen Trägern in geringen Mengen von 0,001-5 Pro zent, insbesondere in Mengen von 0,01-1 Prozent des Trägermaterials einverleibt. Als Trägermaterialien für die neuen Verbindungen der Formel II kommen in erster Linie Polymere in Frage.
Die lichtempfindlichen Materialien können vor der schädlichen Einwirkung von Licht auch dadurch ge schützt werden, dass man sie mit einer mindestens eine definitionsgemässe Verbindung der Formel II enthalten den Schutzschicht, zum Beispiel einen Lack, anstreicht, oder dass man sie mit solche Lichtschutzmittel enthal tenden - zweckmässig filmartigen - Gebilden abdeckt. In diesen beiden Fällen ist die Menge der zugesetzten Lichtschutzmittel vorteilhaft 10-30 Prozent (bezogen auf das Schutzschichtmaterial) für Schutzschichten von weniger als 0,01 mm Dicke und 1-10 Prozent für Schutzschichten von 0,01-0,1 mm Dicke. Im allgemei nen sind die Benztriazolverbindungen um so wertvoller, je farbloser sie sind, da sie sonst leicht eine Gelbfärbung des Endproduktes verursachen.
Im folgenden Beispiel bedeuten, sofern nichts ande res vermerkt ist, die Teile Gewichtsteile. Die Tempera turen sind in Celsiusgraden angegeben. Gewichtsteile stehen zu Volumteilen im gleichen Verhältnis wie Kilo gramm zu Liter. <I>Beispiel</I> 2,76 Teile 2,4-Diamino-5-methyl-2'-hydroxy-5'- chlor-1,1'-azobenzol werden in 10 Volumteilen Eisessig mit 1,02 Teilen Acetanhydrid versetzt und durch Er hitzen zum Rückfluss in das 2-Amino-4-acetylamido-5- methyl-2'-hydroxy-5'-chlor-1,1'-azobenzol übergeführt.
Das Produkt wird durch Aufgiessen der Reaktions mischung auf Wasser gefällt, abgesaugt und noch feucht in einer siedenden Lösung von 5,04 Teilen Kupfersulfat- pentahydrat, 6 Volumteilen Wasser, 8 Volumteilen 20- prozentiger Ammoniaklösung und 40 Volumteilen 50- prozentigemAlkohol eine Stunde am Rückfluss gekocht. Zum Entkupfern wird das Gemisch mit 1,5 Teilen Na triumsulfid versetzt und nach zweistündigem Rühren zwecks Entfernung des Kupfersulfids abfiltriert. Der Filterrückstand wird mit 20 Volumteilen heissem Äthy- lenglykolmonomethyläther extrahiert und es wird heiss vom Kupfersulfid abfiltriert.
Durch Eindampfen der vereinigten Filtrate im Vakuum erhält man das 2-(2' Hydroxy-5'-chlorphenyl)-4-methyl-5-acetylamido-benz- triazol. F. 260 (aus Eisessig).
Das als Ausgangsmaterial verwendete 2,4-Diamino- 5-methyl-2'-hydroxy-5'-chlor-1,1'-azobenzol wird fol- gendermassen hergestellt: 61 Teile 2,6-Diaminotoluol werden in 100 Volumteilen Eisessig mit 50 Volumteilen konzentrierter Salzsäure gelöst und bei 0-5 innerhalb zweieinhalb Stunden 72 Teile auf übliche Weise diazo- tiertes 4-Chlor-2-amino-phenol zugetropft. Nach dem Rühren über Nacht bei 0-5 wird die Säure mit Natron lauge auf pH 4-4,5 abgestumpft, wobei der Farbstoff ausfällt. Es wird abfiltriert, mit Wasser gewaschen und am Vakuum getrocknet.
Process for the preparation of substituted 2- (2'-hydroxyphenyl) benzotriazole compounds It has been found that valuable light stabilizers are obtained if a 2-amino-2'-hydroxy-1,1'-azobenzene compound of the formula I is used
EMI0001.0002
in the X the groups
EMI0001.0004
and is in position 4, 5 or 4 ', where R is an acyl radical or cyclic carbonimide radical free of color-generating groups and R is hydrogen, cycloalkyl or an aliphatic or araliphatic radical free of color-generating groups, and Y is -CO-, -CS- and -S02- and 2 -R2-, R3-O-, where R2, Ra and R4 are aliphatic
EMI0001.0007
Leftovers are
D denotes -CO- or a methylene group optionally substituted by alkyl groups, and in formula I the nucleus A in positions 4, 5 and 6 by alkyl, alkoxy groups or halogen atoms, and, if X is not in the nucleus A, also by carboxyl -, Carboxylic acid ester, carboxylic acid amide, sulfonic acid amide or alkylsulfonyl groups, and the nucleus Bin in the positions 3 ', 4' and 5 'can be substituted by hydrocarbon groups, alkoxy groups or halogen atoms, with ring closure to form a compound of the formula II oxidized
EMI0001.0014
wherein X is in position 4 or 4 '.
The benzene ring A can, as mentioned, in the positions 4, 5 and 6 by alkyl groups such as methyl, ethyl, isobutyl groups, alkoxy groups such as methoxy and butoxy groups, halogens such as chlorine and bromine, and, if X is not in the nucleus A, also through carboxyl groups, carboxylic acid ester groups, namely carboxylic acid alkyl ester groups, such as carbomethoxy, carboethoxy, carbopropoxy or carbobutoxy groups, optionally carboxylic acid amide groups with aliphatic, cycloaliphatic or araliphatic substitution on the nitrogen, or sulfonic acid amide groups,
such as carboxylic acid or sulfonic acid amide, methyl amide, ethyl amide, cyclohexyl amide, benzyl amide, dimethyl amide, diethyl amide, N-methyl-N-cyclohexyl amide, γ-methoxypropyl contain amide, piperidide or morpholide groups, and also alkyl sulfonyl groups, such as methylsulfonyl or ethylsulfonyl groups.
The benzene ring B in the 3 ', 4' and 5 'positions can also be replaced by hydrocarbon groups, such as methyl, ethyl, benzyl, α-phenylethyl, cyclohexyl or phenyl groups, alkoxy groups such as methoxy, ethoxy -, propoxy, isopropoxy or n-butoxy groups or Ha logene, such as chlorine or bromine, may be substituted.
Benztriazole compounds which absorb particularly long wavelengths are obtained when acidifying substituents are introduced in the 4- or 5-position, and basic substituents in the 3 'and / or 5' position. Benztriazole compounds with a particularly high molar extinction in the range of 330-350 mg are obtained when basic substituents are in the 4'- and / or 5-position. The molar absorption in the range of 300 mg is promoted by optionally further substituted alkyl substituents.
Examples of basic substituents are alkoxy groups, such as the methoxy, isopropoxy, cyclohexyloxy and benzyloxy groups; Examples of acidifying substituents are alkylsulfonyl groups, such as the methyl and ethylsulfonyl groups, sulfonic acid amide groups, such as the sulfonic acid methyl, -butyl and -cyclohexylamide groups, and the carboxyl group and its esters or amides.
The radical of an organic acid denoted by R and free of color-generating groups is embodied, for example, by a carboxylic acid radical of the formula R2-CO-, a carbonic acid monoester radical of the formula R3-OCO-, a carbamoyl or thiocarbamoyl radical of the formula
EMI0002.0020
respectively
EMI0002.0021
a sulfonic acid radical of the formula R3-SO2- and a cyclic carbonic acid imide radical of the formula
EMI0002.0022
wherein A complements a 5- or 6-membered ring of aromatic character, preferably a 1,3,5-triazinyl (2) radical of the formula
EMI0002.0025
In these acyl radicals, R2, R3, R4, R, and R "are each, independently of one another, an organic radical, for example an aliphatic, cycloaliphatic,
araliphatic or aromatic radical, R2 and R4 also hydrogen and R, and Re also an alkoxy, cycloalkoxy, aralkoxy or aryloxy, alkylthio, cycloalkylthio, aralkylthio or arylthio radical or an optionally aliphatic, cycloaliphatic , araliphatically or aromatically substituted amino radical.
The radical R2-CO- can be derived from an optionally substituted, aliphatic saturated monobasic carboxylic acid, for example formic acid, acetic acid, propionic acid, butyric acid, pentane carboxylic acid, heptane carboxylic acid, nonane carboxylic acid, undecanoic acid, tridecanoic acid, pentadecanoic acid, chloroacetic acid, or chloroacetic acid, or a- or ss-chloro- or a- or ss-bromopropionic acid, methoxy- or ethoxyacetic acid,
Methyl or ethylmercaptobutyric acid or optionally N-substituted amino acetic acids or β-aminopropionic acids, from an aliphatic saturated polybasic optionally substituted carboxylic acid, in particular from a monoester of such an acid, for example from oxalic acid monomethyl or monoethyl ester or succinic acid monomethyl or monoethyl ester; of an aliphatic unsaturated monocarboxylic optionally substituted carboxylic acid, for example acrylic or methacrylic acid;
of an aliphatic, unsaturated, polybasic, optionally substituted carboxylic acid, in particular of a monoester of an acid such as maleic acid or fumaric acid monomethyl or monoethyl ester; from a cycloaliphatic carboxylic acid, for example cyclohexanecarboxylic acid; may be derived from an araliphatic carboxylic acid such as phenylacetic acid, dihydrocinnamic acid, α-phenylacrylic acid or cinnamic acid or from an aromatic carboxylic acid such as benzoic acid, p-toluic acid or phthalic acid monoalkyl ester.
Compounds according to the invention contain, for example, N-methyl, N-ethyl, N-propyl, N-butyl, N-cyclohexyl, N-benzyl, N-phenyl, N, N as carbamoyl or thiocarbamoyl radicals -Dimethyl-, N, N-diethyl-, N, N-dipropyl-, N, N-dibutyl-, N, N-dicyclohexyl-, N, N-dibenzyl-, N-methyl-N-ethyl- or N-methyl-N-phenylcarbamoyl or thiocarbamoyl groups.
The R3SO2- radical is derived in particular from aromatic sulfonic acids, for example from benzene or p-toluenesulfonic acid.
Examples of residues of the formula
EMI0002.0059
are the 4,6-bis-methylamino-, 4,6-bis-äthylamino-, 4,6-bis-propylamino-, 4,6-bis-butylamino-, 4,6-bis-dimetyi- amino, 4 , 6-bis-diethylamino-, 4,6-bis-dipropylamino- or 4,6-bis-dibutylamino-, 4-amino-6-N, N-dimethylamino-, 4-amino-6-N-methyl -N-ethylamino-, 4-amino- 6-N-methyl-N-propylamino-, 4-amino-6-N-methyl-N-butylamino-, 4-amino-6-N-methyl-N-hexylamino- ,
4-amino-6-N-methyl-N-octylamino-, 4,6-bis-methylmerkapto, 4-methylmercapto-6-dodecylmercapto, 4-methoxy-6-methylamino- or 4-ethoxy -6-ethylamino-1,3,5-triazinyl- (2) radical.
If R1 is a cycloalkyl radical or an aliphatic or araliphatic radical free of color-generating groups, it means, for example, the methyl or ethyl group, the cyclohexyl group or the benzyl group. If R1 and the acyl radical form a ring together with the nitrogen, it is, for example, a lactam ring, for example the caprolactam ring, or a cyclic imide radical, for example the succinimide radical.
The oxidation of the compound of formula 1 to the triazole compound is carried out by methods known per se, for example with Cu (II) salts in an alkaline medium.
The new substituted 2- (2'-hydroxyphenyl) benzotriazole compounds of the formula II are, depending on the substitution, colorless to slightly yellow in color and absorb UV light. Compared to previously known Ver compounds of a similar constitution, they show an improved absorption of UV light. They are therefore particularly suitable in all cases where the lowest possible UV transparency is desired.
The 5-acylamido compounds are particularly favorable with regard to lightfastness. In general, the lightfastness increases both in the case of the 5-acylamido and the 4'-acylamido compounds in the following order: triazinylamino> carboxamido · sulfonic acid amido compounds; d. In other words, the more acidic the free acid corresponding to the acyl radical, the better the lightfastness.
The new UV absorbers are incorporated into the light-sensitive carriers in small amounts of 0.001-5 percent, in particular in amounts of 0.01-1 percent of the carrier material. Polymers are primarily suitable as carrier materials for the new compounds of the formula II.
The photosensitive materials can also be protected from the harmful effects of light by coating them with a protective layer containing at least one compound of the formula II according to the definition, for example a varnish, or by coating them with such light stabilizers - expediently film-like - structures. In both of these cases, the amount of light stabilizers added is advantageously 10-30 percent (based on the protective layer material) for protective layers less than 0.01 mm thick and 1-10 percent for protective layers 0.01-0.1 mm thick. In general, the more colorless the benzotriazole compounds are, the more valuable they are, otherwise they can easily cause the end product to turn yellow.
In the following example, unless otherwise noted, the parts mean parts by weight. The temperatures are given in degrees Celsius. Parts by weight have the same relationship to parts by volume as kilograms are to liters. <I> Example </I> 2.76 parts of 2,4-diamino-5-methyl-2'-hydroxy-5'-chloro-1,1'-azobenzene are mixed with 1.02 parts of acetic anhydride in 10 parts by volume of glacial acetic acid and converted into the 2-amino-4-acetylamido-5-methyl-2'-hydroxy-5'-chloro-1,1'-azobenzene by heating to reflux.
The product is precipitated by pouring the reaction mixture onto water, filtered off with suction and refluxed for one hour while still moist in a boiling solution of 5.04 parts of copper sulfate pentahydrate, 6 parts by volume of water, 8 parts by volume of 20 percent ammonia solution and 40 parts by volume of 50 percent alcohol . To remove the copper, the mixture is mixed with 1.5 parts of sodium sulfide and, after stirring for two hours, filtered off to remove the copper sulfide. The filter residue is extracted with 20 parts by volume of hot ethylene glycol monomethyl ether and the copper sulphide is filtered off while hot.
The 2- (2 'hydroxy-5'-chlorophenyl) -4-methyl-5-acetylamido-benzotriazole is obtained by evaporating the combined filtrates in vacuo. F. 260 (from glacial acetic acid).
The 2,4-diamino-5-methyl-2'-hydroxy-5'-chloro-1,1'-azobenzene used as the starting material is prepared as follows: 61 parts of 2,6-diaminotoluene are 50 parts by volume of glacial acetic acid Dissolved parts by volume of concentrated hydrochloric acid and 72 parts of 4-chloro-2-aminophenol diazotized in the usual way were added dropwise at 0-5 within two and a half hours. After stirring overnight at 0-5, the acid is blunted to pH 4-4.5 with sodium hydroxide solution, the dye precipitating out. It is filtered off, washed with water and dried in vacuo.
Claims (1)
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL279767D NL279767A (en) | 1961-06-16 | ||
| NL126891D NL126891C (en) | 1961-06-16 | ||
| CH273765A CH476744A (en) | 1961-06-16 | 1961-06-16 | Process for the preparation of substituted 2- (2'-hydroxyphenyl) benzotriazole compounds |
| CH709661A CH434280A (en) | 1961-06-16 | 1961-06-16 | Process for the preparation of substituted 2- (2'-hydroxyphenyl) benzotriazole compounds |
| FR900893A FR1324898A (en) | 1961-06-16 | 1962-06-15 | Novel substituted 2- (2'-hydroxyphenyl) -benzotriazoles and their preparation |
| DEG35219A DE1213408B (en) | 1961-06-16 | 1962-06-15 | Use of substituted 2- (2-hydroxyphenyl) benzotriazole compounds to protect organic substances against ultraviolet radiation |
| GB980886D GB980886A (en) | 1961-06-16 | 1965-01-20 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH273765A CH476744A (en) | 1961-06-16 | 1961-06-16 | Process for the preparation of substituted 2- (2'-hydroxyphenyl) benzotriazole compounds |
| CH709661A CH434280A (en) | 1961-06-16 | 1961-06-16 | Process for the preparation of substituted 2- (2'-hydroxyphenyl) benzotriazole compounds |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH476744A true CH476744A (en) | 1969-08-15 |
Family
ID=4319870
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH273865A CH476745A (en) | 1961-06-16 | 1961-06-16 | Process for the preparation of substituted 2- (2'-hydroxyphenyl) benzotriazole compounds |
| CH273765A CH476744A (en) | 1961-06-16 | 1961-06-16 | Process for the preparation of substituted 2- (2'-hydroxyphenyl) benzotriazole compounds |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH273865A CH476745A (en) | 1961-06-16 | 1961-06-16 | Process for the preparation of substituted 2- (2'-hydroxyphenyl) benzotriazole compounds |
Country Status (5)
| Country | Link |
|---|---|
| AT (2) | AT240357B (en) |
| CH (2) | CH476745A (en) |
| DK (1) | DK108816C (en) |
| ES (1) | ES278352A1 (en) |
| SE (1) | SE320669B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12384785B2 (en) * | 2018-12-06 | 2025-08-12 | Basf Se | Procedure for the formation of 2H-benzotriazole bodies and congeners |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IT1295933B1 (en) * | 1997-10-30 | 1999-05-28 | Great Lakes Chemical Italia | 2- (2'-HYDROXYPHENYL) BENZOTHRIAZOLS AND PROCEDURE FOR THEIR PREPARATION |
-
1961
- 1961-06-16 CH CH273865A patent/CH476745A/en not_active IP Right Cessation
- 1961-06-16 CH CH273765A patent/CH476744A/en not_active IP Right Cessation
-
1962
- 1962-06-15 SE SE6723/62A patent/SE320669B/xx unknown
- 1962-06-15 AT AT484162A patent/AT240357B/en active
- 1962-06-15 DK DK267562AA patent/DK108816C/en active
- 1962-06-15 AT AT110964A patent/AT246708B/en active
- 1962-06-15 ES ES278352A patent/ES278352A1/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12384785B2 (en) * | 2018-12-06 | 2025-08-12 | Basf Se | Procedure for the formation of 2H-benzotriazole bodies and congeners |
Also Published As
| Publication number | Publication date |
|---|---|
| AT240357B (en) | 1965-05-25 |
| ES278352A1 (en) | 1962-12-01 |
| DK108816C (en) | 1968-02-12 |
| AT246708B (en) | 1966-05-10 |
| CH476745A (en) | 1969-08-15 |
| SE320669B (en) | 1970-02-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PL | Patent ceased |