CH472060A - Lichtempfindliches Material zur Herstellung von Reliefformen - Google Patents
Lichtempfindliches Material zur Herstellung von ReliefformenInfo
- Publication number
- CH472060A CH472060A CH1157766A CH1157766A CH472060A CH 472060 A CH472060 A CH 472060A CH 1157766 A CH1157766 A CH 1157766A CH 1157766 A CH1157766 A CH 1157766A CH 472060 A CH472060 A CH 472060A
- Authority
- CH
- Switzerland
- Prior art keywords
- production
- photosensitive material
- relief shapes
- relief
- shapes
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F36/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds
- C08F36/02—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds
- C08F36/20—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds unconjugated
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L77/00—Compositions of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Compositions of derivatives of such polymers
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polyamides (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DEB0083257 | 1965-08-13 |
Publications (1)
Publication Number | Publication Date |
---|---|
CH472060A true CH472060A (de) | 1969-04-30 |
Family
ID=6981871
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CH1157766A CH472060A (de) | 1965-08-13 | 1966-08-11 | Lichtempfindliches Material zur Herstellung von Reliefformen |
Country Status (4)
Country | Link |
---|---|
BE (1) | BE685315A (de) |
CH (1) | CH472060A (de) |
DE (1) | DE1447929A1 (de) |
FR (1) | FR1488914A (de) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2064079C2 (de) * | 1970-12-28 | 1982-09-09 | Hoechst Ag, 6000 Frankfurt | Photopolymerisierbares Gemisch |
WO1980001212A1 (en) * | 1978-12-01 | 1980-06-12 | Toray Industries | Light-sensitive polyamide resin composition |
DE4432648A1 (de) | 1994-09-14 | 1996-03-21 | Bayer Ag | Tertiäre Amine, ein Verfahren zu ihrer Herstellung und ihre Verwendung als Härtungsbeschleuniger |
-
0
- FR FR1488914D patent/FR1488914A/fr not_active Expired
-
1965
- 1965-08-13 DE DE19651447929 patent/DE1447929A1/de active Pending
-
1966
- 1966-08-10 BE BE685315D patent/BE685315A/xx unknown
- 1966-08-11 CH CH1157766A patent/CH472060A/de unknown
Also Published As
Publication number | Publication date |
---|---|
DE1447929A1 (de) | 1968-12-12 |
FR1488914A (de) | 1967-10-26 |
BE685315A (de) | 1967-02-10 |
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