AT287484B - Lichtempfindliches Gemisch zur Herstellung von lichtempfindlichem Aufzeichnungsmaterial - Google Patents
Lichtempfindliches Gemisch zur Herstellung von lichtempfindlichem AufzeichnungsmaterialInfo
- Publication number
- AT287484B AT287484B AT1078668A AT1078668A AT287484B AT 287484 B AT287484 B AT 287484B AT 1078668 A AT1078668 A AT 1078668A AT 1078668 A AT1078668 A AT 1078668A AT 287484 B AT287484 B AT 287484B
- Authority
- AT
- Austria
- Prior art keywords
- photosensitive
- production
- recording material
- mixture
- photosensitive recording
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
- G03F7/0295—Photolytic halogen compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F26/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen
- C08F26/06—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen by a heterocyclic ring containing nitrogen
- C08F26/12—N-Vinyl-carbazole
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEK63858A DE1298414B (de) | 1967-11-09 | 1967-11-09 | Lichtempfindliches Gemisch |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AT287484B true AT287484B (de) | 1971-01-25 |
Family
ID=7231330
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT1078668A AT287484B (de) | 1967-11-09 | 1968-11-06 | Lichtempfindliches Gemisch zur Herstellung von lichtempfindlichem Aufzeichnungsmaterial |
Country Status (4)
| Country | Link |
|---|---|
| AT (1) | AT287484B (de) |
| BE (1) | BE723475A (de) |
| DE (1) | DE1298414B (de) |
| NL (1) | NL6815474A (de) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2718259C2 (de) * | 1977-04-25 | 1982-11-25 | Hoechst Ag, 6000 Frankfurt | Strahlungsempfindliches Gemisch |
| GB8321813D0 (en) * | 1983-08-12 | 1983-09-14 | Vickers Plc | Radiation sensitive compounds |
| DE3613632A1 (de) * | 1986-04-23 | 1987-10-29 | Hoechst Ag | Photopolymerisierbares gemisch und dieses enthaltendes photopolymerisierbares aufzeichnungsmaterial |
| DE3930087A1 (de) * | 1989-09-09 | 1991-03-14 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
| DE3930086A1 (de) * | 1989-09-09 | 1991-03-21 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL256340A (de) * | 1959-09-28 |
-
1967
- 1967-11-09 DE DEK63858A patent/DE1298414B/de active Pending
-
1968
- 1968-10-30 NL NL6815474A patent/NL6815474A/xx unknown
- 1968-11-06 AT AT1078668A patent/AT287484B/de active
- 1968-11-06 BE BE723475D patent/BE723475A/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| BE723475A (de) | 1969-05-06 |
| NL6815474A (de) | 1969-05-13 |
| DE1298414B (de) | 1969-06-26 |
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