CH450100A - Cathode sputtering device - Google Patents

Cathode sputtering device

Info

Publication number
CH450100A
CH450100A CH952864A CH952864A CH450100A CH 450100 A CH450100 A CH 450100A CH 952864 A CH952864 A CH 952864A CH 952864 A CH952864 A CH 952864A CH 450100 A CH450100 A CH 450100A
Authority
CH
Switzerland
Prior art keywords
sputtering device
cathode sputtering
cathode
sputtering
Prior art date
Application number
CH952864A
Other languages
German (de)
Inventor
Charles Theurer Henry
Original Assignee
Western Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co filed Critical Western Electric Co
Publication of CH450100A publication Critical patent/CH450100A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/31—Electron-beam or ion-beam tubes for localised treatment of objects for cutting or drilling
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/825—Apparatus per se, device per se, or process of making or operating same
    • Y10S505/826—Coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
CH952864A 1963-07-22 1964-07-21 Cathode sputtering device CH450100A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US296550A US3294669A (en) 1963-07-22 1963-07-22 Apparatus for sputtering in a highly purified gas atmosphere

Publications (1)

Publication Number Publication Date
CH450100A true CH450100A (en) 1968-01-15

Family

ID=23142483

Family Applications (1)

Application Number Title Priority Date Filing Date
CH952864A CH450100A (en) 1963-07-22 1964-07-21 Cathode sputtering device

Country Status (7)

Country Link
US (1) US3294669A (en)
BE (1) BE650801A (en)
CH (1) CH450100A (en)
DE (1) DE1515320A1 (en)
GB (1) GB1077214A (en)
NL (1) NL6408369A (en)
SE (1) SE314267B (en)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3544445A (en) * 1966-09-01 1970-12-01 Bendix Corp Floating shield in a triode sputtering apparatus protecting the base from the discharge
US3484358A (en) * 1966-09-01 1969-12-16 Bell Telephone Labor Inc Method and apparatus for reactive sputtering wherein the sputtering target is contacted by an inert gas
US3483110A (en) * 1967-05-19 1969-12-09 Bell Telephone Labor Inc Preparation of thin films of vanadium dioxide
US3507774A (en) * 1967-06-02 1970-04-21 Nat Res Corp Low energy sputtering apparatus for operation below one micron pressure
GB1172106A (en) * 1967-06-29 1969-11-26 Edwards High Vacuum Int Ltd Improvements in or relating to Pressure Control in Vacuum Apparatus
US3892650A (en) * 1972-12-29 1975-07-01 Ibm Chemical sputtering purification process
GB1485266A (en) * 1973-11-20 1977-09-08 Atomic Energy Authority Uk Storage of material
GB1500701A (en) * 1974-01-24 1978-02-08 Atomic Energy Authority Uk Vapour deposition apparatus
US4094762A (en) * 1974-11-05 1978-06-13 United Kingdom Atomic Energy Authority Method for the storage of material
US4290875A (en) * 1980-03-18 1981-09-22 Ultra Electronic Controls Limited Sputtering apparatus
US4622452A (en) * 1983-07-21 1986-11-11 Multi-Arc Vacuum Systems, Inc. Electric arc vapor deposition electrode apparatus
CA2065581C (en) * 1991-04-22 2002-03-12 Andal Corp. Plasma enhancement apparatus and method for physical vapor deposition
US5656138A (en) * 1991-06-18 1997-08-12 The Optical Corporation Of America Very high vacuum magnetron sputtering method and apparatus for precision optical coatings
US6423419B1 (en) 1995-07-19 2002-07-23 Teer Coatings Limited Molybdenum-sulphur coatings
US5656091A (en) * 1995-11-02 1997-08-12 Vacuum Plating Technology Corporation Electric arc vapor deposition apparatus and method
DE19958643C1 (en) * 1999-12-06 2001-05-10 Fraunhofer Ges Forschung Apparatus for coating an object, e.g. turbine blades comprises an inner chamber made of a heat-resistant material of low heat conductivity arranged in a vacuum chamber and a sputtering source
FR2965972A1 (en) * 2010-10-12 2012-04-13 Essilor Int Ion gun casing useful in device to deposit material in multilayer stack comprising low and high refractive index layers and hydrophobic layer to treat surfaces of e.g. spectacle lenses, comprises internal surface to cover outlet of ion gun

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2305758A (en) * 1937-05-25 1942-12-22 Berghaus Bernhard Coating of articles by cathode disintegration
US2200909A (en) * 1937-11-30 1940-05-14 Berghaus Metallization of metal articles by cathode disintegration
US2998376A (en) * 1956-10-29 1961-08-29 Temescal Metallurgical Corp High-vacuum evaporator
US3073770A (en) * 1961-04-24 1963-01-15 Bell Telephone Labor Inc Mullite synthesis
US3210263A (en) * 1962-01-11 1965-10-05 Nuclear Materials & Equipment Electric discharge apparatus for etching

Also Published As

Publication number Publication date
GB1077214A (en) 1967-07-26
BE650801A (en) 1964-11-16
NL6408369A (en) 1965-01-25
DE1515320A1 (en) 1969-08-14
US3294669A (en) 1966-12-27
SE314267B (en) 1969-09-01

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