CH450100A - Vorrichtung zur Kathodenzerstäubung - Google Patents
Vorrichtung zur KathodenzerstäubungInfo
- Publication number
- CH450100A CH450100A CH952864A CH952864A CH450100A CH 450100 A CH450100 A CH 450100A CH 952864 A CH952864 A CH 952864A CH 952864 A CH952864 A CH 952864A CH 450100 A CH450100 A CH 450100A
- Authority
- CH
- Switzerland
- Prior art keywords
- sputtering device
- cathode sputtering
- cathode
- sputtering
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/31—Electron-beam or ion-beam tubes for localised treatment of objects for cutting or drilling
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S505/00—Superconductor technology: apparatus, material, process
- Y10S505/825—Apparatus per se, device per se, or process of making or operating same
- Y10S505/826—Coating
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US296550A US3294669A (en) | 1963-07-22 | 1963-07-22 | Apparatus for sputtering in a highly purified gas atmosphere |
Publications (1)
Publication Number | Publication Date |
---|---|
CH450100A true CH450100A (de) | 1968-01-15 |
Family
ID=23142483
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CH952864A CH450100A (de) | 1963-07-22 | 1964-07-21 | Vorrichtung zur Kathodenzerstäubung |
Country Status (7)
Country | Link |
---|---|
US (1) | US3294669A (de) |
BE (1) | BE650801A (de) |
CH (1) | CH450100A (de) |
DE (1) | DE1515320A1 (de) |
GB (1) | GB1077214A (de) |
NL (1) | NL6408369A (de) |
SE (1) | SE314267B (de) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3484358A (en) * | 1966-09-01 | 1969-12-16 | Bell Telephone Labor Inc | Method and apparatus for reactive sputtering wherein the sputtering target is contacted by an inert gas |
US3544445A (en) * | 1966-09-01 | 1970-12-01 | Bendix Corp | Floating shield in a triode sputtering apparatus protecting the base from the discharge |
US3483110A (en) * | 1967-05-19 | 1969-12-09 | Bell Telephone Labor Inc | Preparation of thin films of vanadium dioxide |
US3507774A (en) * | 1967-06-02 | 1970-04-21 | Nat Res Corp | Low energy sputtering apparatus for operation below one micron pressure |
GB1172106A (en) * | 1967-06-29 | 1969-11-26 | Edwards High Vacuum Int Ltd | Improvements in or relating to Pressure Control in Vacuum Apparatus |
US3892650A (en) * | 1972-12-29 | 1975-07-01 | Ibm | Chemical sputtering purification process |
GB1485266A (en) * | 1973-11-20 | 1977-09-08 | Atomic Energy Authority Uk | Storage of material |
GB1500701A (en) * | 1974-01-24 | 1978-02-08 | Atomic Energy Authority Uk | Vapour deposition apparatus |
US4094762A (en) * | 1974-11-05 | 1978-06-13 | United Kingdom Atomic Energy Authority | Method for the storage of material |
US4290875A (en) * | 1980-03-18 | 1981-09-22 | Ultra Electronic Controls Limited | Sputtering apparatus |
US4622452A (en) * | 1983-07-21 | 1986-11-11 | Multi-Arc Vacuum Systems, Inc. | Electric arc vapor deposition electrode apparatus |
CA2065581C (en) * | 1991-04-22 | 2002-03-12 | Andal Corp. | Plasma enhancement apparatus and method for physical vapor deposition |
US5656138A (en) * | 1991-06-18 | 1997-08-12 | The Optical Corporation Of America | Very high vacuum magnetron sputtering method and apparatus for precision optical coatings |
US6423419B1 (en) | 1995-07-19 | 2002-07-23 | Teer Coatings Limited | Molybdenum-sulphur coatings |
US5656091A (en) * | 1995-11-02 | 1997-08-12 | Vacuum Plating Technology Corporation | Electric arc vapor deposition apparatus and method |
DE19958643C1 (de) * | 1999-12-06 | 2001-05-10 | Fraunhofer Ges Forschung | Vorrichtung und Verfahren zur Beschichtung von Gegenständen bei hoher Temperatur sowie Verwendung |
FR2965972A1 (fr) * | 2010-10-12 | 2012-04-13 | Essilor Int | Cache canon a ions, dispositif et procede de depot de materiaux par evaporation sous vide comprenant au moins un tel cache canon a ions |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2305758A (en) * | 1937-05-25 | 1942-12-22 | Berghaus Bernhard | Coating of articles by cathode disintegration |
US2200909A (en) * | 1937-11-30 | 1940-05-14 | Berghaus | Metallization of metal articles by cathode disintegration |
US2998376A (en) * | 1956-10-29 | 1961-08-29 | Temescal Metallurgical Corp | High-vacuum evaporator |
US3073770A (en) * | 1961-04-24 | 1963-01-15 | Bell Telephone Labor Inc | Mullite synthesis |
US3210263A (en) * | 1962-01-11 | 1965-10-05 | Nuclear Materials & Equipment | Electric discharge apparatus for etching |
-
1963
- 1963-07-22 US US296550A patent/US3294669A/en not_active Expired - Lifetime
-
1964
- 1964-07-16 DE DE19641515320 patent/DE1515320A1/de active Pending
- 1964-07-20 BE BE650801D patent/BE650801A/xx unknown
- 1964-07-21 CH CH952864A patent/CH450100A/de unknown
- 1964-07-21 SE SE8877/64A patent/SE314267B/xx unknown
- 1964-07-22 NL NL6408369A patent/NL6408369A/xx unknown
- 1964-08-04 GB GB30681/64A patent/GB1077214A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
SE314267B (de) | 1969-09-01 |
NL6408369A (de) | 1965-01-25 |
GB1077214A (en) | 1967-07-26 |
US3294669A (en) | 1966-12-27 |
DE1515320A1 (de) | 1969-08-14 |
BE650801A (de) | 1964-11-16 |
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