CH434976A - Lichtempfindliche Schicht zur Herstellung von Druckformen - Google Patents
Lichtempfindliche Schicht zur Herstellung von DruckformenInfo
- Publication number
- CH434976A CH434976A CH1274664A CH1274664A CH434976A CH 434976 A CH434976 A CH 434976A CH 1274664 A CH1274664 A CH 1274664A CH 1274664 A CH1274664 A CH 1274664A CH 434976 A CH434976 A CH 434976A
- Authority
- CH
- Switzerland
- Prior art keywords
- production
- photosensitive layer
- printing forms
- printing
- forms
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE1963K0050993 DE1447015B2 (de) | 1963-10-03 | 1963-10-03 | Lichtempfindliche schichten zur herstellung von druckformen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH434976A true CH434976A (de) | 1967-04-30 |
Family
ID=7225836
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH1274664A CH434976A (de) | 1963-10-03 | 1964-10-01 | Lichtempfindliche Schicht zur Herstellung von Druckformen |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US3269837A (de) |
| AT (1) | AT252966B (de) |
| BE (1) | BE653790A (de) |
| CH (1) | CH434976A (de) |
| DE (1) | DE1447015B2 (de) |
| GB (1) | GB1031547A (de) |
| NL (1) | NL6411486A (de) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1116674A (en) * | 1966-02-28 | 1968-06-12 | Agfa Gevaert Nv | Naphthoquinone diazide sulphofluoride |
| CA1120763A (en) * | 1977-11-23 | 1982-03-30 | James A. Carothers | Enhancement of resist development |
| US4268602A (en) * | 1978-12-05 | 1981-05-19 | Toray Industries, Ltd. | Photosensitive O-quinone diazide containing composition |
| DE3541723A1 (de) * | 1985-11-26 | 1987-05-27 | Hoechst Ag | Lichtempfindliches, diazoniumgruppen enthaltendes polykondensationsprodukt, verfahren zu seiner herstellung und lichtempfindliches aufzeichnungsmaterial, das dieses polykondensationsprodukt enthaelt |
| US5173390A (en) * | 1986-06-27 | 1992-12-22 | Texas Instruments Incorporated | Water soluble contrast enhancement composition and method of use |
| US4997742A (en) * | 1986-06-27 | 1991-03-05 | Texas Instruments Inc. | Water soluble contrast enhancement composition with 1-oxy-2 diazonaphthalene sulfonamide salt and polyvinyl alcohol |
| US4816380A (en) * | 1986-06-27 | 1989-03-28 | Texas Instruments Incorporated | Water soluble contrast enhancement layer method of forming resist image on semiconductor chip |
| US4797345A (en) * | 1987-07-01 | 1989-01-10 | Olin Hunt Specialty Products, Inc. | Light-sensitive 1,2-naphthoquinone-2-diazide-4-sulfonic acid monoesters of cycloalkyl substituted phenol and their use in light-sensitive mixtures |
| US5272026A (en) * | 1987-12-18 | 1993-12-21 | Ucb S.A. | Negative image process utilizing photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester or phenolic resin with diazoquinone sulfonic acid or diazoquinone carboxylic acid, and associated imaged article |
| GB8729510D0 (en) * | 1987-12-18 | 1988-02-03 | Ucb Sa | Photosensitive compositions containing phenolic resins & diazoquinone compounds |
| DE3822522A1 (de) * | 1988-07-04 | 1990-03-22 | Hoechst Ag | 1,2-naphthochinon-2-diazid-sulfonsaeureamide und lichtempfindliche gemische, die diese enthalten |
| JP2599007B2 (ja) * | 1989-11-13 | 1997-04-09 | 富士写真フイルム株式会社 | ポジ型感光性組成物 |
| DE4134526A1 (de) * | 1990-10-18 | 1992-05-14 | Toyo Gosei Kogyo Kk | Positive photoresist-zusammensetzung und mustererzeugungsverfahren unter verwendung dieser zusammensetzung |
| JP2008230028A (ja) * | 2007-03-20 | 2008-10-02 | Fujifilm Corp | 機上現像可能な平版印刷版原版 |
-
1963
- 1963-10-03 DE DE1963K0050993 patent/DE1447015B2/de active Granted
-
1964
- 1964-09-30 BE BE653790A patent/BE653790A/xx unknown
- 1964-09-30 AT AT835164A patent/AT252966B/de active
- 1964-10-01 CH CH1274664A patent/CH434976A/de unknown
- 1964-10-01 US US400936A patent/US3269837A/en not_active Expired - Lifetime
- 1964-10-02 NL NL6411486A patent/NL6411486A/xx unknown
- 1964-10-02 GB GB40258/64A patent/GB1031547A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| NL6411486A (de) | 1965-04-05 |
| AT252966B (de) | 1967-03-10 |
| DE1447015B2 (de) | 1973-03-15 |
| US3269837A (en) | 1966-08-30 |
| GB1031547A (en) | 1966-06-02 |
| BE653790A (de) | 1965-03-30 |
| DE1447015A1 (de) | 1969-01-09 |
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