CH432517A - Verfahren zur Darstellung von Oniumfluoriden - Google Patents

Verfahren zur Darstellung von Oniumfluoriden

Info

Publication number
CH432517A
CH432517A CH241164A CH241164A CH432517A CH 432517 A CH432517 A CH 432517A CH 241164 A CH241164 A CH 241164A CH 241164 A CH241164 A CH 241164A CH 432517 A CH432517 A CH 432517A
Authority
CH
Switzerland
Prior art keywords
preparation
onium fluorides
onium
fluorides
Prior art date
Application number
CH241164A
Other languages
English (en)
Inventor
Urban Gerd
Richard Dr Doetzer
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of CH432517A publication Critical patent/CH432517A/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/004—Details
    • H01G9/022—Electrolytes; Absorbents
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
    • C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
    • C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D213/06—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom containing only hydrogen and carbon atoms in addition to the ring nitrogen atom
    • C07D213/16—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom containing only hydrogen and carbon atoms in addition to the ring nitrogen atom containing only one pyridine ring
    • C07D213/20—Quaternary compounds thereof
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic System
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic System
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/535—Organo-phosphoranes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic System
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/54—Quaternary phosphonium compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic System
    • C07F9/66—Arsenic compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic System
    • C07F9/66—Arsenic compounds
    • C07F9/70—Organo-arsenic compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic System
    • C07F9/66—Arsenic compounds
    • C07F9/70—Organo-arsenic compounds
    • C07F9/74—Aromatic compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic System
    • C07F9/90—Antimony compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic System
    • C07F9/90—Antimony compounds
    • C07F9/92—Aromatic compounds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
    • C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
    • C23F11/10—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
CH241164A 1963-05-18 1964-02-27 Verfahren zur Darstellung von Oniumfluoriden CH432517A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DES85280A DE1191813B (de) 1963-05-18 1963-05-18 Verfahren zur Herstellung von Oniumfluoriden der Elemente der V. Hauptgruppe

Publications (1)

Publication Number Publication Date
CH432517A true CH432517A (de) 1967-03-31

Family

ID=7512271

Family Applications (1)

Application Number Title Priority Date Filing Date
CH241164A CH432517A (de) 1963-05-18 1964-02-27 Verfahren zur Darstellung von Oniumfluoriden

Country Status (6)

Country Link
US (1) US3388131A (de)
AT (1) AT244353B (de)
CH (1) CH432517A (de)
DE (1) DE1191813B (de)
GB (1) GB1070786A (de)
SE (1) SE345658B (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2566769B1 (fr) * 1984-06-27 1987-06-12 Univ Angers Agent de fluoration de composes organiques notamment de composes acetyleniques, leur procede de preparation et leur utilisation dans les reactions d'addition ou de substitution nucleophile
JPS61108767A (ja) * 1984-10-31 1986-05-27 竹本油脂株式会社 合成繊維用帯電防止剤
EP0457966A1 (de) * 1990-05-21 1991-11-27 Rockwell International Corporation Anhydrisches Tetramethylammoniumfluorid, kein Chlorid und Bifluorid enthaltend
US5369212A (en) * 1993-02-26 1994-11-29 The United States Of America As Represented By The Secretary Of The Air Force Method of preparing tetramethylammonium azide
TWI726900B (zh) 2015-08-04 2021-05-11 美商陶氏農業科學公司 用於氟化化合物之過程

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA673338A (en) * 1963-10-29 Vacuum Concrete Corporation Of America Vacuum lifter
US3178435A (en) * 1965-04-13 New pyridinium compounds
US2221831A (en) * 1939-04-07 1940-11-19 Jensen Salsbery Lab Inc Antimonyl catechol salicylic acid sodium salt
BE493873A (de) * 1949-02-15
US2694715A (en) * 1949-12-20 1954-11-16 California Research Corp Process of producing quaternary ammonium salts and products thereof
US2698338A (en) * 1952-07-11 1954-12-28 Monsanto Chemicals Stabilization of unsaturated nitriles
US2941004A (en) * 1955-05-19 1960-06-14 Pfizer & Co C 1, 5-bis-dimethylamino-3-pentanol diethobromide
FR1154645A (fr) * 1955-07-13 1958-04-14 Montedison Spa Procédé pour la préparation de xanthates d'arsenic et composés parasiticides obtenus par ce procédé
US2826582A (en) * 1955-10-10 1958-03-11 Continental Oil Co Preparation of quaternary ammonium halides
US2933529A (en) * 1956-01-09 1960-04-19 Rohm & Haas Symmetrical diquaternary ammonium compounds
US2909525A (en) * 1957-08-08 1959-10-20 Warner Lambert Pharmaceutical Anti-fungal compounds
US2993924A (en) * 1957-10-04 1961-07-25 Hooker Chemical Corp Esters of antimonous acids and their pentavalent derivatives and methods of preparing same
US3145234A (en) * 1959-07-01 1964-08-18 American Cyanamid Co Organic phosphine derivatives and methods of preparating same
US3010998A (en) * 1960-05-20 1961-11-28 Monsanto Chemicals Phosphorus aromatic compounds

Also Published As

Publication number Publication date
AT244353B (de) 1966-01-10
DE1191813B (de) 1965-04-29
GB1070786A (en) 1967-06-01
SE345658B (de) 1972-06-05
US3388131A (en) 1968-06-11

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