CH405504A - Verfahren zur Herstellung eines Injektionslasers - Google Patents

Verfahren zur Herstellung eines Injektionslasers

Info

Publication number
CH405504A
CH405504A CH193864A CH193864A CH405504A CH 405504 A CH405504 A CH 405504A CH 193864 A CH193864 A CH 193864A CH 193864 A CH193864 A CH 193864A CH 405504 A CH405504 A CH 405504A
Authority
CH
Switzerland
Prior art keywords
manufacturing
injection laser
laser
injection
Prior art date
Application number
CH193864A
Other languages
English (en)
Inventor
Carter Marinace John
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Publication of CH405504A publication Critical patent/CH405504A/de

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/30Structure or shape of the active region; Materials used for the active region
    • H01S5/32Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/30Structure or shape of the active region; Materials used for the active region
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/05Etch and refill
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/115Orientation

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Optics & Photonics (AREA)
  • Electromagnetism (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Led Devices (AREA)
  • Semiconductor Lasers (AREA)
CH193864A 1963-02-21 1964-02-18 Verfahren zur Herstellung eines Injektionslasers CH405504A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US260284A US3349475A (en) 1963-02-21 1963-02-21 Planar injection laser structure

Publications (1)

Publication Number Publication Date
CH405504A true CH405504A (de) 1966-01-15

Family

ID=22988549

Family Applications (1)

Application Number Title Priority Date Filing Date
CH193864A CH405504A (de) 1963-02-21 1964-02-18 Verfahren zur Herstellung eines Injektionslasers

Country Status (6)

Country Link
US (1) US3349475A (de)
BE (1) BE644044A (de)
CH (1) CH405504A (de)
GB (1) GB996937A (de)
NL (1) NL6401222A (de)
SE (1) SE318041B (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1052379A (de) * 1963-03-28 1900-01-01
US3999282A (en) * 1964-02-13 1976-12-28 Hitachi, Ltd. Method for manufacturing semiconductor devices having oxide films and the semiconductor devices manufactured thereby
GB1100124A (en) * 1964-02-13 1968-01-24 Hitachi Ltd Semiconductor devices and methods for producing the same
US3768037A (en) * 1965-11-26 1973-10-23 Hitachi Ltd Semiconductor diode laser device
FR1564474A (de) * 1966-01-31 1969-04-25
US3531735A (en) * 1966-06-28 1970-09-29 Gen Electric Semiconductor laser having grooves to prevent radiation transverse to the optical axis
US3432919A (en) * 1966-10-31 1969-03-18 Raytheon Co Method of making semiconductor diodes
US3458369A (en) * 1966-12-01 1969-07-29 Ibm Process for preforming crystalline bodies
US3593190A (en) * 1969-04-16 1971-07-13 Texas Instruments Inc Electron beam pumped semiconductor laser having an array of mosaic elements
US3816906A (en) * 1969-06-20 1974-06-18 Siemens Ag Method of dividing mg-al spinel substrate wafers coated with semiconductor material and provided with semiconductor components
US3579142A (en) * 1969-07-18 1971-05-18 Us Navy Thin film laser
JPS6041478B2 (ja) * 1979-09-10 1985-09-17 富士通株式会社 半導体レ−ザ素子の製造方法
FR2465337A1 (fr) * 1979-09-11 1981-03-20 Landreau Jean Procede de fabrication d'un laser a semi-conducteur a confinements transverses optique et electrique et laser obtenu par ce procede

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2561411A (en) * 1950-03-08 1951-07-24 Bell Telephone Labor Inc Semiconductor signal translating device
US2796562A (en) * 1952-06-02 1957-06-18 Rca Corp Semiconductive device and method of fabricating same
US3193418A (en) * 1960-10-27 1965-07-06 Fairchild Camera Instr Co Semiconductor device fabrication
NL299675A (de) * 1962-10-24 1900-01-01
US3247576A (en) * 1962-10-30 1966-04-26 Ibm Method of fabrication of crystalline shapes

Also Published As

Publication number Publication date
NL6401222A (de) 1964-08-24
US3349475A (en) 1967-10-31
SE318041B (de) 1969-12-01
GB996937A (en) 1965-06-30
BE644044A (de) 1964-06-15

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