CH400380A - Deflection device for charge carrier beams - Google Patents

Deflection device for charge carrier beams

Info

Publication number
CH400380A
CH400380A CH665762A CH665762A CH400380A CH 400380 A CH400380 A CH 400380A CH 665762 A CH665762 A CH 665762A CH 665762 A CH665762 A CH 665762A CH 400380 A CH400380 A CH 400380A
Authority
CH
Switzerland
Prior art keywords
charge carrier
deflection device
carrier beams
beams
deflection
Prior art date
Application number
CH665762A
Other languages
German (de)
Inventor
Dietrich Walter Dr Dipl-Phys
Original Assignee
Heraeus Gmbh W C
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Heraeus Gmbh W C filed Critical Heraeus Gmbh W C
Publication of CH400380A publication Critical patent/CH400380A/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)
CH665762A 1961-08-31 1962-06-01 Deflection device for charge carrier beams CH400380A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE1961H0043528 DE1248175B (en) 1961-08-31 1961-08-31 Electron gun

Publications (1)

Publication Number Publication Date
CH400380A true CH400380A (en) 1965-10-15

Family

ID=7155219

Family Applications (1)

Application Number Title Priority Date Filing Date
CH665762A CH400380A (en) 1961-08-31 1962-06-01 Deflection device for charge carrier beams

Country Status (3)

Country Link
CH (1) CH400380A (en)
DE (1) DE1248175B (en)
GB (1) GB1013403A (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1955846C3 (en) * 1969-11-06 1973-10-31 Leybold-Heraeus Gmbh & Co Kg, 5000 Koeln Electron gun for heating materials in a vacuum container
DE2519537C2 (en) * 1975-05-02 1982-11-04 Leybold-Heraeus GmbH, 5000 Köln Electron beam device for heating, melting and evaporation purposes with deflection systems
DE2528032C2 (en) * 1975-06-24 1983-06-09 Leybold-Heraeus GmbH, 5000 Köln Electron beam generators for heating, melting and evaporation purposes
DE3339131A1 (en) * 1983-10-28 1985-05-09 Leybold-Heraeus GmbH, 5000 Köln ELECTRONIC BEAM EVAPORATOR WITH AT LEAST TWO MAGNETIC DEFLECTION SYSTEMS
DE4104845C5 (en) * 1991-02-16 2004-09-09 PTR Präzisionstechnik GmbH Electron beam generator, in particular for an electron beam gun
CN117387378B (en) * 2023-12-12 2024-04-16 陕西煜成和汇金属材料有限公司 Slag skimming device of electron beam melting furnace

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2892946A (en) * 1955-11-25 1959-06-30 High Voltage Engineering Corp Method of and apparatus for the more efficient use of high-energy charged particles in the treatment of gasphase systems
US2887583A (en) * 1956-10-08 1959-05-19 High Voltage Engineering Corp Electron accelerator for irradiation
US2897365A (en) * 1956-09-28 1959-07-28 High Voltage Engineering Corp Irradiation method and apparatus
US2993120A (en) * 1959-01-14 1961-07-18 High Voltage Engineering Corp Electron irradiation

Also Published As

Publication number Publication date
GB1013403A (en) 1965-12-15
DE1248175B (en) 1967-08-24

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