CH387605A - Procédé de purification du silane - Google Patents

Procédé de purification du silane

Info

Publication number
CH387605A
CH387605A CH7565159A CH7565159A CH387605A CH 387605 A CH387605 A CH 387605A CH 7565159 A CH7565159 A CH 7565159A CH 7565159 A CH7565159 A CH 7565159A CH 387605 A CH387605 A CH 387605A
Authority
CH
Switzerland
Prior art keywords
purification process
silane purification
silane
purification
Prior art date
Application number
CH7565159A
Other languages
English (en)
Inventor
Glen Caswell Earl
Original Assignee
Union Carbide Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Union Carbide Corp filed Critical Union Carbide Corp
Publication of CH387605A publication Critical patent/CH387605A/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/04—Hydrides of silicon
    • C01B33/046—Purification

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
CH7565159A 1958-07-14 1959-07-11 Procédé de purification du silane CH387605A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US748162A US2971607A (en) 1958-07-14 1958-07-14 Method for purifying silance

Publications (1)

Publication Number Publication Date
CH387605A true CH387605A (fr) 1965-02-15

Family

ID=25008280

Family Applications (1)

Application Number Title Priority Date Filing Date
CH7565159A CH387605A (fr) 1958-07-14 1959-07-11 Procédé de purification du silane

Country Status (7)

Country Link
US (1) US2971607A (fr)
BE (1) BE580621A (fr)
CH (1) CH387605A (fr)
DE (1) DE1095796B (fr)
FR (1) FR1229553A (fr)
GB (1) GB908506A (fr)
NL (1) NL241272A (fr)

Families Citing this family (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB994076A (en) * 1960-08-11 1965-06-02 Haldor Frederik Axel Topsoe Method for purifying silicon halides
US3208200A (en) * 1961-05-18 1965-09-28 Continental Oil Co Low temperature adsorption process for purifying low molecular weight gases
BE632835A (fr) * 1962-06-04
US4099936A (en) * 1976-12-16 1978-07-11 Union Carbide Corporation Process for the purification of silane
GB1567096A (en) * 1977-02-22 1980-05-08 Gen Electric Process for removing biphenyls from
US5468653A (en) * 1982-08-24 1995-11-21 Semiconductor Energy Laboratory Co., Ltd. Photoelectric conversion device and method of making the same
US6346716B1 (en) 1982-12-23 2002-02-12 Semiconductor Energy Laboratory Co., Ltd. Semiconductor material having particular oxygen concentration and semiconductor device comprising the same
USRE38727E1 (en) 1982-08-24 2005-04-19 Semiconductor Energy Laboratory Co., Ltd. Photoelectric conversion device and method of making the same
US6664566B1 (en) 1982-08-24 2003-12-16 Semiconductor Energy Laboratory Co., Ltd. Photoelectric conversion device and method of making the same
USRE37441E1 (en) 1982-08-24 2001-11-13 Semiconductor Energy Laboratory Co., Ltd. Photoelectric conversion device
US5391893A (en) 1985-05-07 1995-02-21 Semicoductor Energy Laboratory Co., Ltd. Nonsingle crystal semiconductor and a semiconductor device using such semiconductor
JPS59115574A (ja) 1982-12-23 1984-07-04 Semiconductor Energy Lab Co Ltd 光電変換装置作製方法
US4532120A (en) * 1983-12-28 1985-07-30 Ethyl Corporation Silane purification process
US4727044A (en) 1984-05-18 1988-02-23 Semiconductor Energy Laboratory Co., Ltd. Method of making a thin film transistor with laser recrystallized source and drain
US7038238B1 (en) 1985-05-07 2006-05-02 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device having a non-single crystalline semiconductor layer
JPH0729049B2 (ja) * 1987-04-30 1995-04-05 三菱重工業株式会社 燃焼排ガス中の砒素化合物除去方法
DE3805282A1 (de) * 1988-02-19 1989-08-31 Wacker Chemitronic Verfahren zur entfernung von n-dotierenden verunreinigungen aus bei der gasphasenabscheidung von silicium anfallenden fluessigen oder gasfoermigen stoffen
DE3843313A1 (de) * 1988-12-22 1990-06-28 Wacker Chemitronic Verfahren zur entfernung von gasfoermigen kontaminierenden, insbesondere dotierstoffverbindungen aus halogensilanverbindungen enthaltenden traegergasen
US5290342A (en) * 1990-12-05 1994-03-01 Ethyl Corporation Silane compositions and process
US5211931A (en) * 1992-03-27 1993-05-18 Ethyl Corporation Removal of ethylene from silane using a distillation step after separation using a zeolite molecular sieve
US5232602A (en) * 1992-07-01 1993-08-03 Hemlock Semiconductor Corporation Phosphorous removal from tetrachlorosilane
US6083298A (en) * 1994-10-13 2000-07-04 Advanced Technology Materials, Inc. Process for fabricating a sorbent-based gas storage and dispensing system, utilizing sorbent material pretreatment
US6132492A (en) * 1994-10-13 2000-10-17 Advanced Technology Materials, Inc. Sorbent-based gas storage and delivery system for dispensing of high-purity gas, and apparatus and process for manufacturing semiconductor devices, products and precursor structures utilizing same
US5518528A (en) * 1994-10-13 1996-05-21 Advanced Technology Materials, Inc. Storage and delivery system for gaseous hydride, halide, and organometallic group V compounds
US6204180B1 (en) 1997-05-16 2001-03-20 Advanced Technology Materials, Inc. Apparatus and process for manufacturing semiconductor devices, products and precursor structures utilizing sorbent-based fluid storage and dispensing system for reagent delivery
US5707424A (en) * 1994-10-13 1998-01-13 Advanced Technology Materials, Inc. Process system with integrated gas storage and delivery unit
US5704967A (en) * 1995-10-13 1998-01-06 Advanced Technology Materials, Inc. Fluid storage and delivery system comprising high work capacity physical sorbent
US5676735A (en) * 1996-10-31 1997-10-14 Advanced Technology Materials, Inc. Reclaiming system for gas recovery from decommissioned gas storage and dispensing vessels and recycle of recovered gas
US5723644A (en) * 1997-04-28 1998-03-03 Dow Corning Corporation Phosphorous removal from chlorosilane
US6019823A (en) * 1997-05-16 2000-02-01 Advanced Technology Materials, Inc. Sorbent-based fluid storage and dispensing vessel with replaceable sorbent cartridge members
US6027547A (en) * 1997-05-16 2000-02-22 Advanced Technology Materials, Inc. Fluid storage and dispensing vessel with modified high surface area solid as fluid storage medium
US5985008A (en) * 1997-05-20 1999-11-16 Advanced Technology Materials, Inc. Sorbent-based fluid storage and dispensing system with high efficiency sorbent medium
US5851270A (en) * 1997-05-20 1998-12-22 Advanced Technology Materials, Inc. Low pressure gas source and dispensing apparatus with enhanced diffusive/extractive means
US5980608A (en) * 1998-01-07 1999-11-09 Advanced Technology Materials, Inc. Throughflow gas storage and dispensing system
US6660063B2 (en) 1998-03-27 2003-12-09 Advanced Technology Materials, Inc Sorbent-based gas storage and delivery system
US6406519B1 (en) * 1998-03-27 2002-06-18 Advanced Technology Materials, Inc. Gas cabinet assembly comprising sorbent-based gas storage and delivery system
US6070576A (en) * 1998-06-02 2000-06-06 Advanced Technology Materials, Inc. Adsorbent-based storage and dispensing system
US7105037B2 (en) * 2002-10-31 2006-09-12 Advanced Technology Materials, Inc. Semiconductor manufacturing facility utilizing exhaust recirculation
US6991671B2 (en) * 2002-12-09 2006-01-31 Advanced Technology Materials, Inc. Rectangular parallelepiped fluid storage and dispensing vessel
US7494530B2 (en) * 2002-12-10 2009-02-24 Advanced Technology Materials, Inc. Gas storage and dispensing system with monolithic carbon adsorbent
US6743278B1 (en) 2002-12-10 2004-06-01 Advanced Technology Materials, Inc. Gas storage and dispensing system with monolithic carbon adsorbent
US8002880B2 (en) 2002-12-10 2011-08-23 Advanced Technology Materials, Inc. Gas storage and dispensing system with monolithic carbon adsorbent
US8268046B2 (en) * 2008-05-16 2012-09-18 Matheson Tri-Gas Removal of impurities from hydrogen-containing materials
US8679231B2 (en) 2011-01-19 2014-03-25 Advanced Technology Materials, Inc. PVDF pyrolyzate adsorbent and gas storage and dispensing system utilizing same
WO2013181295A1 (fr) 2012-05-29 2013-12-05 Advanced Technology Materials, Inc. Adsorbant carbone pour l'élimination de sulfure d'hydrogène de gaz, et régénération de l'adsorbant

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2306610A (en) * 1941-02-24 1942-12-29 Barrer Richard Maling Fractionation of mixtures of hydrocarbons

Also Published As

Publication number Publication date
NL241272A (fr)
BE580621A (fr) 1959-11-03
GB908506A (en) 1962-10-17
US2971607A (en) 1961-02-14
FR1229553A (fr) 1960-09-08
DE1095796B (de) 1960-12-29

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