CH300348A - Lichtempfindliche Schicht für die photomechanische Reproduktion. - Google Patents

Lichtempfindliche Schicht für die photomechanische Reproduktion.

Info

Publication number
CH300348A
CH300348A CH300348DA CH300348A CH 300348 A CH300348 A CH 300348A CH 300348D A CH300348D A CH 300348DA CH 300348 A CH300348 A CH 300348A
Authority
CH
Switzerland
Prior art keywords
photosensitive layer
photomechanical reproduction
photomechanical
reproduction
photosensitive
Prior art date
Application number
Other languages
German (de)
English (en)
Inventor
Aktiengesellschaft Kalle Co
Original Assignee
Kalle & Co Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle & Co Ag filed Critical Kalle & Co Ag
Publication of CH300348A publication Critical patent/CH300348A/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Materials For Photolithography (AREA)
CH300348D 1950-10-31 1951-10-29 Lichtempfindliche Schicht für die photomechanische Reproduktion. CH300348A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK7867A DE865860C (de) 1950-10-31 1950-10-31 Lichtempfindliche Schichten fuer die photomechanische Reproduktion

Publications (1)

Publication Number Publication Date
CH300348A true CH300348A (de) 1954-07-31

Family

ID=7211722

Family Applications (1)

Application Number Title Priority Date Filing Date
CH300348D CH300348A (de) 1950-10-31 1951-10-29 Lichtempfindliche Schicht für die photomechanische Reproduktion.

Country Status (8)

Country Link
US (1) US3046120A (US08124317-20120228-C00034.png)
AT (1) AT175151B (US08124317-20120228-C00034.png)
BE (1) BE506677A (US08124317-20120228-C00034.png)
CH (1) CH300348A (US08124317-20120228-C00034.png)
DE (1) DE865860C (US08124317-20120228-C00034.png)
FR (1) FR1044248A (US08124317-20120228-C00034.png)
GB (1) GB711626A (US08124317-20120228-C00034.png)
NL (1) NL78779C (US08124317-20120228-C00034.png)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0225464A2 (en) * 1985-12-10 1987-06-16 International Business Machines Corporation Composite resist structures

Families Citing this family (102)

* Cited by examiner, † Cited by third party
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BE506677A (US08124317-20120228-C00034.png) * 1950-10-31
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BE560264A (US08124317-20120228-C00034.png) * 1956-09-25
US3175908A (en) * 1959-07-29 1965-03-30 Kalle Ag Production of relief printing plates
NL130712C (US08124317-20120228-C00034.png) * 1959-07-29
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NL130926C (US08124317-20120228-C00034.png) * 1959-09-04
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BE625567A (US08124317-20120228-C00034.png) * 1961-12-04
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DE2653428C3 (de) * 1976-11-24 1979-05-17 Claus Koenig Kg, 8520 Erlangen Farbfolie zum Herstellen einer Vorlage für Werbezwecke
JPS549619A (en) * 1977-06-23 1979-01-24 Oji Paper Co Photosensitive composition
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JPS561044A (en) * 1979-06-16 1981-01-08 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS561045A (en) * 1979-06-16 1981-01-08 Konishiroku Photo Ind Co Ltd Photosensitive composition
US4260673A (en) * 1979-09-05 1981-04-07 Minnesota Mining And Manufacturing Company Single sheet color proofing system
DE3043967A1 (de) * 1980-11-21 1982-06-24 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
DE3100077A1 (de) 1981-01-03 1982-08-05 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch, das einen naphthochinondiazidsulfonsaeureester enthaelt, und verfahren zur herstellung des naphthochinondiazidsulfonsaeureesters
US4587196A (en) * 1981-06-22 1986-05-06 Philip A. Hunt Chemical Corporation Positive photoresist with cresol-formaldehyde novolak resin and photosensitive naphthoquinone diazide
US4529682A (en) * 1981-06-22 1985-07-16 Philip A. Hunt Chemical Corporation Positive photoresist composition with cresol-formaldehyde novolak resins
DE3127754A1 (de) * 1981-07-14 1983-02-03 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
US4600684A (en) * 1983-02-10 1986-07-15 Oki Electric Industry Co., Ltd. Process for forming a negative resist using high energy beam
US4609615A (en) * 1983-03-31 1986-09-02 Oki Electric Industry Co., Ltd. Process for forming pattern with negative resist using quinone diazide compound
JPS6032045A (ja) * 1983-08-01 1985-02-19 Sanyo Kokusaku Pulp Co Ltd 多色画像形成材料およびその画像形成方法
GB8430377D0 (en) * 1984-12-01 1985-01-09 Ciba Geigy Ag Modified phenolic resins
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DE3685766T2 (de) * 1985-04-18 1993-02-11 Fuji Chem Ind Co Ltd Photolackbildherstellungsverfahren.
DE3629122A1 (de) * 1986-08-27 1988-03-10 Hoechst Ag Verfahren zur herstellung eines o-naphthochinondiazidsulfonsaeureesters und diesen enthaltendes lichtempfindliches gemisch
US4871644A (en) * 1986-10-01 1989-10-03 Ciba-Geigy Corporation Photoresist compositions with a bis-benzotriazole
US4777109A (en) * 1987-05-11 1988-10-11 Robert Gumbinner RF plasma treated photosensitive lithographic printing plates
US5037720A (en) * 1987-07-21 1991-08-06 Hoechst Celanese Corporation Hydroxylated aromatic polyamide polymer containing bound naphthoquinone diazide photosensitizer, method of making and use
GB8729510D0 (en) * 1987-12-18 1988-02-03 Ucb Sa Photosensitive compositions containing phenolic resins & diazoquinone compounds
US5272026A (en) * 1987-12-18 1993-12-21 Ucb S.A. Negative image process utilizing photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester or phenolic resin with diazoquinone sulfonic acid or diazoquinone carboxylic acid, and associated imaged article
US5238771A (en) * 1988-05-31 1993-08-24 Konica Corporation Lithographic printing plate utilizing aluminum substrate with photosensitive layer containing o-naphthoquinonediazide sulfonic acid ester, alkali soluble resin and select additive
DE3822522A1 (de) * 1988-07-04 1990-03-22 Hoechst Ag 1,2-naphthochinon-2-diazid-sulfonsaeureamide und lichtempfindliche gemische, die diese enthalten
DE68928903T2 (de) * 1988-10-03 1999-08-12 Konica Corp., Tokio/Tokyo Lichtempfindliche Zusammensetzung
US5753406A (en) * 1988-10-18 1998-05-19 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive resin composition
US5356758A (en) * 1988-12-28 1994-10-18 Texas Instruments Incorporated Method and apparatus for positively patterning a surface-sensitive resist on a semiconductor wafer
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EP0455228B1 (en) * 1990-05-02 1998-08-12 Mitsubishi Chemical Corporation Photoresist composition
JP2639853B2 (ja) * 1990-05-18 1997-08-13 富士写真フイルム株式会社 新規キノンジアジド化合物及びそれを含有する感光性組成物
US5395727A (en) * 1990-06-05 1995-03-07 Sumitomo Chemical Company, Limited Positive resist composition containing a novolak resin made from an aldehyde and dimer of isopropenyl phenol
US5145763A (en) * 1990-06-29 1992-09-08 Ocg Microelectronic Materials, Inc. Positive photoresist composition
JP2944296B2 (ja) 1992-04-06 1999-08-30 富士写真フイルム株式会社 感光性平版印刷版の製造方法
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JP4790682B2 (ja) 2007-09-28 2011-10-12 富士フイルム株式会社 平版印刷版原版
CN101855026A (zh) 2007-11-14 2010-10-06 富士胶片株式会社 干燥涂布膜的方法和制造平版印刷版前体的方法
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JP5183380B2 (ja) 2008-09-09 2013-04-17 富士フイルム株式会社 赤外線レーザ用感光性平版印刷版原版
JP2010237435A (ja) 2009-03-31 2010-10-21 Fujifilm Corp 平版印刷版原版
CN105082725B (zh) 2009-09-24 2018-05-04 富士胶片株式会社 平版印刷版原版
JP5490168B2 (ja) 2012-03-23 2014-05-14 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
JP5512730B2 (ja) 2012-03-30 2014-06-04 富士フイルム株式会社 平版印刷版の作製方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE506677A (US08124317-20120228-C00034.png) * 1950-10-31

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0225464A2 (en) * 1985-12-10 1987-06-16 International Business Machines Corporation Composite resist structures
EP0225464A3 (en) * 1985-12-10 1989-06-07 International Business Machines Corporation Composite resist structures

Also Published As

Publication number Publication date
AT175151B (de) 1953-06-10
FR1044248A (fr) 1953-11-16
BE506677A (US08124317-20120228-C00034.png)
GB711626A (en) 1954-07-07
DE865860C (de) 1953-02-05
NL78779C (US08124317-20120228-C00034.png) 1955-03-15
US3046120A (en) 1962-07-24

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