CA994708A - Cathode sputtering apparatus for the two faces of a large part metallic support - Google Patents

Cathode sputtering apparatus for the two faces of a large part metallic support

Info

Publication number
CA994708A
CA994708A CA117,900A CA117900A CA994708A CA 994708 A CA994708 A CA 994708A CA 117900 A CA117900 A CA 117900A CA 994708 A CA994708 A CA 994708A
Authority
CA
Canada
Prior art keywords
faces
sputtering apparatus
large part
metallic support
cathode sputtering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA117,900A
Other languages
French (fr)
Other versions
CA117900S (en
Inventor
Pierre Labedan
Robert Masotti
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Progil SARL
Original Assignee
Progil SARL
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Progil SARL filed Critical Progil SARL
Application granted granted Critical
Publication of CA994708A publication Critical patent/CA994708A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00—Electrodes
    • H01M4/86—Inert electrodes with catalytic activity, e.g. for fuel cells
    • H01M4/88—Processes of manufacture
    • H01M4/8825—Methods for deposition of the catalytic active composition
    • H01M4/8867—Vapour deposition
    • H01M4/8871—Sputtering
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30—Hydrogen technology
    • Y02E60/50—Fuel cells

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
CA117,900A 1970-07-10 1971-07-09 Cathode sputtering apparatus for the two faces of a large part metallic support Expired CA994708A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7026730A FR2098563A5 (en) 1970-07-10 1970-07-10

Publications (1)

Publication Number Publication Date
CA994708A true CA994708A (en) 1976-08-10

Family

ID=9058937

Family Applications (2)

Application Number Title Priority Date Filing Date
CA117,900A Expired CA994708A (en) 1970-07-10 1971-07-09 Cathode sputtering apparatus for the two faces of a large part metallic support
CA131,340A Expired CA981622A (en) 1970-07-10 1971-12-29 Cellule d'electrolyse

Family Applications After (1)

Application Number Title Priority Date Filing Date
CA131,340A Expired CA981622A (en) 1970-07-10 1971-12-29 Cellule d'electrolyse

Country Status (13)

Country Link
US (1) US3779885A (en)
JP (1) JPS5520747Y2 (en)
AT (1) AT304220B (en)
BE (1) BE769722A (en)
CA (2) CA994708A (en)
CH (1) CH538551A (en)
DE (1) DE2134377C3 (en)
ES (1) ES393087A1 (en)
FR (1) FR2098563A5 (en)
GB (1) GB1333617A (en)
NL (1) NL7109534A (en)
SE (1) SE366778B (en)
SU (1) SU405215A3 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU5889880A (en) * 1979-07-02 1981-01-15 Olin Corporation Manufacture of low overvoltage electrodes by cathodic sputtering
DE3107914A1 (en) * 1981-03-02 1982-09-16 Leybold-Heraeus GmbH, 5000 Köln METHOD AND DEVICE FOR COATING MOLDED PARTS BY CATODENSIONING
US4451344A (en) * 1982-03-26 1984-05-29 International Business Machines Corp. Method of making edge protected ferrite core
US4812217A (en) * 1987-04-27 1989-03-14 American Telephone And Telegraph Company, At&T Bell Laboratories Method and apparatus for feeding and coating articles in a controlled atmosphere
US5279724A (en) * 1991-12-26 1994-01-18 Xerox Corporation Dual sputtering source
US5322606A (en) * 1991-12-26 1994-06-21 Xerox Corporation Use of rotary solenoid as a shutter actuator on a rotating arm
CA2137471A1 (en) 1992-06-26 1994-01-06 Tugrul Yasar Transport system for wafer processing line
JPWO2021261484A1 (en) * 2020-06-23 2021-12-30

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1758531A (en) * 1926-10-22 1930-05-13 Elektrodenzerstaubung M B H Ge Vacuum dispersion coating process
US3294670A (en) * 1963-10-07 1966-12-27 Western Electric Co Apparatus for processing materials in a controlled atmosphere
LU45647A1 (en) * 1964-03-12 1965-09-13
LU52106A1 (en) * 1966-10-05 1968-05-07
US3594301A (en) * 1968-11-22 1971-07-20 Gen Electric Sputter coating apparatus

Also Published As

Publication number Publication date
DE2134377B2 (en) 1974-04-25
AT304220B (en) 1972-12-27
JPS5149723U (en) 1976-04-15
SE366778B (en) 1974-05-06
ES393087A1 (en) 1973-10-01
JPS5520747Y2 (en) 1980-05-19
CA981622A (en) 1976-01-13
SU405215A3 (en) 1973-10-22
FR2098563A5 (en) 1972-03-10
DE2134377A1 (en) 1972-01-13
GB1333617A (en) 1973-10-10
US3779885A (en) 1973-12-18
CH538551A (en) 1973-06-30
DE2134377C3 (en) 1974-11-28
BE769722A (en) 1971-11-16
NL7109534A (en) 1972-01-12

Similar Documents

Publication Publication Date Title
CA936834A (en) Deposition apparatus
CA930264A (en) Multi-diaphragm vacuum servo
CA994708A (en) Cathode sputtering apparatus for the two faces of a large part metallic support
CA1020905A (en) Demountable sputtering cathode
AU432182B2 (en) Process for isolating a fibrin-stabilising factor
AU465750B2 (en) Cathode sputtering apparatus
CA934076A (en) Electron-optical display system
AU3093871A (en) Cathode sputtering apparatus
CA843558A (en) Plasma cathode
CA994427A (en) Plate electrode
CA857186A (en) Glass lined metallic structures
CA857316A (en) Sputtering apparatus
CA900225A (en) Apparatus for reducing the thickness of metal
CA843430A (en) Sputtering process
CA832694A (en) Method for sputtering
AU435492B2 (en) Process for isolating a fibrin-stabilizing factor
CA846953A (en) Plasma torch
CA899855A (en) Hydroxylated steroids
CA898239A (en) Hydroxylated steroids
CA863179A (en) Supporting mechanism for an object
CA847456A (en) Electrode positioning means
CA858467A (en) Metal charging apparatus
CA853854A (en) Electron beam apparatus
CA850239A (en) Electron beam apparatus
AU441305B2 (en) Electron beam apparatus