CA991341A - Controlled polymerization process and stabilized polymerizable compositions - Google Patents
Controlled polymerization process and stabilized polymerizable compositionsInfo
- Publication number
- CA991341A CA991341A CA166,412A CA166412A CA991341A CA 991341 A CA991341 A CA 991341A CA 166412 A CA166412 A CA 166412A CA 991341 A CA991341 A CA 991341A
- Authority
- CA
- Canada
- Prior art keywords
- polymerization process
- polymerizable compositions
- controlled polymerization
- stabilized polymerizable
- stabilized
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polymerization Catalysts (AREA)
- Catalysts (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US00314614A US3816280A (en) | 1971-05-18 | 1972-12-13 | Photopolymerizable epoxy systems containing cyclic amide gelation inhibitors |
Publications (1)
Publication Number | Publication Date |
---|---|
CA991341A true CA991341A (en) | 1976-06-15 |
Family
ID=23220669
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA166,412A Expired CA991341A (en) | 1972-12-13 | 1973-03-19 | Controlled polymerization process and stabilized polymerizable compositions |
Country Status (4)
Country | Link |
---|---|
CA (1) | CA991341A (fr) |
CH (1) | CH587301A5 (fr) |
DE (2) | DE2366387C2 (fr) |
FR (1) | FR2210638A1 (fr) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2472768A1 (fr) * | 1979-12-27 | 1981-07-03 | Thomson Csf | Composition photopolymerisable comportant un cycle thiirane, procede de revetement d'une fibre optique utilisant une telle composition, et fibre ainsi revetue |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3711390A (en) * | 1971-05-18 | 1973-01-16 | J Feinberg | Photopolymerizable epoxy systems containing substituted cyclic amides or substituted ureas as gelation inhibitors |
-
1973
- 1973-03-19 CH CH397073A patent/CH587301A5/xx not_active IP Right Cessation
- 1973-03-19 CA CA166,412A patent/CA991341A/en not_active Expired
- 1973-03-19 DE DE19732366387 patent/DE2366387C2/de not_active Expired
- 1973-03-19 DE DE19732313627 patent/DE2313627C2/de not_active Expired
- 1973-03-19 FR FR7309710A patent/FR2210638A1/fr active Granted
Also Published As
Publication number | Publication date |
---|---|
FR2210638B1 (fr) | 1977-02-11 |
DE2366387C2 (de) | 1986-09-11 |
DE2313627A1 (de) | 1974-06-20 |
FR2210638A1 (en) | 1974-07-12 |
DE2313627C2 (de) | 1983-07-21 |
CH587301A5 (fr) | 1977-04-29 |
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