CA990415A - Method of making a metal silicide-silicon schottky barrier - Google Patents

Method of making a metal silicide-silicon schottky barrier

Info

Publication number
CA990415A
CA990415A CA186,609A CA186609A CA990415A CA 990415 A CA990415 A CA 990415A CA 186609 A CA186609 A CA 186609A CA 990415 A CA990415 A CA 990415A
Authority
CA
Canada
Prior art keywords
making
metal silicide
schottky barrier
silicon schottky
silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA186,609A
Other languages
English (en)
Other versions
CA186609S (en
Inventor
Yuen-Sheng Chiang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RCA Corp
Original Assignee
RCA Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RCA Corp filed Critical RCA Corp
Application granted granted Critical
Publication of CA990415A publication Critical patent/CA990415A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/30604Chemical etching
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00Subject matter not provided for in other groups of this subclass
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00Semiconductor device manufacturing: process
    • Y10S438/974Substrate surface preparation

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Electron Beam Exposure (AREA)
  • Silicon Compounds (AREA)
CA186,609A 1972-12-11 1973-11-23 Method of making a metal silicide-silicon schottky barrier Expired CA990415A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US00314002A US3841904A (en) 1972-12-11 1972-12-11 Method of making a metal silicide-silicon schottky barrier

Publications (1)

Publication Number Publication Date
CA990415A true CA990415A (en) 1976-06-01

Family

ID=23218106

Family Applications (1)

Application Number Title Priority Date Filing Date
CA186,609A Expired CA990415A (en) 1972-12-11 1973-11-23 Method of making a metal silicide-silicon schottky barrier

Country Status (6)

Country Link
US (1) US3841904A (forum.php)
JP (1) JPS4997000A (forum.php)
CA (1) CA990415A (forum.php)
DE (1) DE2360030C3 (forum.php)
FR (1) FR2210014B1 (forum.php)
GB (1) GB1411830A (forum.php)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4110488A (en) * 1976-04-09 1978-08-29 Rca Corporation Method for making schottky barrier diodes
US4052253A (en) * 1976-09-27 1977-10-04 Motorola, Inc. Semiconductor-oxide etchant
DE2658124C3 (de) * 1976-12-22 1982-05-06 Dynamit Nobel Ag, 5210 Troisdorf Verfahren zur Herstellung von Elektroschmelzkorund
US4412376A (en) * 1979-03-30 1983-11-01 Ibm Corporation Fabrication method for vertical PNP structure with Schottky barrier diode emitter utilizing ion implantation
US4675713A (en) * 1982-05-10 1987-06-23 Motorola, Inc. MOS transistor
US4816879A (en) * 1982-12-08 1989-03-28 North American Philips Corporation, Signetics Division Schottky-type rectifier having controllable barrier height
US4687537A (en) * 1986-04-15 1987-08-18 Rca Corporation Epitaxial metal silicide layers
US4914042A (en) * 1986-09-30 1990-04-03 Colorado State University Research Foundation Forming a transition metal silicide radiation detector and source
US5804034A (en) * 1994-03-21 1998-09-08 Texas Instruments Incorporated Method for manufacturing semiconductor device
US7002197B2 (en) * 2004-01-23 2006-02-21 Hewlett-Packard Development Company, L.P. Cross point resistive memory array
CA2702851A1 (en) * 2007-09-10 2009-03-19 University Of Florida Research Foundation, Inc. Nanotube enabled, gate-voltage controlled light emitting diodes
WO2014071343A1 (en) 2012-11-05 2014-05-08 University Of Florida Research Foundation, Inc. Brightness compensation in a display

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3397450A (en) * 1964-01-31 1968-08-20 Fairchild Camera Instr Co Method of forming a metal rectifying contact to semiconductor material by displacement plating
FR1481605A (fr) * 1965-06-02 1967-05-19 Texas Instruments Inc Procédé de fabrication de contacts ohmiques sur des composants semi-conducteurs
US3519479A (en) * 1965-12-16 1970-07-07 Matsushita Electronics Corp Method of manufacturing semiconductor device
US3476984A (en) * 1966-11-10 1969-11-04 Solitron Devices Schottky barrier semiconductor device
JPS4826188B1 (forum.php) * 1968-10-04 1973-08-07
US3642526A (en) * 1969-03-06 1972-02-15 Hitachi Ltd Semiconductor surface barrier diode of schottky type and method of making same
US3669730A (en) * 1970-04-24 1972-06-13 Bell Telephone Labor Inc Modifying barrier layer devices
US3742317A (en) * 1970-09-02 1973-06-26 Instr Inc Schottky barrier diode

Also Published As

Publication number Publication date
JPS4997000A (forum.php) 1974-09-13
FR2210014A1 (forum.php) 1974-07-05
US3841904A (en) 1974-10-15
DE2360030C3 (de) 1979-04-05
DE2360030A1 (de) 1974-06-20
FR2210014B1 (forum.php) 1978-11-10
DE2360030B2 (de) 1978-08-03
GB1411830A (en) 1975-10-29

Similar Documents

Publication Publication Date Title
CA970578A (en) Soil sealing method
AU469925B2 (en) Metal recovery process
AU470681B2 (en) Metal penetrating staple
CA990415A (en) Method of making a metal silicide-silicon schottky barrier
CA989206A (en) Copper-noble metal containing material for metallization
AU468280B2 (en) Precipitation of metal carbonates
CA976868A (en) Means and method of slotting strip metal
CA973328A (en) Method and assembly for making dies
CA994597A (en) Method of encasing a product
CA979351A (en) Metal punch
CA989250A (en) Method of expanding metal
AU473440B2 (en) Improved method for forming metal ion complexes
CA1004836A (en) Method of manufacturing a lead-through of a metal element through a ceramic component by means of sealing
CA964383A (en) Method of selectively depositing a metal on a surface
AU5180873A (en) Metal extraction process
AU446852B2 (en) Method of making a schottky barrier contact
CA1032562A (en) Method for solidifying a metal oxide powder
AU1166570A (en) Method of making a schottky barrier contact
CA907434A (en) Preparation of metal for deforming operations
CA995930A (en) Method of forming a die section
CA893678A (en) Solubilized metal salts of pyridinethione
CA909609A (en) Method of coating a movable metal strip
CA895614A (en) Method of making metal door
AU447480B2 (en) Metal salts of bis-thioreido-benzenes
CA903984A (en) Method for preventing metal oxide growth