CA984976A - Method of carrying out diffusions with two sources - Google Patents
Method of carrying out diffusions with two sourcesInfo
- Publication number
- CA984976A CA984976A CA167,715A CA167715A CA984976A CA 984976 A CA984976 A CA 984976A CA 167715 A CA167715 A CA 167715A CA 984976 A CA984976 A CA 984976A
- Authority
- CA
- Canada
- Prior art keywords
- sources
- carrying
- diffusions
- out diffusions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000009792 diffusion process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
- C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
- C30B31/16—Feed and outlet means for the gases; Modifying the flow of the gases
- C30B31/165—Diffusion sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
- H01L21/223—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a gaseous phase
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7211912A FR2178751B1 (ja) | 1972-04-05 | 1972-04-05 |
Publications (1)
Publication Number | Publication Date |
---|---|
CA984976A true CA984976A (en) | 1976-03-02 |
Family
ID=9096355
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA167,715A Expired CA984976A (en) | 1972-04-05 | 1973-04-02 | Method of carrying out diffusions with two sources |
Country Status (7)
Country | Link |
---|---|
US (1) | US3852129A (ja) |
JP (1) | JPS525226B2 (ja) |
CA (1) | CA984976A (ja) |
DE (1) | DE2315894C3 (ja) |
FR (1) | FR2178751B1 (ja) |
GB (1) | GB1372162A (ja) |
IT (1) | IT980738B (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2284982A1 (fr) * | 1974-09-16 | 1976-04-09 | Radiotechnique Compelec | Procede de diffusion d'impuretes dans des corps semiconducteurs |
JPS5464978U (ja) * | 1977-10-17 | 1979-05-08 | ||
FR2409791A1 (fr) * | 1977-11-25 | 1979-06-22 | Silicium Semiconducteur Ssc | Appareils de dopage par diffusion de tranches semi-conductrices |
JPS584811B2 (ja) * | 1978-10-31 | 1983-01-27 | 富士通株式会社 | 半導体装置の製造方法 |
US4348580A (en) * | 1980-05-07 | 1982-09-07 | Tylan Corporation | Energy efficient furnace with movable end wall |
US4415385A (en) * | 1980-08-15 | 1983-11-15 | Hitachi, Ltd. | Diffusion of impurities into semiconductor using semi-closed inner diffusion vessel |
US4742022A (en) * | 1986-06-26 | 1988-05-03 | Gte Laboratories Incorporated | Method of diffusing zinc into III-V compound semiconductor material |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL125226C (ja) * | 1960-05-02 | |||
US3305412A (en) * | 1964-02-20 | 1967-02-21 | Hughes Aircraft Co | Method for preparing a gallium arsenide diode |
DE1283204B (de) * | 1964-06-20 | 1968-11-21 | Siemens Ag | Verfahren zum Eindiffundieren von zwei Fremdstoffen in einen einkristallinen Halbleiterkoerper |
GB1054360A (ja) * | 1964-12-05 | |||
GB1086660A (en) * | 1964-12-22 | 1967-10-11 | Siemens Ag | A process for doping semiconductor bodies |
US3279964A (en) * | 1965-06-03 | 1966-10-18 | Btu Eng Corp | Method for continuous gas diffusion |
US3617820A (en) * | 1966-11-18 | 1971-11-02 | Monsanto Co | Injection-luminescent diodes |
US3540952A (en) * | 1968-01-02 | 1970-11-17 | Gen Electric | Process for fabricating semiconductor laser diodes |
JPS4915903B1 (ja) * | 1969-08-18 | 1974-04-18 |
-
1972
- 1972-04-05 FR FR7211912A patent/FR2178751B1/fr not_active Expired
-
1973
- 1973-03-29 US US00346081A patent/US3852129A/en not_active Expired - Lifetime
- 1973-03-30 DE DE2315894A patent/DE2315894C3/de not_active Expired
- 1973-04-02 IT IT67938/73A patent/IT980738B/it active
- 1973-04-02 CA CA167,715A patent/CA984976A/en not_active Expired
- 1973-04-02 GB GB1571073A patent/GB1372162A/en not_active Expired
- 1973-04-02 JP JP48036818A patent/JPS525226B2/ja not_active Expired
Also Published As
Publication number | Publication date |
---|---|
IT980738B (it) | 1974-10-10 |
DE2315894C3 (de) | 1980-10-02 |
FR2178751A1 (ja) | 1973-11-16 |
DE2315894A1 (de) | 1973-10-18 |
DE2315894B2 (ja) | 1980-02-07 |
JPS4917675A (ja) | 1974-02-16 |
JPS525226B2 (ja) | 1977-02-10 |
GB1372162A (en) | 1974-10-30 |
US3852129A (en) | 1974-12-03 |
FR2178751B1 (ja) | 1974-10-18 |
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