CA982862A - Process of imaging a highly absorbent or opaque light sensitive layer on a transparent or translucent carrier - Google Patents

Process of imaging a highly absorbent or opaque light sensitive layer on a transparent or translucent carrier

Info

Publication number
CA982862A
CA982862A CA149,650A CA149650A CA982862A CA 982862 A CA982862 A CA 982862A CA 149650 A CA149650 A CA 149650A CA 982862 A CA982862 A CA 982862A
Authority
CA
Canada
Prior art keywords
imaging
transparent
sensitive layer
light sensitive
highly absorbent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA149,650A
Other languages
English (en)
Other versions
CA149650S (en
Inventor
August P. Doering
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CNA Holdings LLC
Original Assignee
American Hoechst Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by American Hoechst Corp filed Critical American Hoechst Corp
Application granted granted Critical
Publication of CA982862A publication Critical patent/CA982862A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
    • H01J9/22—Applying luminescent coatings
    • H01J9/227—Applying luminescent coatings with luminescent material discontinuously arranged, e.g. in dots or lines
    • H01J9/2271—Applying luminescent coatings with luminescent material discontinuously arranged, e.g. in dots or lines by photographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CA149,650A 1971-10-14 1972-08-17 Process of imaging a highly absorbent or opaque light sensitive layer on a transparent or translucent carrier Expired CA982862A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US18910471A 1971-10-14 1971-10-14

Publications (1)

Publication Number Publication Date
CA982862A true CA982862A (en) 1976-02-03

Family

ID=22695949

Family Applications (1)

Application Number Title Priority Date Filing Date
CA149,650A Expired CA982862A (en) 1971-10-14 1972-08-17 Process of imaging a highly absorbent or opaque light sensitive layer on a transparent or translucent carrier

Country Status (12)

Country Link
US (1) US4154613A (es)
JP (1) JPS5637541B2 (es)
AT (1) AT321714B (es)
BE (1) BE789951A (es)
CA (1) CA982862A (es)
DE (1) DE2249060C2 (es)
ES (1) ES407613A1 (es)
FR (1) FR2156339B1 (es)
GB (1) GB1403608A (es)
IT (1) IT966281B (es)
NL (1) NL177254C (es)
SE (1) SE392173B (es)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1581435A (en) 1976-05-07 1980-12-17 Letraset International Ltd Production of dry transfer materials
EP0007127B1 (en) * 1978-07-10 1982-12-29 Akzo N.V. Process and apparatus for the manufacture of a relief printing form
US4263392A (en) * 1979-06-01 1981-04-21 Richardson Graphics Company Ultra high speed presensitized lithographic plates
AU8021782A (en) * 1981-02-20 1982-08-26 Polychrome Corp. Non-silver positive working radiation sensitive compositions
US4486518A (en) * 1981-02-20 1984-12-04 Polychrome Corporation Duplicating film mask with radiation absorbing benzophenone in processed positive-working radiation sensitive layer on transparent substrate
AU560406B2 (en) * 1983-08-31 1987-04-02 Indagraf S.A. Manufacture of relief printing plates
US4505999A (en) * 1983-09-12 1985-03-19 North American Philips Consumer Electronics Corp. Photographic process for applying phosphor pattern to color CRT shadow mask
US4567132A (en) * 1984-03-16 1986-01-28 International Business Machines Corporation Multi-level resist image reversal lithography process

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR616474A (fr) * 1925-05-23 1927-02-02 Cliché en gélatine ou matière semblable et son procédé de préparation
US3032414A (en) * 1956-11-19 1962-05-01 Kalvar Corp System of photographic reproduction
US3005708A (en) * 1957-05-29 1961-10-24 Westinghouse Electric Corp Method of making a screen member
NL270834A (es) * 1960-10-31
BE623613A (es) * 1961-10-16
US3313626A (en) * 1962-08-01 1967-04-11 Russeli H Whitney Process of making a lithographic printing plate
US3355295A (en) * 1964-02-11 1967-11-28 Eastman Kodak Co Nucleated vesicular film
US3259499A (en) * 1965-01-18 1966-07-05 Du Pont Polymerizable elements
US3663222A (en) * 1968-06-06 1972-05-16 Asahi Chemical Ind Process for preparing steric block with liquid photopolymerizable composition
US3635711A (en) * 1969-06-06 1972-01-18 Grace W R & Co Method and automated apparatus for photocomposing
US3671237A (en) * 1969-06-09 1972-06-20 Xerox Corp Method for producing images
US3759711A (en) * 1970-09-16 1973-09-18 Eastman Kodak Co Er compositions and elements nitrogen linked apperding quinone diazide light sensitive vinyl polym

Also Published As

Publication number Publication date
AT321714B (de) 1975-04-10
SE392173B (sv) 1977-03-14
BE789951A (fr) 1973-04-11
NL7213421A (es) 1973-04-17
DE2249060C2 (de) 1983-08-25
GB1403608A (en) 1975-08-28
JPS5637541B2 (es) 1981-09-01
NL177254C (nl) 1985-08-16
JPS4848131A (es) 1973-07-07
FR2156339B1 (es) 1977-08-26
US4154613A (en) 1979-05-15
NL177254B (nl) 1985-03-18
DE2249060A1 (de) 1973-04-19
FR2156339A1 (es) 1973-05-25
ES407613A1 (es) 1975-11-16
IT966281B (it) 1974-02-11

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