CA980163A - Photocrosslinkable compositions and elements containing heterocyclic nitrogen-containing compounds - Google Patents
Photocrosslinkable compositions and elements containing heterocyclic nitrogen-containing compoundsInfo
- Publication number
- CA980163A CA980163A CA128,999A CA128999A CA980163A CA 980163 A CA980163 A CA 980163A CA 128999 A CA128999 A CA 128999A CA 980163 A CA980163 A CA 980163A
- Authority
- CA
- Canada
- Prior art keywords
- heterocyclic nitrogen
- photocrosslinkable compositions
- elements
- containing compounds
- containing heterocyclic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000203 mixture Substances 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
- C08K5/0025—Crosslinking or vulcanising agents; including accelerators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/12—Using specific substances
- H05K2203/122—Organic non-polymeric compounds, e.g. oil, wax or thiol
- H05K2203/124—Heterocyclic organic compounds, e.g. azole, furan
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/061—Etching masks
- H05K3/064—Photoresists
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/389—Improvement of the adhesion between the insulating substrate and the metal by the use of a coupling agent, e.g. silane
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Adhesives Or Adhesive Processes (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10116870A | 1970-12-23 | 1970-12-23 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA980163A true CA980163A (en) | 1975-12-23 |
Family
ID=22283348
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA128,999A Expired CA980163A (en) | 1970-12-23 | 1971-11-30 | Photocrosslinkable compositions and elements containing heterocyclic nitrogen-containing compounds |
Country Status (7)
| Country | Link |
|---|---|
| JP (1) | JPS515934B1 (enExample) |
| BE (1) | BE777193A (enExample) |
| CA (1) | CA980163A (enExample) |
| DE (1) | DE2162207C3 (enExample) |
| FR (1) | FR2119620A5 (enExample) |
| GB (1) | GB1378867A (enExample) |
| NL (1) | NL165303C (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2448821C2 (de) * | 1974-10-14 | 1986-01-30 | Hoechst Ag, 6230 Frankfurt | Verfahren zum Übertragen einer thermoplastischen photopolymerisierbaren Schicht und Schichtübertragungsmaterial |
| RU2349685C1 (ru) * | 2007-06-04 | 2009-03-20 | ООО "Гальвика" | Электролит для блестящего меднения |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR65803E (enExample) * | 1950-03-09 | 1956-03-21 | ||
| US2732301A (en) * | 1952-10-15 | 1956-01-24 | Chxcxch | |
| GB1152368A (en) * | 1965-05-25 | 1969-05-14 | Konishiroku Photo Ind | Reprographic Process |
| US3376139A (en) * | 1966-02-01 | 1968-04-02 | Gilano Michael Nicholas | Photosensitive prepolymer composition and method |
| GB1141544A (en) * | 1966-07-13 | 1969-01-29 | Gordon Owen Shipton | Polymer compositions |
-
1971
- 1971-11-30 CA CA128,999A patent/CA980163A/en not_active Expired
- 1971-12-15 DE DE19712162207 patent/DE2162207C3/de not_active Expired
- 1971-12-22 FR FR7146153A patent/FR2119620A5/fr not_active Expired
- 1971-12-22 GB GB5968571A patent/GB1378867A/en not_active Expired
- 1971-12-23 JP JP46104263A patent/JPS515934B1/ja active Pending
- 1971-12-23 BE BE777193A patent/BE777193A/xx not_active IP Right Cessation
- 1971-12-23 NL NL7117776A patent/NL165303C/xx not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| BE777193A (fr) | 1972-06-23 |
| NL165303C (nl) | 1981-03-16 |
| DE2162207C3 (de) | 1984-07-19 |
| NL7117776A (enExample) | 1972-06-27 |
| JPS515934B1 (enExample) | 1976-02-24 |
| DE2162207A1 (de) | 1972-06-29 |
| FR2119620A5 (enExample) | 1972-08-04 |
| GB1378867A (en) | 1974-12-27 |
| DE2162207B2 (de) | 1976-09-16 |
| NL165303B (nl) | 1980-10-15 |
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