CA973417A - Photopolymerizable transfer elements - Google Patents

Photopolymerizable transfer elements

Info

Publication number
CA973417A
CA973417A CA124,242A CA124242A CA973417A CA 973417 A CA973417 A CA 973417A CA 124242 A CA124242 A CA 124242A CA 973417 A CA973417 A CA 973417A
Authority
CA
Canada
Prior art keywords
photopolymerizable
transfer elements
transfer
elements
photopolymerizable transfer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA124,242A
Other languages
English (en)
Other versions
CA124242S (en
Inventor
Jack R. Celeste
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Application granted granted Critical
Publication of CA973417A publication Critical patent/CA973417A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
CA124,242A 1970-10-05 1971-10-01 Photopolymerizable transfer elements Expired CA973417A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US7818170A 1970-10-05 1970-10-05

Publications (1)

Publication Number Publication Date
CA973417A true CA973417A (en) 1975-08-26

Family

ID=22142437

Family Applications (1)

Application Number Title Priority Date Filing Date
CA124,242A Expired CA973417A (en) 1970-10-05 1971-10-01 Photopolymerizable transfer elements

Country Status (7)

Country Link
JP (1) JPS545684B1 (fr)
BE (1) BE773495A (fr)
CA (1) CA973417A (fr)
DE (1) DE2149025C3 (fr)
FR (1) FR2110962A5 (fr)
GB (1) GB1360081A (fr)
NL (1) NL162214C (fr)

Also Published As

Publication number Publication date
NL162214C (nl) 1980-04-15
JPS545684B1 (fr) 1979-03-20
DE2149025A1 (de) 1972-04-06
BE773495A (fr) 1972-04-05
FR2110962A5 (fr) 1972-06-02
DE2149025B2 (de) 1973-12-06
GB1360081A (en) 1974-07-17
DE2149025C3 (de) 1978-12-14
NL162214B (nl) 1979-11-15
NL7113639A (fr) 1972-04-07

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