CA967856A - Simultaneous diffusion processing - Google Patents
Simultaneous diffusion processingInfo
- Publication number
- CA967856A CA967856A CA102,479A CA102479A CA967856A CA 967856 A CA967856 A CA 967856A CA 102479 A CA102479 A CA 102479A CA 967856 A CA967856 A CA 967856A
- Authority
- CA
- Canada
- Prior art keywords
- diffusion processing
- simultaneous diffusion
- simultaneous
- processing
- diffusion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000009792 diffusion process Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
- C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
- C30B31/16—Feed and outlet means for the gases; Modifying the flow of the gases
- C30B31/165—Diffusion sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Non-Volatile Memory (AREA)
- Battery Electrode And Active Subsutance (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US228770A | 1970-01-12 | 1970-01-12 |
Publications (1)
Publication Number | Publication Date |
---|---|
CA967856A true CA967856A (en) | 1975-05-20 |
Family
ID=21700080
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA102,479A Expired CA967856A (en) | 1970-01-12 | 1971-01-12 | Simultaneous diffusion processing |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPS4936772B1 (de) |
CA (1) | CA967856A (de) |
DE (1) | DE2100930A1 (de) |
FR (1) | FR2076037B1 (de) |
GB (1) | GB1335871A (de) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2930780C2 (de) * | 1979-07-28 | 1982-05-27 | Deutsche Itt Industries Gmbh, 7800 Freiburg | Verfahren zur Herstellung eines VMOS-Transistors |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL140657B (nl) * | 1968-06-21 | 1973-12-17 | Philips Nv | Werkwijze voor het vervaardigen van een halfgeleiderinrichting door een diffusiebehandeling en halfgeleiderinrichting, vervaardigd volgens deze werkwijze. |
-
1970
- 1970-12-17 FR FR7047127A patent/FR2076037B1/fr not_active Expired
- 1970-12-18 JP JP11320670A patent/JPS4936772B1/ja active Pending
-
1971
- 1971-01-04 GB GB25971A patent/GB1335871A/en not_active Expired
- 1971-01-11 DE DE19712100930 patent/DE2100930A1/de active Pending
- 1971-01-12 CA CA102,479A patent/CA967856A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
GB1335871A (en) | 1973-10-31 |
JPS4936772B1 (de) | 1974-10-03 |
FR2076037A1 (de) | 1971-10-15 |
FR2076037B1 (de) | 1975-01-10 |
DE2100930A1 (de) | 1971-07-29 |
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