CA960077A - Photosensitive dielectric composition and process of using the same - Google Patents

Photosensitive dielectric composition and process of using the same

Info

Publication number
CA960077A
CA960077A CA134,218A CA134218A CA960077A CA 960077 A CA960077 A CA 960077A CA 134218 A CA134218 A CA 134218A CA 960077 A CA960077 A CA 960077A
Authority
CA
Canada
Prior art keywords
same
dielectric composition
photosensitive dielectric
photosensitive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA134,218A
Other languages
English (en)
Other versions
CA134218S (en
Inventor
M. Frank Levy
George P. Schmitt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of CA960077A publication Critical patent/CA960077A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/115—Cationic or anionic
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/128—Radiation-activated cross-linking agent containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Epoxy Resins (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
CA134,218A 1971-02-22 1972-02-08 Photosensitive dielectric composition and process of using the same Expired CA960077A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11780871A 1971-02-22 1971-02-22

Publications (1)

Publication Number Publication Date
CA960077A true CA960077A (en) 1974-12-31

Family

ID=22374944

Family Applications (1)

Application Number Title Priority Date Filing Date
CA134,218A Expired CA960077A (en) 1971-02-22 1972-02-08 Photosensitive dielectric composition and process of using the same

Country Status (7)

Country Link
US (1) US3776729A (fr)
JP (1) JPS5230969B1 (fr)
CA (1) CA960077A (fr)
DE (1) DE2207853A1 (fr)
FR (1) FR2150657B1 (fr)
GB (1) GB1386122A (fr)
IT (1) IT944336B (fr)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4003868A (en) * 1971-12-08 1977-01-18 Union Carbide Corporation Ink or coating compositions of low volatility
US3935330A (en) * 1971-12-08 1976-01-27 Union Carbide Corporation Two-step coating process
US4035189A (en) * 1972-02-25 1977-07-12 Hitachi Chemical Company, Ltd. Image forming curable resin compositions
CH576739A5 (fr) * 1972-08-25 1976-06-15 Ciba Geigy Ag
US4064199A (en) * 1973-02-16 1977-12-20 Nippon Oil Company Ltd. Curable coating compositions
GB1478341A (en) * 1973-06-07 1977-06-29 Hitachi Chemical Co Ltd Printed circuit board and method of making the same
CA1065085A (fr) * 1974-05-20 1979-10-23 John P. Guarino Enduit vulcanisable par radiation
DE2533371C2 (de) * 1974-07-27 1983-09-22 Canon K.K., Tokyo Elektrophotographisches Aufzeichnungsmaterial
US4342793A (en) * 1977-01-14 1982-08-03 Henkel Corporation Interpenetrating dual cure resin compositions
US4128600A (en) * 1977-01-14 1978-12-05 General Mills Chemicals, Inc. Interpenetrating dual cure resin compositions
US4203792A (en) * 1977-11-17 1980-05-20 Bell Telephone Laboratories, Incorporated Method for the fabrication of devices including polymeric materials
US4169732A (en) * 1978-01-09 1979-10-02 International Business Machines Corporation Photosensitive coating composition and use thereof
US4237216A (en) * 1978-12-08 1980-12-02 International Business Machines Corporation Photosensitive patternable coating composition containing novolak type materials
DE3114931A1 (de) * 1981-04-13 1982-10-28 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und daraus hergestelltes photopolymerisierbares kopiermaterial
DE3134123A1 (de) 1981-08-28 1983-03-17 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und daraushergestelltes photopolymerisierbares kopiermaterial
EP0099856B1 (fr) * 1982-06-24 1987-11-11 Ciba-Geigy Ag Composition de revêtement photopolymérisable, matière photopolymérisable et son utilisation
DE3479810D1 (en) * 1983-08-24 1989-10-26 Ciba Geigy Ag Method of producing prepregs and composite materials reinforced therewith
US4690957A (en) * 1986-02-27 1987-09-01 Mitsubishi Denki Kabushiki Kaisha Ultra-violet ray curing type resin composition
US5364736A (en) * 1987-12-07 1994-11-15 Morton International, Inc. Photoimageable compositions
JP2694037B2 (ja) * 1987-12-07 1997-12-24 モートン サイオコール，インコーポレイティド 光画像形成組成物，ドライフィルムの調製方法及び光画像形成要素
AU614106B2 (en) * 1987-12-07 1991-08-22 Morton Thiokol, Inc. Photoimageable compositions containing acrylic polymers and epoxy resins
US5043184A (en) * 1989-02-06 1991-08-27 Somar Corporation Method of forming electrically conducting layer
DE3931467A1 (de) * 1989-09-21 1991-04-04 Hoechst Ag Durch strahlung polymerisierbares gemisch und verfahren zur herstellung einer loetstopmaske
EP0653763A1 (fr) * 1993-11-17 1995-05-17 SOPHIA SYSTEMS Co., Ltd. Matériau polymère durcissable par rayonnement UV, sans solvent, conducteur
AU4810197A (en) * 1996-10-08 1998-05-05 Fibercote Industries, Inc. Sheet material for core support
US7323289B2 (en) * 2002-10-08 2008-01-29 Brewer Science Inc. Bottom anti-reflective coatings derived from small core molecules with multiple epoxy moieties
JP4233314B2 (ja) * 2002-11-29 2009-03-04 東京応化工業株式会社 レジスト組成物および溶解制御剤
WO2013163100A1 (fr) 2012-04-23 2013-10-31 Brewer Science Inc. Matériau de revêtement antireflet inférieur, soluble dans un révélateur, photosensible

Also Published As

Publication number Publication date
IT944336B (it) 1973-04-20
GB1386122A (en) 1975-03-05
US3776729A (en) 1973-12-04
DE2207853A1 (de) 1972-08-31
FR2150657A1 (fr) 1973-04-13
FR2150657B1 (fr) 1975-03-21
JPS5230969B1 (fr) 1977-08-11

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