CA935697A - Photopolymerizable compositions and articles - Google Patents

Photopolymerizable compositions and articles

Info

Publication number
CA935697A
CA935697A CA103613A CA103613A CA935697A CA 935697 A CA935697 A CA 935697A CA 103613 A CA103613 A CA 103613A CA 103613 A CA103613 A CA 103613A CA 935697 A CA935697 A CA 935697A
Authority
CA
Canada
Prior art keywords
articles
photopolymerizable compositions
photopolymerizable
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA103613A
Other languages
English (en)
Other versions
CA103613S (en
Inventor
N. Crary Edward
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Brady Corp
Original Assignee
Brady Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Brady Corp filed Critical Brady Corp
Application granted granted Critical
Publication of CA935697A publication Critical patent/CA935697A/en
Expired legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/12—Esters of monohydric alcohols or phenols
    • C08F20/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/32—Layered products comprising a layer of synthetic resin comprising polyolefins
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/36—Layered products comprising a layer of synthetic resin comprising polyesters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2255/00—Coating on the layer surface
    • B32B2255/24—Organic non-macromolecular coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/112—Cellulosic

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
CA103613A 1970-02-09 1971-01-25 Photopolymerizable compositions and articles Expired CA935697A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US985770A 1970-02-09 1970-02-09

Publications (1)

Publication Number Publication Date
CA935697A true CA935697A (en) 1973-10-23

Family

ID=21740119

Family Applications (1)

Application Number Title Priority Date Filing Date
CA103613A Expired CA935697A (en) 1970-02-09 1971-01-25 Photopolymerizable compositions and articles

Country Status (7)

Country Link
US (1) US3661576A (xx)
BE (1) BE762638A (xx)
CA (1) CA935697A (xx)
DE (1) DE2105616C3 (xx)
FR (1) FR2078309A5 (xx)
GB (1) GB1343482A (xx)
NL (1) NL163229C (xx)

Families Citing this family (57)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3856744A (en) * 1972-04-10 1974-12-24 Continental Can Co Ultraviolet polymerizable printing ink comprising vehicle prepared from beta-hydroxy esters and polyitaconates
US3833384A (en) * 1972-04-26 1974-09-03 Eastman Kodak Co Photopolymerizable compositions and elements and uses thereof
JPS527362B2 (xx) * 1972-09-04 1977-03-02
US3867153A (en) * 1972-09-11 1975-02-18 Du Pont Photohardenable element
US4002478A (en) * 1973-03-15 1977-01-11 Kansai Paint Company, Ltd. Method for forming relief pattern
JPS5337902B2 (xx) * 1973-09-04 1978-10-12
JPS5614976B2 (xx) * 1973-10-17 1981-04-07
CA1065085A (en) * 1974-05-20 1979-10-23 John P. Guarino Radiation curable coating
US4003877A (en) * 1974-05-24 1977-01-18 Dynachem Corporation Photopolymerizable screen printing inks for permanent coatings prepared from aryloxyalkyl compositions
US4086093A (en) * 1974-10-11 1978-04-25 Toray Industries, Inc. Dry planographic printing plate
US4282308A (en) * 1975-06-03 1981-08-04 E. I. Du Pont De Nemours And Company Negative-working multilayer photosensitive element
US4105118A (en) * 1976-06-10 1978-08-08 Eastman Kodak Company Laminates useful as packaging materials and container having alkaline fluid means
US4070398A (en) * 1976-10-18 1978-01-24 Eastman Kodak Company Laminates useful as packaging materials and method for manufacture thereof
US4054483A (en) * 1976-12-22 1977-10-18 E. I. Du Pont De Nemours And Company Additives process for producing plated holes in printed circuit elements
JPS53141026A (en) * 1977-05-14 1978-12-08 Toyo Boseki Sensitive resin composite forming relief
US4168173A (en) * 1977-05-27 1979-09-18 Hercules Incorporated Polymers for increasing the viscosity of photosensitive resins
GB1587476A (en) * 1977-07-11 1981-04-01 Du Pont Photopolymerizable compositions and elements and methods of imaging
US4188449A (en) * 1977-08-04 1980-02-12 Eastman Kodak Company Phosphorescent screens
US4171974A (en) * 1978-02-15 1979-10-23 Polychrome Corporation Aqueous alkali developable negative working lithographic printing plates
US4264708A (en) * 1978-03-31 1981-04-28 E. I. Du Pont De Nemours And Company Radiation sensitive element having a thin photopolymerizable layer
US4362799A (en) * 1978-04-28 1982-12-07 Canon Kabushiki Kaisha Image-holding member with a curable epoxyacrylate resin insulating layer
US4226927A (en) * 1978-05-10 1980-10-07 Minnesota Mining And Manufacturing Company Photographic speed transfer element with oxidized polyethylene stripping layer
NO159729C (no) * 1978-11-01 1989-02-01 Coates Brothers & Co Fremgangsmaate for fremstilling av et moenster av loddemetall paa et lag elektrisk ledende metall baaret av et ikke-ledende underlag.
WO1980001321A1 (en) * 1978-12-25 1980-06-26 N Smirnova Dry film photoresist
US4237185A (en) * 1979-01-22 1980-12-02 The Richardson Company Radiation curable transparentizing resin systems, methods and products
DE2933805A1 (de) * 1979-08-21 1981-03-12 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung hochwaermebestaendiger reliefstrukturen und deren verwendung
US4245031A (en) * 1979-09-18 1981-01-13 E. I. Du Pont De Nemours And Company Photopolymerizable compositions based on salt-forming polymers and polyhydroxy polyethers
US4291115A (en) * 1979-09-18 1981-09-22 E. I. Du Pont De Nemours And Company Elements and method which use photopolymerizable compositions based on salt-forming polymers and polyhydroxy polyethers
US4390615A (en) 1979-11-05 1983-06-28 Courtney Robert W Coating compositions
US4416974A (en) * 1979-12-05 1983-11-22 Hercules Incorporated Radiation curable ceramic pigment composition
US4306012A (en) * 1979-12-05 1981-12-15 Hercules Incorporated Process of radiation and heat treatment of printing medium
US4252888A (en) * 1980-02-26 1981-02-24 Minnesota Mining And Manufacturing Company Solder mask composition
US4308338A (en) * 1980-03-26 1981-12-29 E. I. Du Pont De Nemours And Company Methods of imaging photopolymerizable materials containing diester polyether
US4268667A (en) * 1980-04-21 1981-05-19 E. I. Du Pont De Nemours And Company Derivatives of aryl ketones based on 9,10-dihydro-9,10-ethanoanthracene and p-dialkyl-aminoaryl aldehydes as visible sensitizers for photopolymerizable compositions
US4284710A (en) * 1980-05-01 1981-08-18 E. I. Du Pont De Nemours And Company Radiation crosslinkable polyesters and polyesterethers
DE3114931A1 (de) * 1981-04-13 1982-10-28 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und daraus hergestelltes photopolymerisierbares kopiermaterial
US4431782A (en) * 1981-07-27 1984-02-14 The Dow Chemical Company Process for the preparation of radiation-curable, water-thinnable vinyl ester resins
GB2119705A (en) * 1982-04-01 1983-11-23 Jerobee Ind Inc Method for press laminating dry film photo resist
DE3223104A1 (de) * 1982-06-21 1983-12-22 Hoechst Ag, 6230 Frankfurt Photopolymerisierbares gemisch und damit hergestelltes photopolymerisierbares kopiermaterial
EP0097864B1 (de) * 1982-06-21 1986-11-12 Hoechst Aktiengesellschaft Photopolymerisierbares Gemisch und damit hergestelltes photopolymerisierbares Kopiermaterial
EP0112391A4 (en) * 1982-06-28 1984-10-16 Dow Chemical Co STABLE AQUEOUS DISPERSIONS OF POLYMERIZABLE RESIN COMPOSITIONS AND ADHESIVE AND COATING COMPOSITIONS PREPARED THEREFROM.
JPS59171658A (ja) * 1983-03-19 1984-09-28 Canon Inc 記録方法
US4849322A (en) * 1986-04-30 1989-07-18 E. I. Du Pont De Nemours And Company Positive-working color proofing film and process
US4734356A (en) * 1986-04-30 1988-03-29 E. I. Du Pont De Nemours And Company Positive-working color proofing film and process
US4732831A (en) * 1986-05-01 1988-03-22 E. I. Du Pont De Nemours And Company Xeroprinting with photopolymer master
GB2200592A (en) * 1986-12-19 1988-08-10 Weber Marking Systems Inc Method of manufacturing a laminated facestock and carrier stock and an adhesive therefor
JPS6462375A (en) * 1987-09-02 1989-03-08 Arakawa Chem Ind Liquid photosolder resist ink composition of alkali development type
US4956265A (en) * 1988-02-03 1990-09-11 Minnesota Mining And Manufacturing Company Radiation crosslinkable compositions
US4929403A (en) * 1989-07-25 1990-05-29 Audsley Edwin F Process for forming multi-layer flexible molds
EP0425440B1 (de) * 1989-10-27 1994-11-17 Ciba-Geigy Ag Verfahren zur Abstimmung der Strahlungsempfindlichkeit von photopolymerisierbaren Zusammensetzungen
EP0705454B1 (en) * 1992-07-31 2000-10-04 E.I. Du Pont De Nemours And Company Method and product for particle mounting
US6103355A (en) * 1998-06-25 2000-08-15 The Standard Register Company Cellulose substrates with transparentized area and method of making same
US6143120A (en) * 1998-06-25 2000-11-07 The Standard Register Company Cellulose substrates with transparentized area and method of making
US6358596B1 (en) 1999-04-27 2002-03-19 The Standard Register Company Multi-functional transparent secure marks
US6607813B2 (en) 2001-08-23 2003-08-19 The Standard Register Company Simulated security thread by cellulose transparentization
JP4211782B2 (ja) * 2003-11-25 2009-01-21 株式会社村田製作所 厚膜パターンの形成方法、電子部品の製造方法
DE102011018342A1 (de) * 2011-04-20 2012-10-25 Heraeus Materials Technology Gmbh & Co. Kg Verfahren zur Herstellung einer bereichsweise beschichteten Trägerstruktur

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL207001A (xx) * 1955-05-09
NL273285A (xx) * 1961-01-09
GB1090142A (en) * 1965-02-26 1967-11-08 Agfa Gevaert Nv Photochemical insolubilisation of polymers
US3469982A (en) * 1968-09-11 1969-09-30 Jack Richard Celeste Process for making photoresists

Also Published As

Publication number Publication date
FR2078309A5 (xx) 1971-11-05
GB1343482A (en) 1974-01-10
US3661576A (en) 1972-05-09
DE2105616C3 (de) 1978-09-14
DE2105616B2 (de) 1976-05-26
NL7101622A (xx) 1971-08-11
NL163229B (nl) 1980-03-17
NL163229C (nl) 1980-08-15
DE2105616A1 (de) 1971-08-19
BE762638A (fr) 1971-07-16

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