CA2575970C - Procede de fabrication d'un substrat revetu d'une couche mesoporeuse et son application en optique ophtalmique - Google Patents
Procede de fabrication d'un substrat revetu d'une couche mesoporeuse et son application en optique ophtalmique Download PDFInfo
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- CA2575970C CA2575970C CA2575970A CA2575970A CA2575970C CA 2575970 C CA2575970 C CA 2575970C CA 2575970 A CA2575970 A CA 2575970A CA 2575970 A CA2575970 A CA 2575970A CA 2575970 C CA2575970 C CA 2575970C
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- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 description 1
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- GUBGYTABKSRVRQ-QUYVBRFLSA-N beta-maltose Chemical compound OC[C@H]1O[C@H](O[C@H]2[C@H](O)[C@@H](O)[C@H](O)O[C@@H]2CO)[C@H](O)[C@@H](O)[C@@H]1O GUBGYTABKSRVRQ-QUYVBRFLSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- SYFOAKAXGNMQAX-UHFFFAOYSA-N bis(prop-2-enyl) carbonate;2-(2-hydroxyethoxy)ethanol Chemical compound OCCOCCO.C=CCOC(=O)OCC=C SYFOAKAXGNMQAX-UHFFFAOYSA-N 0.000 description 1
- TYBKOVLWQWMOCI-UHFFFAOYSA-N but-1-ene-1,3-diol Chemical compound CC(O)C=CO TYBKOVLWQWMOCI-UHFFFAOYSA-N 0.000 description 1
- OZCRKDNRAAKDAN-UHFFFAOYSA-N but-1-ene-1,4-diol Chemical compound O[CH][CH]CCO OZCRKDNRAAKDAN-UHFFFAOYSA-N 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
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- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 125000004965 chloroalkyl group Chemical group 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
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- NHADDZMCASKINP-HTRCEHHLSA-N decarboxydihydrocitrinin Natural products C1=C(O)C(C)=C2[C@H](C)[C@@H](C)OCC2=C1O NHADDZMCASKINP-HTRCEHHLSA-N 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 1
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- 238000000572 ellipsometry Methods 0.000 description 1
- XTLNYNMNUCLWEZ-UHFFFAOYSA-N ethanol;propan-2-one Chemical compound CCO.CC(C)=O XTLNYNMNUCLWEZ-UHFFFAOYSA-N 0.000 description 1
- JARHXLHLCUCUJP-UHFFFAOYSA-N ethene;terephthalic acid Chemical group C=C.OC(=O)C1=CC=C(C(O)=O)C=C1 JARHXLHLCUCUJP-UHFFFAOYSA-N 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
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- GDSRMADSINPKSL-HSEONFRVSA-N gamma-cyclodextrin Chemical compound OC[C@H]([C@H]([C@@H]([C@H]1O)O)O[C@H]2O[C@@H]([C@@H](O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O3)[C@H](O)[C@H]2O)CO)O[C@@H]1O[C@H]1[C@H](O)[C@@H](O)[C@@H]3O[C@@H]1CO GDSRMADSINPKSL-HSEONFRVSA-N 0.000 description 1
- 229940080345 gamma-cyclodextrin Drugs 0.000 description 1
- 239000002241 glass-ceramic Substances 0.000 description 1
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- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
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- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000003791 organic solvent mixture Substances 0.000 description 1
- 238000010587 phase diagram Methods 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920001983 poloxamer Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920002503 polyoxyethylene-polyoxypropylene Polymers 0.000 description 1
- 229920006295 polythiol Polymers 0.000 description 1
- 229920002578 polythiourethane polymer Polymers 0.000 description 1
- 229920000166 polytrimethylene carbonate Polymers 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 230000003381 solubilizing effect Effects 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 235000000346 sugar Nutrition 0.000 description 1
- 150000008163 sugars Chemical class 0.000 description 1
- 230000002459 sustained effect Effects 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- 238000009210 therapy by ultrasound Methods 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 239000012815 thermoplastic material Substances 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 150000003553 thiiranes Chemical class 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- WEUBQNJHVBMUMD-UHFFFAOYSA-N trichloro(3,3,3-trifluoropropyl)silane Chemical compound FC(F)(F)CC[Si](Cl)(Cl)Cl WEUBQNJHVBMUMD-UHFFFAOYSA-N 0.000 description 1
- PPDADIYYMSXQJK-UHFFFAOYSA-N trichlorosilicon Chemical compound Cl[Si](Cl)Cl PPDADIYYMSXQJK-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten(VI) oxide Inorganic materials O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 238000001429 visible spectrum Methods 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/02—Polysilicates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Laminated Bodies (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Microscoopes, Condenser (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR0451767 | 2004-08-03 | ||
| FR0451767A FR2874007B1 (fr) | 2004-08-03 | 2004-08-03 | Procede de fabrication d'un substrat revetu d'une couche mesoporeuse et son application en optique |
| PCT/FR2005/050300 WO2006021698A1 (fr) | 2004-08-03 | 2005-05-03 | Procede de fabrication d'un substrat revetu d'une couche mesoporeuse et son application en optique ophtalmique |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CA2575970A1 CA2575970A1 (fr) | 2006-03-02 |
| CA2575970C true CA2575970C (fr) | 2014-07-08 |
Family
ID=34947312
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA2575970A Expired - Fee Related CA2575970C (fr) | 2004-08-03 | 2005-05-03 | Procede de fabrication d'un substrat revetu d'une couche mesoporeuse et son application en optique ophtalmique |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US8182866B2 (enExample) |
| EP (1) | EP1789508B1 (enExample) |
| JP (1) | JP4955551B2 (enExample) |
| AT (1) | ATE471971T1 (enExample) |
| AU (1) | AU2005276313B2 (enExample) |
| CA (1) | CA2575970C (enExample) |
| DE (1) | DE602005021972D1 (enExample) |
| FR (1) | FR2874007B1 (enExample) |
| WO (1) | WO2006021698A1 (enExample) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2906539B1 (fr) * | 2006-10-02 | 2009-01-09 | Eads Ccr Groupement D Interet | Revetements mesostructures pour application en aeronautique et aerospatiale |
| FR2908406B1 (fr) * | 2006-11-14 | 2012-08-24 | Saint Gobain | Couche poreuse, son procede de fabrication et ses applications. |
| DE102007014538A1 (de) * | 2007-03-27 | 2008-10-02 | Carl Zeiss Ag | Verfahren zur Erzeugung einer Antireflexionsoberfläche auf einem optischen Element sowie optische Elemente mit einer Antireflexionsoberfläche |
| DE102007043653A1 (de) | 2007-09-13 | 2009-04-02 | Siemens Ag | Transparente poröse SiO2-Beschichtung für ein transparentes Substratmaterial mit verbesserten optischen Eigenschaften |
| DE102007043650A1 (de) * | 2007-09-13 | 2009-04-02 | Siemens Ag | Verfahren zur Verbesserung der Eigenschaften von Beschichtungen |
| KR101395454B1 (ko) * | 2007-09-20 | 2014-05-15 | 삼성전자주식회사 | 그레이디드 굴절률을 갖는 광학 필름 및 이의 제조방법 |
| FR2933420B1 (fr) | 2008-07-01 | 2012-03-30 | Essilor Int | Utilisation d'un revetement poreux non photocatalytique en tant que revetement antisalissure |
| US9150422B2 (en) | 2009-03-12 | 2015-10-06 | Mitsui Chemicals, Inc. | Porous metal oxide, method for producing the same, and use of the same |
| FR2949111B1 (fr) | 2009-08-13 | 2013-03-22 | Essilor Int | Procede de fabrication d'un substrat revetu d'un film antistatique mesoporeux et son application en optique ophtalmique |
| KR101133695B1 (ko) * | 2009-11-20 | 2012-04-06 | 주식회사 에이피엠 | 기계적 성질이 향상된 반사 방지 피막용 조성물 |
| JP2011247918A (ja) * | 2010-05-24 | 2011-12-08 | Kri Inc | 低屈折率膜及び反射防止膜 |
| FR2961219B1 (fr) * | 2010-06-09 | 2012-07-13 | Essilor Int | Procede de preparation a basse temperature de revetements mesostructures electroconducteurs |
| FR2965820B1 (fr) | 2010-10-12 | 2012-11-16 | Essilor Int | Article comprenant une couche mesoporeuse protegee par un revetement faisant barriere au sebum et procede de fabrication |
| RU2466948C2 (ru) * | 2010-11-08 | 2012-11-20 | Учреждение Российской академии наук Институт металлоорганической химии им. Г.А. Разуваева РАН | Способ получения тонких просветляющих покрытий на основе мезопористого диоксида кремния золь-гель методом в присутствии синергической бинарной системы: неионогенное пав-олигоэфиры на основе окиси этилена или окиси пропилена |
| KR101390036B1 (ko) | 2011-05-23 | 2014-04-30 | 고려대학교 산학협력단 | 촉매전극의 제조방법, 이를 통해 제조된 촉매전극 및 이를 포함하는 전지 |
| FR3024457B1 (fr) * | 2014-07-30 | 2018-01-12 | Essilor International | Composition de vernis anti-abrasion pour substrat en polyacrylate thermoplastique |
| KR102267504B1 (ko) * | 2017-12-22 | 2021-06-21 | 주식회사 엘지화학 | 메조포러스 실리카 코팅층을 포함하는 광학 부재의 제조방법 및 이를 이용하여 제조된 광학 부재 |
| CN110386761B (zh) * | 2019-08-02 | 2021-06-22 | 常州大学 | 一种具有高透光率的超疏水减反射涂层的制备方法 |
| WO2021204988A1 (en) | 2020-04-09 | 2021-10-14 | Essilor International | Optical article with antibacterial function |
| EP3978453B1 (en) * | 2020-09-30 | 2023-08-16 | Saint-Gobain Glass France | Solar control glazing for automobile and its manufacture |
| TWI807540B (zh) * | 2021-12-16 | 2023-07-01 | 臺灣塑膠工業股份有限公司 | 纖維複合材料及其製造方法 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5949071A (en) | 1997-08-14 | 1999-09-07 | Sandia Corporation | Uncooled thin film pyroelectric IR detector with aerogel thermal isolation |
| US5858457A (en) * | 1997-09-25 | 1999-01-12 | Sandia Corporation | Process to form mesostructured films |
| CN1219700C (zh) * | 1998-12-23 | 2005-09-21 | 贝特勒纪念学院 | 由含表面活性剂的溶液制备的中孔二氧化硅膜及其制备方法 |
| US6592980B1 (en) | 1999-12-07 | 2003-07-15 | Air Products And Chemicals, Inc. | Mesoporous films having reduced dielectric constants |
| CN1212266C (zh) | 2000-04-28 | 2005-07-27 | 三井化学株式会社 | 防水性多孔二氧化硅、其制备方法和用途 |
| WO2003024869A1 (en) * | 2001-09-17 | 2003-03-27 | Koninklijke Philips Electronics N.V. | Electronic device comprising a mesoporous silica layer and composition for preparing the mesoporous silica layer |
| DE10206738A1 (de) * | 2002-02-18 | 2003-09-04 | Fresenius Medical Care De Gmbh | Flexibler Behälter mit Zugangsport, Verfahren zum Herstellen eines solchen Behälters und Schweißwerkzeug zur Durchführung eines solchen Verfahrens |
| US7404990B2 (en) * | 2002-11-14 | 2008-07-29 | Air Products And Chemicals, Inc. | Non-thermal process for forming porous low dielectric constant films |
-
2004
- 2004-08-03 FR FR0451767A patent/FR2874007B1/fr not_active Expired - Fee Related
-
2005
- 2005-05-03 AU AU2005276313A patent/AU2005276313B2/en not_active Ceased
- 2005-05-03 JP JP2007524376A patent/JP4955551B2/ja not_active Expired - Lifetime
- 2005-05-03 CA CA2575970A patent/CA2575970C/fr not_active Expired - Fee Related
- 2005-05-03 AT AT05759645T patent/ATE471971T1/de not_active IP Right Cessation
- 2005-05-03 EP EP05759645A patent/EP1789508B1/fr not_active Expired - Lifetime
- 2005-05-03 US US11/573,137 patent/US8182866B2/en active Active
- 2005-05-03 DE DE602005021972T patent/DE602005021972D1/de not_active Expired - Lifetime
- 2005-05-03 WO PCT/FR2005/050300 patent/WO2006021698A1/fr not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| AU2005276313A1 (en) | 2006-03-02 |
| JP4955551B2 (ja) | 2012-06-20 |
| JP2008509800A (ja) | 2008-04-03 |
| FR2874007A1 (fr) | 2006-02-10 |
| US20080079894A1 (en) | 2008-04-03 |
| WO2006021698A1 (fr) | 2006-03-02 |
| EP1789508B1 (fr) | 2010-06-23 |
| AU2005276313B2 (en) | 2011-01-06 |
| DE602005021972D1 (de) | 2010-08-05 |
| EP1789508A1 (fr) | 2007-05-30 |
| US8182866B2 (en) | 2012-05-22 |
| FR2874007B1 (fr) | 2007-11-23 |
| CA2575970A1 (fr) | 2006-03-02 |
| ATE471971T1 (de) | 2010-07-15 |
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