CA2441419A1 - Tampons a polir munis d'une nappe fibreuse polymerique chargee, et procedes de fabrication et d'utilisation des tampons - Google Patents

Tampons a polir munis d'une nappe fibreuse polymerique chargee, et procedes de fabrication et d'utilisation des tampons Download PDF

Info

Publication number
CA2441419A1
CA2441419A1 CA002441419A CA2441419A CA2441419A1 CA 2441419 A1 CA2441419 A1 CA 2441419A1 CA 002441419 A CA002441419 A CA 002441419A CA 2441419 A CA2441419 A CA 2441419A CA 2441419 A1 CA2441419 A1 CA 2441419A1
Authority
CA
Canada
Prior art keywords
fibers
polishing
pad
polymer
polishing pad
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
CA002441419A
Other languages
English (en)
Inventor
Shyng-Tsong Chen
Kenneth P. Rodbell
Oscar Kai Chi Hsu
Jean Vangsness
David S. Gilbride
Scott Clayton Billings
Kenneth M. Davis
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Freudenberg Performance Materials LP
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/715,184 external-priority patent/US6712681B1/en
Application filed by Individual filed Critical Individual
Publication of CA2441419A1 publication Critical patent/CA2441419A1/fr
Abandoned legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/20Lapping pads for working plane surfaces
    • B24B37/24Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • B24D11/008Finishing manufactured abrasive sheets, e.g. cutting, deforming
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/02Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
    • B24D3/20Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially organic
    • B24D3/28Resins or natural or synthetic macromolecular compounds

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Nonwoven Fabrics (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)

Abstract

L'invention concerne un tampon à polir qui présente un corps comprenant des fibres intégrées dans une matrice formée par réaction de précurseurs polymériques. Les fibres délimitent des interstices, et les précurseurs remplissent la quasi totalité des interstices avant la fin de la réaction. Le tampon peut comprendre, sur sa surface de polissage, une fine couche de fibres libres. Un segment d'au moins une partie des fibres libres est intégré dans le corps adjacent du polymère et des fibres. Les fibres peuvent être séparées ou se présenter sous la forme d'une bande continue tissée ou non tissée.
CA002441419A 2000-11-20 2001-11-20 Tampons a polir munis d'une nappe fibreuse polymerique chargee, et procedes de fabrication et d'utilisation des tampons Abandoned CA2441419A1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/715,184 US6712681B1 (en) 2000-06-23 2000-11-20 Polishing pads with polymer filled fibrous web, and methods for fabricating and using same
US09/715,184 2000-11-20
PCT/US2001/043208 WO2002100593A2 (fr) 2000-11-20 2001-11-20 Tampons a polir munis d'une nappe fibreuse polymerique chargee, et procedes de fabrication et d'utilisation des tampons

Publications (1)

Publication Number Publication Date
CA2441419A1 true CA2441419A1 (fr) 2002-12-19

Family

ID=24872997

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002441419A Abandoned CA2441419A1 (fr) 2000-11-20 2001-11-20 Tampons a polir munis d'une nappe fibreuse polymerique chargee, et procedes de fabrication et d'utilisation des tampons

Country Status (5)

Country Link
EP (1) EP1341643A4 (fr)
JP (1) JP2004528997A (fr)
AU (1) AU2001297847A1 (fr)
CA (1) CA2441419A1 (fr)
WO (1) WO2002100593A2 (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7086932B2 (en) * 2004-05-11 2006-08-08 Freudenberg Nonwovens Polishing pad
TWI409136B (zh) 2006-07-19 2013-09-21 Innopad Inc 表面具微溝槽之化學機械平坦化墊
JP5234916B2 (ja) * 2007-01-30 2013-07-10 東レ株式会社 積層研磨パッド
WO2009123659A1 (fr) * 2008-04-01 2009-10-08 Innopad, Inc. Tampon de polissage avec production de vides contrôlée
KR101050274B1 (ko) 2009-12-31 2011-07-19 한국생산기술연구원 연마립 함유 연마 패드 및 그 제조방법
JP2012101298A (ja) * 2010-11-08 2012-05-31 Ritsumeikan 研磨パッド
JP2015127094A (ja) * 2015-03-04 2015-07-09 学校法人立命館 研磨パッド

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4728552A (en) * 1984-07-06 1988-03-01 Rodel, Inc. Substrate containing fibers of predetermined orientation and process of making the same
US4927432A (en) * 1986-03-25 1990-05-22 Rodel, Inc. Pad material for grinding, lapping and polishing
US5197999A (en) * 1991-09-30 1993-03-30 National Semiconductor Corporation Polishing pad for planarization

Also Published As

Publication number Publication date
WO2002100593A2 (fr) 2002-12-19
EP1341643A4 (fr) 2004-06-09
WO2002100593A3 (fr) 2003-06-05
AU2001297847A1 (en) 2002-12-23
EP1341643A2 (fr) 2003-09-10
JP2004528997A (ja) 2004-09-24

Similar Documents

Publication Publication Date Title
US7186166B2 (en) Fiber embedded polishing pad
US6989117B2 (en) Polishing pads with polymer filled fibrous web, and methods for fabricating and using same
US7357704B2 (en) Polishing pad
US6383066B1 (en) Multilayered polishing pad, method for fabricating, and use thereof
KR100770852B1 (ko) 화학 기계적 평탄화용 그루브형 연마 패드
US6702651B2 (en) Method and apparatus for conditioning a polishing pad
US6749485B1 (en) Hydrolytically stable grooved polishing pads for chemical mechanical planarization
US6736709B1 (en) Grooved polishing pads for chemical mechanical planarization
US7374474B2 (en) Polishing pad for CMP, method for polishing substrate using it and method for producing polishing pad for CMP
CA2441419A1 (fr) Tampons a polir munis d'une nappe fibreuse polymerique chargee, et procedes de fabrication et d'utilisation des tampons
US20030003846A1 (en) Material for use in carrier and polishing pads
James CMP polishing pads

Legal Events

Date Code Title Description
EEER Examination request
FZDE Discontinued