CA1328131C - Codeur - Google Patents
CodeurInfo
- Publication number
- CA1328131C CA1328131C CA000575623A CA575623A CA1328131C CA 1328131 C CA1328131 C CA 1328131C CA 000575623 A CA000575623 A CA 000575623A CA 575623 A CA575623 A CA 575623A CA 1328131 C CA1328131 C CA 1328131C
- Authority
- CA
- Canada
- Prior art keywords
- probe
- recording
- scale
- reference scale
- detecting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000523 sample Substances 0.000 claims abstract description 446
- 238000001514 detection method Methods 0.000 claims abstract description 49
- 230000008859 change Effects 0.000 claims abstract description 40
- 230000003446 memory effect Effects 0.000 claims description 13
- 230000000694 effects Effects 0.000 claims description 10
- 230000007246 mechanism Effects 0.000 description 91
- 238000006073 displacement reaction Methods 0.000 description 80
- 238000000034 method Methods 0.000 description 63
- 239000000758 substrate Substances 0.000 description 56
- 239000011295 pitch Substances 0.000 description 51
- 239000000463 material Substances 0.000 description 49
- 239000010408 film Substances 0.000 description 42
- 230000010355 oscillation Effects 0.000 description 35
- 239000012071 phase Substances 0.000 description 33
- 230000001276 controlling effect Effects 0.000 description 26
- 238000002474 experimental method Methods 0.000 description 25
- 230000000875 corresponding effect Effects 0.000 description 23
- 150000001875 compounds Chemical class 0.000 description 20
- 239000004020 conductor Substances 0.000 description 20
- 238000005259 measurement Methods 0.000 description 20
- 229910052751 metal Inorganic materials 0.000 description 18
- 239000002184 metal Substances 0.000 description 18
- 230000006870 function Effects 0.000 description 17
- 230000008569 process Effects 0.000 description 17
- 238000012545 processing Methods 0.000 description 17
- 239000007789 gas Substances 0.000 description 15
- 230000010363 phase shift Effects 0.000 description 15
- 230000015572 biosynthetic process Effects 0.000 description 14
- 230000000737 periodic effect Effects 0.000 description 13
- 239000004065 semiconductor Substances 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- 239000013078 crystal Substances 0.000 description 11
- 239000000975 dye Substances 0.000 description 10
- 230000009466 transformation Effects 0.000 description 10
- 238000000151 deposition Methods 0.000 description 9
- 238000010894 electron beam technology Methods 0.000 description 9
- 238000005530 etching Methods 0.000 description 9
- 230000003287 optical effect Effects 0.000 description 9
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 8
- 239000000470 constituent Substances 0.000 description 8
- 238000010586 diagram Methods 0.000 description 8
- -1 polycyclic aromatic compounds Chemical class 0.000 description 8
- 238000006467 substitution reaction Methods 0.000 description 8
- 238000011282 treatment Methods 0.000 description 8
- IXHWGNYCZPISET-UHFFFAOYSA-N 2-[4-(dicyanomethylidene)-2,3,5,6-tetrafluorocyclohexa-2,5-dien-1-ylidene]propanedinitrile Chemical compound FC1=C(F)C(=C(C#N)C#N)C(F)=C(F)C1=C(C#N)C#N IXHWGNYCZPISET-UHFFFAOYSA-N 0.000 description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 7
- 230000004069 differentiation Effects 0.000 description 7
- 230000002209 hydrophobic effect Effects 0.000 description 7
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 230000007547 defect Effects 0.000 description 6
- 229910002804 graphite Inorganic materials 0.000 description 6
- 239000010439 graphite Substances 0.000 description 6
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 6
- 229910021417 amorphous silicon Inorganic materials 0.000 description 5
- 230000008021 deposition Effects 0.000 description 5
- 238000010884 ion-beam technique Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 238000012546 transfer Methods 0.000 description 5
- 229910052721 tungsten Inorganic materials 0.000 description 5
- 230000005641 tunneling Effects 0.000 description 5
- 238000012935 Averaging Methods 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 238000009825 accumulation Methods 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 4
- 230000001747 exhibiting effect Effects 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 4
- 229910052697 platinum Inorganic materials 0.000 description 4
- 230000000717 retained effect Effects 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 230000007704 transition Effects 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 239000008346 aqueous phase Substances 0.000 description 3
- 239000005387 chalcogenide glass Substances 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 230000008602 contraction Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 238000007599 discharging Methods 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- 238000003672 processing method Methods 0.000 description 3
- 229910052761 rare earth metal Inorganic materials 0.000 description 3
- 230000004044 response Effects 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000000992 sputter etching Methods 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- 238000001771 vacuum deposition Methods 0.000 description 3
- FYGHSUNMUKGBRK-UHFFFAOYSA-N 1,2,3-trimethylbenzene Chemical compound CC1=CC=CC(C)=C1C FYGHSUNMUKGBRK-UHFFFAOYSA-N 0.000 description 2
- JLTPSDHKZGWXTD-UHFFFAOYSA-N 2-[6-(dicyanomethylidene)naphthalen-2-ylidene]propanedinitrile Chemical compound N#CC(C#N)=C1C=CC2=CC(=C(C#N)C#N)C=CC2=C1 JLTPSDHKZGWXTD-UHFFFAOYSA-N 0.000 description 2
- ONIKNECPXCLUHT-UHFFFAOYSA-N 2-chlorobenzoyl chloride Chemical compound ClC(=O)C1=CC=CC=C1Cl ONIKNECPXCLUHT-UHFFFAOYSA-N 0.000 description 2
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- CUFNKYGDVFVPHO-UHFFFAOYSA-N azulene Chemical compound C1=CC=CC2=CC=CC2=C1 CUFNKYGDVFVPHO-UHFFFAOYSA-N 0.000 description 2
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical group C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 2
- LLCSWKVOHICRDD-UHFFFAOYSA-N buta-1,3-diyne Chemical group C#CC#C LLCSWKVOHICRDD-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 229910052745 lead Inorganic materials 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- BBEAQIROQSPTKN-UHFFFAOYSA-N pyrene Chemical compound C1=CC=C2C=CC3=CC=CC4=CC=C1C2=C43 BBEAQIROQSPTKN-UHFFFAOYSA-N 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000002310 reflectometry Methods 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- NLDYACGHTUPAQU-UHFFFAOYSA-N tetracyanoethylene Chemical group N#CC(C#N)=C(C#N)C#N NLDYACGHTUPAQU-UHFFFAOYSA-N 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 238000000844 transformation Methods 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 1
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- BCMCBBGGLRIHSE-UHFFFAOYSA-N 1,3-benzoxazole Chemical group C1=CC=C2OC=NC2=C1 BCMCBBGGLRIHSE-UHFFFAOYSA-N 0.000 description 1
- VPSXHKGJZJCWLV-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]-3-(1-ethylpiperidin-4-yl)oxypyrazol-1-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C=1C(=NN(C=1)CC(=O)N1CC2=C(CC1)NN=N2)OC1CCN(CC1)CC VPSXHKGJZJCWLV-UHFFFAOYSA-N 0.000 description 1
- BZSVVCFHMVMYCR-UHFFFAOYSA-N 2-pyridin-2-ylpyridine;ruthenium Chemical class [Ru].N1=CC=CC=C1C1=CC=CC=N1.N1=CC=CC=C1C1=CC=CC=N1.N1=CC=CC=C1C1=CC=CC=N1 BZSVVCFHMVMYCR-UHFFFAOYSA-N 0.000 description 1
- ODPOAESBSUKMHD-UHFFFAOYSA-L 6,7-dihydrodipyrido[1,2-b:1',2'-e]pyrazine-5,8-diium;dibromide Chemical compound [Br-].[Br-].C1=CC=[N+]2CC[N+]3=CC=CC=C3C2=C1 ODPOAESBSUKMHD-UHFFFAOYSA-L 0.000 description 1
- 229910015844 BCl3 Inorganic materials 0.000 description 1
- 108010082845 Bacteriorhodopsins Proteins 0.000 description 1
- 229910000906 Bronze Inorganic materials 0.000 description 1
- 235000006696 Catha edulis Nutrition 0.000 description 1
- 240000007681 Catha edulis Species 0.000 description 1
- 102100030497 Cytochrome c Human genes 0.000 description 1
- 108010075031 Cytochromes c Proteins 0.000 description 1
- 239000005630 Diquat Substances 0.000 description 1
- SLZWEMYSYKOWCG-UHFFFAOYSA-N Etacelasil Chemical compound COCCO[Si](CCCl)(OCCOC)OCCOC SLZWEMYSYKOWCG-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- JUUBCHWRXWPFFH-UHFFFAOYSA-N Hydroxytyrosol Chemical compound OCCC1=CC=C(O)C(O)=C1 JUUBCHWRXWPFFH-UHFFFAOYSA-N 0.000 description 1
- 229910001374 Invar Inorganic materials 0.000 description 1
- 101000913968 Ipomoea purpurea Chalcone synthase C Proteins 0.000 description 1
- 101100400378 Mus musculus Marveld2 gene Proteins 0.000 description 1
- 241001163743 Perlodes Species 0.000 description 1
- 101000907988 Petunia hybrida Chalcone-flavanone isomerase C Proteins 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910002835 Pt–Ir Inorganic materials 0.000 description 1
- 229910018110 Se—Te Inorganic materials 0.000 description 1
- 229910003925 SiC 1 Inorganic materials 0.000 description 1
- 229910004211 TaS2 Inorganic materials 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- SMWDFEZZVXVKRB-UHFFFAOYSA-N anhydrous quinoline Natural products N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000012620 biological material Substances 0.000 description 1
- 239000005385 borate glass Substances 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000003708 edge detection Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- KTWOOEGAPBSYNW-UHFFFAOYSA-N ferrocene Chemical compound [Fe+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 KTWOOEGAPBSYNW-UHFFFAOYSA-N 0.000 description 1
- GVEPBJHOBDJJJI-UHFFFAOYSA-N fluoranthrene Natural products C1=CC(C2=CC=CC=C22)=C3C2=CC=CC3=C1 GVEPBJHOBDJJJI-UHFFFAOYSA-N 0.000 description 1
- 239000003574 free electron Substances 0.000 description 1
- 239000005337 ground glass Substances 0.000 description 1
- 150000002391 heterocyclic compounds Chemical class 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 125000005462 imide group Chemical group 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012821 model calculation Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910003465 moissanite Inorganic materials 0.000 description 1
- 229910052961 molybdenite Inorganic materials 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 229910052982 molybdenum disulfide Inorganic materials 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000000075 oxide glass Substances 0.000 description 1
- 238000003909 pattern recognition Methods 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920000835 poly(gamma-benzyl-L-glutamate) polymer Polymers 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920001184 polypeptide Polymers 0.000 description 1
- 229920000136 polysorbate Polymers 0.000 description 1
- 238000005036 potential barrier Methods 0.000 description 1
- 102000004196 processed proteins & peptides Human genes 0.000 description 1
- 108090000765 processed proteins & peptides Proteins 0.000 description 1
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 230000001502 supplementing effect Effects 0.000 description 1
- YNHJECZULSZAQK-UHFFFAOYSA-N tetraphenylporphyrin Chemical compound C1=CC(C(=C2C=CC(N2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3N2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 YNHJECZULSZAQK-UHFFFAOYSA-N 0.000 description 1
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 1
- 210000000689 upper leg Anatomy 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 230000005428 wave function Effects 0.000 description 1
Landscapes
- Length Measuring Devices With Unspecified Measuring Means (AREA)
- Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
Applications Claiming Priority (10)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62212154A JP2632862B2 (ja) | 1987-08-25 | 1987-08-25 | 位置検出装置 |
| JP212153/1987 | 1987-08-25 | ||
| JP212154/1987 | 1987-08-25 | ||
| JP62212153A JP2603270B2 (ja) | 1987-08-25 | 1987-08-25 | 記録装置および再生装置 |
| JP62305747A JP2547333B2 (ja) | 1987-12-04 | 1987-12-04 | 位置検出装置 |
| JP305747/1987 | 1987-12-04 | ||
| JP62305748A JP2547334B2 (ja) | 1987-12-04 | 1987-12-04 | 位置検出装置 |
| JP305748/1987 | 1987-12-04 | ||
| JP62309421A JP2559048B2 (ja) | 1987-12-09 | 1987-12-09 | 相対変位量測定装置 |
| JP309421/1987 | 1987-12-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1328131C true CA1328131C (fr) | 1994-03-29 |
Family
ID=27529529
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA000575623A Expired - Fee Related CA1328131C (fr) | 1987-08-25 | 1988-08-24 | Codeur |
Country Status (1)
| Country | Link |
|---|---|
| CA (1) | CA1328131C (fr) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107631740A (zh) * | 2017-09-11 | 2018-01-26 | 珠海格力节能环保制冷技术研究中心有限公司 | 一种编码器光电补偿电路、方法及光电编码器 |
| CN114396967A (zh) * | 2021-11-30 | 2022-04-26 | 浙江西子富沃德电机有限公司 | 正余弦编码器及其信号处理方法、电梯控制系统 |
-
1988
- 1988-08-24 CA CA000575623A patent/CA1328131C/fr not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107631740A (zh) * | 2017-09-11 | 2018-01-26 | 珠海格力节能环保制冷技术研究中心有限公司 | 一种编码器光电补偿电路、方法及光电编码器 |
| CN114396967A (zh) * | 2021-11-30 | 2022-04-26 | 浙江西子富沃德电机有限公司 | 正余弦编码器及其信号处理方法、电梯控制系统 |
| CN114396967B (zh) * | 2021-11-30 | 2024-04-23 | 浙江西子富沃德电机有限公司 | 正余弦编码器及其信号处理方法、电梯控制系统 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5519686A (en) | Encoder for controlling measurements in the range of a few angstroms | |
| CA1312952C (fr) | Microsonde, fabrication de cette microsonde et dispositif electronique utilisant cette microsonde | |
| US5317152A (en) | Cantilever type probe, and scanning tunnel microscope and information processing apparatus employing the same | |
| EP0416920B1 (fr) | Procédé et dispositif de traitement d'information | |
| US5448421A (en) | Method for positioning an information processing head by detecting a magnetization pattern on a magnetic material positioned relative to a recording medium and a process for forming a recording and/or reproducing cantilever type probe | |
| EP0378444B1 (fr) | Appareil pour la reproduction | |
| CA2024648C (fr) | Methode d'acces et methode et dispositif de traitement de donnees utilsiant cette methode d'acces | |
| EP0475365B1 (fr) | Méthode d'asservissement pour appareil de mémorisation | |
| JP3135779B2 (ja) | 情報処理装置 | |
| EP0674170B1 (fr) | Techniques de mesure interatomique | |
| CA2040703C (fr) | Methode d'acces a un support d'enregistrement et appareil et methode de traitement d'informations | |
| CA1328131C (fr) | Codeur | |
| US5793040A (en) | Information processing aparatus effecting probe position control with electrostatic force | |
| JP2603270B2 (ja) | 記録装置および再生装置 | |
| EP0640963B1 (fr) | Procédé d'enregistrement et de reproduction et appareil utilisant une sonde de balayage | |
| JP2559048B2 (ja) | 相対変位量測定装置 | |
| JPH06333276A (ja) | 記録媒体及びその製造方法、及び該記録媒体を用いた情報処理装置 | |
| JP3004823B2 (ja) | 情報処理装置 | |
| CA2024725C (fr) | Methode et dispositif de traitement de donnees | |
| JPH04349243A (ja) | 平滑電極基板及びその製造方法、記録媒体及びその製造方法、及び情報処理装置 | |
| JPH03173957A (ja) | アクセス方法及びこれを利用した情報処理方法、情報処理装置 | |
| JPH06162581A (ja) | 記録再生装置 | |
| JPH04123338A (ja) | 情報再生装置および方法 | |
| JP2007109403A (ja) | 情報記録再生装置 | |
| JPH07153125A (ja) | 記録・再生装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MKLA | Lapsed |