CA1159578A - Cible pour l'alignement de masque - Google Patents

Cible pour l'alignement de masque

Info

Publication number
CA1159578A
CA1159578A CA000416530A CA416530A CA1159578A CA 1159578 A CA1159578 A CA 1159578A CA 000416530 A CA000416530 A CA 000416530A CA 416530 A CA416530 A CA 416530A CA 1159578 A CA1159578 A CA 1159578A
Authority
CA
Canada
Prior art keywords
target
alignment
wafer
lines
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA000416530A
Other languages
English (en)
Inventor
Daniel H. Berry
David A. Markle
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Biosystems Inc
Original Assignee
Perkin Elmer Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/019,964 external-priority patent/US4353087A/en
Application filed by Perkin Elmer Corp filed Critical Perkin Elmer Corp
Priority to CA000416530A priority Critical patent/CA1159578A/fr
Application granted granted Critical
Publication of CA1159578A publication Critical patent/CA1159578A/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CA000416530A 1979-03-12 1982-11-26 Cible pour l'alignement de masque Expired CA1159578A (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CA000416530A CA1159578A (fr) 1979-03-12 1982-11-26 Cible pour l'alignement de masque

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US06/019,964 US4353087A (en) 1979-03-12 1979-03-12 Automatic mask alignment
US019,964 1979-03-12
CA000345271A CA1150418A (fr) 1979-03-12 1980-02-08 Alignement automatique de masques
CA000416530A CA1159578A (fr) 1979-03-12 1982-11-26 Cible pour l'alignement de masque

Publications (1)

Publication Number Publication Date
CA1159578A true CA1159578A (fr) 1983-12-27

Family

ID=27166577

Family Applications (1)

Application Number Title Priority Date Filing Date
CA000416530A Expired CA1159578A (fr) 1979-03-12 1982-11-26 Cible pour l'alignement de masque

Country Status (1)

Country Link
CA (1) CA1159578A (fr)

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Legal Events

Date Code Title Description
MKEX Expiry
MKEX Expiry

Effective date: 20001227