CA1155238A - Resists a deux couches a grande resolution - Google Patents

Resists a deux couches a grande resolution

Info

Publication number
CA1155238A
CA1155238A CA000363463A CA363463A CA1155238A CA 1155238 A CA1155238 A CA 1155238A CA 000363463 A CA000363463 A CA 000363463A CA 363463 A CA363463 A CA 363463A CA 1155238 A CA1155238 A CA 1155238A
Authority
CA
Canada
Prior art keywords
resist material
resist
thickness
layer
lower layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA000363463A
Other languages
English (en)
Inventor
Richard E. Howard
Evelyn L. Hu
Lawrence D. Jackel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Application granted granted Critical
Publication of CA1155238A publication Critical patent/CA1155238A/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Electron Beam Exposure (AREA)
CA000363463A 1979-11-27 1980-10-29 Resists a deux couches a grande resolution Expired CA1155238A (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US9780979A 1979-11-27 1979-11-27
US097,809 1979-11-27

Publications (1)

Publication Number Publication Date
CA1155238A true CA1155238A (fr) 1983-10-11

Family

ID=22265225

Family Applications (1)

Application Number Title Priority Date Filing Date
CA000363463A Expired CA1155238A (fr) 1979-11-27 1980-10-29 Resists a deux couches a grande resolution

Country Status (6)

Country Link
JP (1) JPS5691428A (fr)
CA (1) CA1155238A (fr)
DE (1) DE3044434A1 (fr)
FR (1) FR2470402B1 (fr)
GB (1) GB2064152B (fr)
NL (1) NL8006438A (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3131031A1 (de) * 1981-08-05 1983-02-24 Siemens AG, 1000 Berlin und 8000 München Verfahren zum erzeugen der felddotierung beim herstellen von integrierten komplementaeren mos-feldeffekttransistoren
US5139922A (en) * 1987-04-10 1992-08-18 Matsushita Electronics Corporation Method of making resist pattern
DE102006050363B4 (de) 2006-10-25 2018-08-16 Advanced Mask Technology Center Gmbh & Co. Kg Verfahren zur Herstellung einer Fotomaske, Verfahren zur Strukturierung einer Schicht oder eines Schichtstapels und Resiststapel auf einem Maskensubstrat

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1622302A1 (de) * 1968-02-01 1970-10-29 Telefunken Patent Verfahren zum photographischen UEbertragen von Strukturen auf Halbleiterkoerper
US3934057A (en) * 1973-12-19 1976-01-20 International Business Machines Corporation High sensitivity positive resist layers and mask formation process
JPS51129190A (en) * 1975-05-02 1976-11-10 Fujitsu Ltd Manufacturing method of semiconductor
US4024293A (en) * 1975-12-10 1977-05-17 International Business Machines Corporation High sensitivity resist system for lift-off metallization
JPS5387668A (en) * 1977-01-13 1978-08-02 Toshiba Corp Forming method of patterns
US4211834A (en) * 1977-12-30 1980-07-08 International Business Machines Corporation Method of using a o-quinone diazide sensitized phenol-formaldehyde resist as a deep ultraviolet light exposure mask

Also Published As

Publication number Publication date
FR2470402B1 (fr) 1987-03-20
GB2064152A (en) 1981-06-10
GB2064152B (en) 1984-02-08
NL8006438A (nl) 1981-07-01
JPH0468769B2 (fr) 1992-11-04
FR2470402A1 (fr) 1981-05-29
DE3044434A1 (de) 1981-08-27
JPS5691428A (en) 1981-07-24

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Legal Events

Date Code Title Description
MKEX Expiry