CA1102931A - Plasma discharge ion source - Google Patents
Plasma discharge ion sourceInfo
- Publication number
- CA1102931A CA1102931A CA308,683A CA308683A CA1102931A CA 1102931 A CA1102931 A CA 1102931A CA 308683 A CA308683 A CA 308683A CA 1102931 A CA1102931 A CA 1102931A
- Authority
- CA
- Canada
- Prior art keywords
- plasma
- anode
- ions
- magnetic field
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/08—Ion sources; Ion guns using arc discharge
- H01J27/14—Other arc discharge ion sources using an applied magnetic field
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/822,866 US4139772A (en) | 1977-08-08 | 1977-08-08 | Plasma discharge ion source |
| US822,866 | 1977-08-08 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1102931A true CA1102931A (en) | 1981-06-09 |
Family
ID=25237181
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA308,683A Expired CA1102931A (en) | 1977-08-08 | 1978-08-03 | Plasma discharge ion source |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4139772A (enExample) |
| EP (1) | EP0000843B1 (enExample) |
| JP (1) | JPS5429970A (enExample) |
| CA (1) | CA1102931A (enExample) |
| DE (1) | DE2860523D1 (enExample) |
| IT (1) | IT1121501B (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4542321A (en) * | 1982-07-12 | 1985-09-17 | Denton Vacuum Inc | Inverted magnetron ion source |
| EP0135366B1 (en) * | 1983-08-15 | 1990-11-07 | Applied Materials, Inc. | System and method for ion implantation |
| DE3584105D1 (de) * | 1984-03-16 | 1991-10-24 | Hitachi Ltd | Ionenquelle. |
| US4774437A (en) * | 1986-02-28 | 1988-09-27 | Varian Associates, Inc. | Inverted re-entrant magnetron ion source |
| US4760262A (en) * | 1987-05-12 | 1988-07-26 | Eaton Corporation | Ion source |
| US4891525A (en) * | 1988-11-14 | 1990-01-02 | Eaton Corporation | SKM ion source |
| US5449920A (en) * | 1994-04-20 | 1995-09-12 | Northeastern University | Large area ion implantation process and apparatus |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2373151A (en) * | 1942-07-29 | 1945-04-10 | Cons Eng Corp | Analytical system |
| US2427484A (en) * | 1943-10-22 | 1947-09-16 | Stanolind Oil & Gas Co | Ionic gas analysis |
| US2829259A (en) * | 1954-08-13 | 1958-04-01 | Samuel N Foner | Mass spectrometer |
| US2826708A (en) * | 1955-06-02 | 1958-03-11 | Jr John S Foster | Plasma generator |
| US2831996A (en) * | 1956-09-19 | 1958-04-22 | Eugene F Martina | Ion source |
| NL266057A (enExample) * | 1960-06-21 | 1964-03-10 | ||
| FR1346091A (fr) * | 1962-01-30 | 1963-12-13 | Ass Elect Ind | Nouveau spectromètre de masse |
| FR1459469A (fr) * | 1965-11-29 | 1966-04-29 | Atomic Energy Commission | Procédé et appareil pour la production d'un plasma complètement ionisé |
| US3500077A (en) * | 1967-12-19 | 1970-03-10 | Atomic Energy Commission | Method and apparatus for accelerating ions out of a hot plasma region |
| FR1598559A (enExample) * | 1968-12-20 | 1970-07-06 | ||
| GB1414626A (en) * | 1971-11-24 | 1975-11-19 | Franks J | Ion sources |
| US3900585A (en) * | 1972-02-12 | 1975-08-19 | Agency Ind Science Techn | Method for control of ionization electrostatic plating |
| JPS5148097A (en) * | 1974-10-23 | 1976-04-24 | Osaka Koon Denki Kk | Iongen |
-
1977
- 1977-08-08 US US05/822,866 patent/US4139772A/en not_active Expired - Lifetime
-
1978
- 1978-08-03 CA CA308,683A patent/CA1102931A/en not_active Expired
- 1978-08-04 IT IT26513/78A patent/IT1121501B/it active
- 1978-08-08 JP JP9588978A patent/JPS5429970A/ja active Granted
- 1978-08-08 EP EP78300268A patent/EP0000843B1/en not_active Expired
- 1978-08-08 DE DE7878300268T patent/DE2860523D1/de not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| IT1121501B (it) | 1986-04-02 |
| EP0000843B1 (en) | 1981-03-11 |
| EP0000843A1 (en) | 1979-02-21 |
| JPS5429970A (en) | 1979-03-06 |
| DE2860523D1 (en) | 1981-04-09 |
| JPS6130372B2 (enExample) | 1986-07-12 |
| IT7826513A0 (it) | 1978-08-04 |
| US4139772A (en) | 1979-02-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4774437A (en) | Inverted re-entrant magnetron ion source | |
| Septier | PRODUCTION OF ION BEAMS | |
| Paoloni et al. | Some observations of the effect of magnetic field and arc current on the vacuum arc ion charge state distribution | |
| US4139772A (en) | Plasma discharge ion source | |
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| JP3039985B2 (ja) | 多量体イオン発生用マイクロ波イオン源、及びこのイオン源を用いたイオンビーム照射装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MKEX | Expiry |