CA1090485A - Appareil supporte pour la pulverisation de plasma a un taux de deposition eleve sur une grande surface - Google Patents

Appareil supporte pour la pulverisation de plasma a un taux de deposition eleve sur une grande surface

Info

Publication number
CA1090485A
CA1090485A CA283,461A CA283461A CA1090485A CA 1090485 A CA1090485 A CA 1090485A CA 283461 A CA283461 A CA 283461A CA 1090485 A CA1090485 A CA 1090485A
Authority
CA
Canada
Prior art keywords
anode
target
sputtering apparatus
accordance
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA283,461A
Other languages
English (en)
Inventor
Ronald W. Moss
Edwin D. Mcclanahan, Jr.
Nils Laegreid
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Battelle Memorial Institute Inc
Original Assignee
Battelle Memorial Institute Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Battelle Memorial Institute Inc filed Critical Battelle Memorial Institute Inc
Priority to CA283,461A priority Critical patent/CA1090485A/fr
Application granted granted Critical
Publication of CA1090485A publication Critical patent/CA1090485A/fr
Expired legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
CA283,461A 1977-07-25 1977-07-25 Appareil supporte pour la pulverisation de plasma a un taux de deposition eleve sur une grande surface Expired CA1090485A (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CA283,461A CA1090485A (fr) 1977-07-25 1977-07-25 Appareil supporte pour la pulverisation de plasma a un taux de deposition eleve sur une grande surface

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CA283,461A CA1090485A (fr) 1977-07-25 1977-07-25 Appareil supporte pour la pulverisation de plasma a un taux de deposition eleve sur une grande surface

Publications (1)

Publication Number Publication Date
CA1090485A true CA1090485A (fr) 1980-11-25

Family

ID=4109206

Family Applications (1)

Application Number Title Priority Date Filing Date
CA283,461A Expired CA1090485A (fr) 1977-07-25 1977-07-25 Appareil supporte pour la pulverisation de plasma a un taux de deposition eleve sur une grande surface

Country Status (1)

Country Link
CA (1) CA1090485A (fr)

Similar Documents

Publication Publication Date Title
US4038171A (en) Supported plasma sputtering apparatus for high deposition rate over large area
US3767551A (en) Radio frequency sputter apparatus and method
KR100547404B1 (ko) 플라즈마 발생 및 스퍼터링용 코일
US5069770A (en) Sputtering process employing an enclosed sputtering target
US4392932A (en) Method for obtaining uniform etch by modulating bias on extension member around radio frequency etch table
US4362611A (en) Quadrupole R.F. sputtering system having an anode/cathode shield and a floating target shield
US3661761A (en) Rf sputtering apparatus for promoting resputtering of film during deposition
JPH0633453B2 (ja) 陰極スパツタリング処理により基板に薄層を被着する装置
US3995187A (en) Electrode type glow discharge apparatus
US4430184A (en) Evaporation arc stabilization
ES2022946B3 (es) Proceso de aplicacion de capas sobre sustratos e instalaciones de recubrimiento en capas al vacio para la realizacion del proceso
US3562142A (en) R.f.sputter plating method and apparatus employing control of ion and electron bombardment of the plating
Schiller et al. Use of the ring gap plasmatron for high rate sputtering
US5718815A (en) Apparatus for coating a substrate from an electrically conductive target
US4135094A (en) Method and apparatus for rejuvenating ion sources
CA1145384A (fr) Tube cathodique a dispositif empechant les decharges en arc
US3953619A (en) Method for ionization electrostatic plating
CA1090485A (fr) Appareil supporte pour la pulverisation de plasma a un taux de deposition eleve sur une grande surface
US5691010A (en) Arc discharge plasma CVD method for forming diamond-like carbon films
US6248220B1 (en) Radio frequency sputtering apparatus and film formation method using same
US5733419A (en) Vacuum treatment chamber
GB1341759A (en) Film deposition
GB2109282A (en) Radio frequency etch table with biased extension member
JPH08319588A (ja) プラズマエッチング装置
JP2592617B2 (ja) イオン・プレーテイング装置

Legal Events

Date Code Title Description
MKEX Expiry