CA1054726A - Method and apparatus for electrostatic deflection of high current ion beams in scanning apparatus - Google Patents
Method and apparatus for electrostatic deflection of high current ion beams in scanning apparatusInfo
- Publication number
- CA1054726A CA1054726A CA255340A CA255340A CA1054726A CA 1054726 A CA1054726 A CA 1054726A CA 255340 A CA255340 A CA 255340A CA 255340 A CA255340 A CA 255340A CA 1054726 A CA1054726 A CA 1054726A
- Authority
- CA
- Canada
- Prior art keywords
- deflection
- ion beam
- deflection plate
- high current
- ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010884 ion-beam technique Methods 0.000 title claims abstract description 39
- 238000000034 method Methods 0.000 title abstract description 8
- 230000005591 charge neutralization Effects 0.000 abstract description 2
- 230000015556 catabolic process Effects 0.000 abstract 2
- 238000006731 degradation reaction Methods 0.000 abstract 2
- 150000002500 ions Chemical class 0.000 description 19
- 230000000694 effects Effects 0.000 description 3
- 238000006386 neutralization reaction Methods 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- 239000004020 conductor Substances 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/08—Deviation, concentration or focusing of the beam by electric or magnetic means
- G21K1/087—Deviation, concentration or focusing of the beam by electric or magnetic means by electrical means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
- H01J37/1472—Deflecting along given lines
- H01J37/1474—Scanning means
- H01J37/1477—Scanning means electrostatic
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Physical Vapour Deposition (AREA)
- Particle Accelerators (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/592,013 US3997846A (en) | 1975-06-30 | 1975-06-30 | Method and apparatus for electrostatic deflection of high current ion beams in scanning apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1054726A true CA1054726A (en) | 1979-05-15 |
Family
ID=24368912
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA255340A Expired CA1054726A (en) | 1975-06-30 | 1976-06-21 | Method and apparatus for electrostatic deflection of high current ion beams in scanning apparatus |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US3997846A (OSRAM) |
| JP (1) | JPS524998A (OSRAM) |
| CA (1) | CA1054726A (OSRAM) |
| DE (1) | DE2623207C2 (OSRAM) |
| FR (1) | FR2316721A1 (OSRAM) |
| GB (1) | GB1491839A (OSRAM) |
| IT (1) | IT1064202B (OSRAM) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2389998B1 (OSRAM) * | 1977-05-05 | 1981-11-20 | Ibm | |
| FR2412939A1 (fr) * | 1977-12-23 | 1979-07-20 | Anvar | Implanteur d'ions a fort courant |
| US4434371A (en) | 1982-03-04 | 1984-02-28 | Hughes Aircraft Company | Electron beam blanking apparatus and method |
| US4556823A (en) * | 1983-07-28 | 1985-12-03 | International Business Machines Corporation | Multi-function charged particle apparatus |
| US4686365A (en) * | 1984-12-24 | 1987-08-11 | American Cyanamid Company | Fourier transform ion cyclothon resonance mass spectrometer with spatially separated sources and detector |
| JPS6345744A (ja) * | 1986-08-11 | 1988-02-26 | Fujitsu Ltd | 荷電ビ−ムの偏向法 |
| JP4716399B2 (ja) * | 2004-05-21 | 2011-07-06 | 株式会社アルバック | イオン注入装置の静電偏向器 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA652815A (en) * | 1962-11-27 | Gabor Dennis | Ion source | |
| US2237671A (en) * | 1939-02-15 | 1941-04-08 | Emi Ltd | Electron discharge device |
| US2957141A (en) * | 1958-03-19 | 1960-10-18 | Gen Electric | Interval stretcher |
| US3040205A (en) * | 1960-05-31 | 1962-06-19 | Harold R Walker | Electrostatic vidicon |
| US3313969A (en) * | 1966-03-25 | 1967-04-11 | Boeing Co | Charged particle deflecting apparatus having hemispherical electrodes |
| US3535880A (en) * | 1966-06-14 | 1970-10-27 | Hughes Aircraft Co | Ion beam deflection system |
| NL157452B (nl) * | 1968-11-09 | 1978-07-17 | Philips Nv | Inrichting met een kathodestraalbuis. |
| US3665182A (en) * | 1969-08-18 | 1972-05-23 | Minnesota Mining & Mfg | Elemental analyzing apparatus |
| DE2242987B2 (de) * | 1972-09-01 | 1980-06-12 | Gesellschaft Fuer Strahlen- Und Umweltforschung Mbh, 8000 Muenchen | Vorrichtung zur Trennung von neutralen Teilchen und schnellen Ionen von langsamen Ionen |
| CH583460A5 (OSRAM) * | 1974-09-30 | 1976-12-31 | Balzers Patent Beteilig Ag |
-
1975
- 1975-06-30 US US05/592,013 patent/US3997846A/en not_active Expired - Lifetime
-
1976
- 1976-04-12 IT IT7622176A patent/IT1064202B/it active
- 1976-05-17 FR FR7615568A patent/FR2316721A1/fr active Granted
- 1976-05-24 DE DE2623207A patent/DE2623207C2/de not_active Expired
- 1976-06-09 GB GB23763/76A patent/GB1491839A/en not_active Expired
- 1976-06-21 CA CA255340A patent/CA1054726A/en not_active Expired
- 1976-06-23 JP JP51073381A patent/JPS524998A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| GB1491839A (en) | 1977-11-16 |
| US3997846A (en) | 1976-12-14 |
| FR2316721B1 (OSRAM) | 1978-11-17 |
| JPS524998A (en) | 1977-01-14 |
| DE2623207C2 (de) | 1983-05-05 |
| FR2316721A1 (fr) | 1977-01-28 |
| IT1064202B (it) | 1985-02-18 |
| JPS5332039B2 (OSRAM) | 1978-09-06 |
| DE2623207A1 (de) | 1977-01-27 |
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