CA1040987A - Process for stripping nickel from articles and composition utilized therein - Google Patents
Process for stripping nickel from articles and composition utilized thereinInfo
- Publication number
- CA1040987A CA1040987A CA201,047A CA201047A CA1040987A CA 1040987 A CA1040987 A CA 1040987A CA 201047 A CA201047 A CA 201047A CA 1040987 A CA1040987 A CA 1040987A
- Authority
- CA
- Canada
- Prior art keywords
- chloride
- tellurium
- ions
- stripping
- selenium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims abstract description 46
- 229910052759 nickel Inorganic materials 0.000 title claims abstract description 23
- 239000000203 mixture Substances 0.000 title claims abstract description 18
- 238000000034 method Methods 0.000 title claims abstract description 16
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims abstract description 18
- 229910017604 nitric acid Inorganic materials 0.000 claims abstract description 17
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims abstract description 14
- 229910052714 tellurium Inorganic materials 0.000 claims abstract description 14
- -1 selen-ium ions Chemical class 0.000 claims abstract description 13
- 239000011669 selenium Substances 0.000 claims abstract description 13
- 229910052711 selenium Inorganic materials 0.000 claims abstract description 12
- 238000007747 plating Methods 0.000 claims abstract description 11
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 claims abstract description 11
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 3
- 229910052802 copper Inorganic materials 0.000 claims abstract description 3
- 239000010949 copper Substances 0.000 claims abstract description 3
- 239000000243 solution Substances 0.000 claims description 24
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 claims description 22
- 239000011780 sodium chloride Substances 0.000 claims description 11
- 235000002639 sodium chloride Nutrition 0.000 claims description 11
- JPJALAQPGMAKDF-UHFFFAOYSA-N selenium dioxide Chemical compound O=[Se]=O JPJALAQPGMAKDF-UHFFFAOYSA-N 0.000 claims description 9
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 claims description 5
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 claims description 4
- 239000007864 aqueous solution Substances 0.000 claims description 3
- 239000003054 catalyst Substances 0.000 claims description 3
- 229940082569 selenite Drugs 0.000 claims description 3
- MCAHWIHFGHIESP-UHFFFAOYSA-L selenite(2-) Chemical compound [O-][Se]([O-])=O MCAHWIHFGHIESP-UHFFFAOYSA-L 0.000 claims description 3
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 claims description 2
- 229910001431 copper ion Inorganic materials 0.000 claims description 2
- JZCCFEFSEZPSOG-UHFFFAOYSA-L copper(II) sulfate pentahydrate Chemical compound O.O.O.O.O.[Cu+2].[O-]S([O-])(=O)=O JZCCFEFSEZPSOG-UHFFFAOYSA-L 0.000 claims description 2
- 229960003280 cupric chloride Drugs 0.000 claims description 2
- 230000002939 deleterious effect Effects 0.000 claims description 2
- 239000011565 manganese chloride Substances 0.000 claims description 2
- 229940099607 manganese chloride Drugs 0.000 claims description 2
- 239000001103 potassium chloride Substances 0.000 claims description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 claims 2
- 229910021380 Manganese Chloride Inorganic materials 0.000 claims 1
- GLFNIEUTAYBVOC-UHFFFAOYSA-L Manganese chloride Chemical compound Cl[Mn]Cl GLFNIEUTAYBVOC-UHFFFAOYSA-L 0.000 claims 1
- 235000002867 manganese chloride Nutrition 0.000 claims 1
- 229960002816 potassium chloride Drugs 0.000 claims 1
- 235000011164 potassium chloride Nutrition 0.000 claims 1
- 229960002668 sodium chloride Drugs 0.000 claims 1
- 235000011649 selenium Nutrition 0.000 abstract description 7
- 229940091258 selenium supplement Drugs 0.000 abstract description 7
- 239000000126 substance Substances 0.000 abstract description 3
- 238000009713 electroplating Methods 0.000 abstract description 2
- 230000001464 adherent effect Effects 0.000 abstract 1
- 239000010953 base metal Substances 0.000 abstract 1
- 229910000366 copper(II) sulfate Inorganic materials 0.000 description 8
- 229910001220 stainless steel Inorganic materials 0.000 description 8
- 239000010935 stainless steel Substances 0.000 description 8
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000002253 acid Substances 0.000 description 4
- XTVVROIMIGLXTD-UHFFFAOYSA-N copper(II) nitrate Chemical compound [Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XTVVROIMIGLXTD-UHFFFAOYSA-N 0.000 description 3
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 3
- LAJZODKXOMJMPK-UHFFFAOYSA-N tellurium dioxide Chemical compound O=[Te]=O LAJZODKXOMJMPK-UHFFFAOYSA-N 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- 229910018162 SeO2 Inorganic materials 0.000 description 2
- 229910003069 TeO2 Inorganic materials 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- 229910015400 FeC13 Inorganic materials 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- 229910003424 Na2SeO3 Inorganic materials 0.000 description 1
- 239000004157 Nitrosyl chloride Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- ICIWUVCWSCSTAQ-UHFFFAOYSA-M iodate Chemical compound [O-]I(=O)=O ICIWUVCWSCSTAQ-UHFFFAOYSA-M 0.000 description 1
- 229940005633 iodate ion Drugs 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- VPCDQGACGWYTMC-UHFFFAOYSA-N nitrosyl chloride Chemical compound ClN=O VPCDQGACGWYTMC-UHFFFAOYSA-N 0.000 description 1
- 235000019392 nitrosyl chloride Nutrition 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 229960003975 potassium Drugs 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- 235000019396 potassium bromate Nutrition 0.000 description 1
- BFPJYWDBBLZXOM-UHFFFAOYSA-L potassium tellurite Chemical compound [K+].[K+].[O-][Te]([O-])=O BFPJYWDBBLZXOM-UHFFFAOYSA-L 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000011781 sodium selenite Substances 0.000 description 1
- 235000015921 sodium selenite Nutrition 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- SITVSCPRJNYAGV-UHFFFAOYSA-N tellurous acid Chemical compound O[Te](O)=O SITVSCPRJNYAGV-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/44—Compositions for etching metallic material from a metallic material substrate of different composition
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Chemically Coating (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US00370889A US3856694A (en) | 1973-06-18 | 1973-06-18 | Process for stripping nickel from articles and composition utilized therein |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1040987A true CA1040987A (en) | 1978-10-24 |
Family
ID=23461605
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA201,047A Expired CA1040987A (en) | 1973-06-18 | 1974-05-28 | Process for stripping nickel from articles and composition utilized therein |
Country Status (11)
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2448526C3 (de) * | 1974-10-11 | 1978-03-30 | Audi Nsu Auto Union Ag, 7107 Neckarsulm | Verfahren zum stromlosen Ablösen einer Nickelschicht von nickelbeschichteten Gegenständen aus Leichtmetall |
| US4042451A (en) * | 1975-08-05 | 1977-08-16 | M&T Chemicals Inc. | Selected stripping of nickel-iron alloys from ferrous substrates |
| US4274908A (en) * | 1978-08-15 | 1981-06-23 | United Technologies Corporation | Cyanide free solution and process for removing gold-nickel braze |
| US4244833A (en) * | 1979-11-15 | 1981-01-13 | Oxy Metal Industries Corporation | Composition and process for chemically stripping metallic deposits |
| US4353780A (en) * | 1980-10-01 | 1982-10-12 | United Technologies Corporation | Chemical milling of high tungsten content superalloys |
| DK395481A (da) * | 1980-10-01 | 1982-04-02 | United Technologies Corp | Fremgangsmaade og middel til bearbejdelse af emner af en nikkel-aluminium legering |
| US4339282A (en) * | 1981-06-03 | 1982-07-13 | United Technologies Corporation | Method and composition for removing aluminide coatings from nickel superalloys |
| US4746369A (en) * | 1982-01-11 | 1988-05-24 | Enthone, Incorporated | Peroxide selective stripping compositions and method |
| CA1209886A (en) * | 1982-01-11 | 1986-08-19 | Thomas W. Bleeks | Peroxide selective stripping compositions and method |
| US4608091A (en) * | 1982-01-11 | 1986-08-26 | Enthone, Incorporated | Peroxide selective stripping compositions and method |
| US4554049A (en) * | 1984-06-07 | 1985-11-19 | Enthone, Incorporated | Selective nickel stripping compositions and method of stripping |
| CH674851A5 (enrdf_load_stackoverflow) * | 1987-12-01 | 1990-07-31 | Bbc Brown Boveri & Cie | |
| CA2090349C (en) * | 1992-03-04 | 1999-08-17 | John L. Cordani | Composition and method for stripping tin or tin-lead alloy from copper surfaces |
| US6642199B2 (en) | 2001-04-19 | 2003-11-04 | Hubbard-Hall, Inc. | Composition for stripping nickel from substrates and process |
| CA2808981A1 (en) * | 2013-03-05 | 2014-09-05 | Sherritt International Corporation | Method of recovering metals while mitigating corrosion |
| US11460778B2 (en) * | 2018-04-12 | 2022-10-04 | Versum Materials Us, Llc | Photoresist stripper |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3197341A (en) * | 1961-06-19 | 1965-07-27 | Rohr Corp | Method and composition for descaling stainless steels and related alloys |
| US3365401A (en) * | 1967-03-14 | 1968-01-23 | Enthone | Immersion type nickel stripper |
| US3553016A (en) * | 1967-06-02 | 1971-01-05 | Lithcote Corp | Method and composition for treating stainless steel |
| US3399143A (en) * | 1967-08-02 | 1968-08-27 | Macdermid Inc | Method of stripping nickel from articles and the composition used therein |
| US3709824A (en) * | 1971-01-07 | 1973-01-09 | Nippon Soda Co | Method and composition for chemical polishing of stainless steel surfaces |
| US3717520A (en) * | 1971-02-09 | 1973-02-20 | Enthone | Composition and method for selectively stripping nickel and/or copper |
-
1973
- 1973-06-18 ES ES427394A patent/ES427394A1/es not_active Expired
- 1973-06-18 US US00370889A patent/US3856694A/en not_active Expired - Lifetime
-
1974
- 1974-05-16 ZA ZA00743138A patent/ZA743138B/xx unknown
- 1974-05-28 CA CA201,047A patent/CA1040987A/en not_active Expired
- 1974-05-31 NL NL7407382A patent/NL7407382A/xx not_active Application Discontinuation
- 1974-06-12 DE DE2428380A patent/DE2428380C3/de not_active Expired
- 1974-06-14 IT IT51539/74A patent/IT1013479B/it active
- 1974-06-15 JP JP6864374A patent/JPS5647263B2/ja not_active Expired
- 1974-06-17 BR BR4948/74A patent/BR7404948D0/pt unknown
- 1974-06-17 GB GB2674074A patent/GB1475327A/en not_active Expired
- 1974-06-18 FR FR7421109A patent/FR2233418A1/fr not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| US3856694A (en) | 1974-12-24 |
| DE2428380A1 (de) | 1975-01-09 |
| GB1475327A (en) | 1977-06-01 |
| DE2428380B2 (de) | 1978-10-19 |
| ZA743138B (en) | 1975-06-25 |
| BR7404948D0 (pt) | 1975-01-07 |
| JPS5036321A (enrdf_load_stackoverflow) | 1975-04-05 |
| AU6905174A (en) | 1975-11-20 |
| IT1013479B (it) | 1977-03-30 |
| FR2233418A1 (enrdf_load_stackoverflow) | 1975-01-10 |
| DE2428380C3 (de) | 1979-06-07 |
| NL7407382A (enrdf_load_stackoverflow) | 1974-12-20 |
| JPS5647263B2 (enrdf_load_stackoverflow) | 1981-11-09 |
| ES427394A1 (es) | 1977-02-01 |
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