CA1035574A - Rotary fluid applicator - Google Patents

Rotary fluid applicator

Info

Publication number
CA1035574A
CA1035574A CA211,477A CA211477A CA1035574A CA 1035574 A CA1035574 A CA 1035574A CA 211477 A CA211477 A CA 211477A CA 1035574 A CA1035574 A CA 1035574A
Authority
CA
Canada
Prior art keywords
rotary fluid
fluid applicator
applicator
rotary
fluid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA211,477A
Other languages
French (fr)
Other versions
CA211477S (en
Inventor
Howard E. Hansen
Robert J. Straub
Edward M. Tuczynski
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of CA1035574A publication Critical patent/CA1035574A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
    • F26B21/004—Nozzle assemblies; Air knives; Air distributors; Blow boxes
CA211,477A 1973-11-07 1974-10-16 Rotary fluid applicator Expired CA1035574A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US00413753A US3849906A (en) 1973-11-07 1973-11-07 Rotary fluid applicator

Publications (1)

Publication Number Publication Date
CA1035574A true CA1035574A (en) 1978-08-01

Family

ID=23638474

Family Applications (1)

Application Number Title Priority Date Filing Date
CA211,477A Expired CA1035574A (en) 1973-11-07 1974-10-16 Rotary fluid applicator

Country Status (7)

Country Link
US (1) US3849906A (en)
JP (1) JPS5074857A (en)
CA (1) CA1035574A (en)
DE (1) DE2442309A1 (en)
FR (1) FR2249717B1 (en)
GB (1) GB1482106A (en)
IT (1) IT1022104B (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5417640A (en) * 1977-07-08 1979-02-09 Mitsubishi Electric Corp Malfunction preventive device for integrated circuit
US4429983A (en) 1982-03-22 1984-02-07 International Business Machines Corporation Developing apparatus for exposed photoresist coated wafers
DE3502648A1 (en) * 1985-01-26 1986-07-31 Carl Prof. Dr.-Ing. 5100 Aachen Kramer DEVICE FOR MIXING A MAIN GAS FLOW WITH AT LEAST ONE SUB GAS FLOW
DE3503089A1 (en) * 1985-01-30 1986-07-31 Carl Prof. Dr.-Ing. 5100 Aachen Kramer DEVICE FOR EVENLY APPLYING A TARGET SURFACE WITH A GAS
SG11201906903PA (en) * 2017-02-06 2019-08-27 Planar Semiconductor Inc Sub-nanometer-level substrate cleaning mechanism
TWI760430B (en) * 2017-02-06 2022-04-11 新加坡商平面半導體公司 Subnanometer-level light-based substrate cleaning mechanism
TWI770115B (en) * 2017-02-06 2022-07-11 新加坡商平面半導體公司 Removal of process effluents
JP2022541862A (en) * 2020-06-30 2022-09-28 東莞宇宙電路板設備有限公司 surface treatment equipment

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2602003A (en) * 1946-10-30 1952-07-01 Willard Storage Battery Co Rotating apparatus for blowing loose foreign material from articles
US2532494A (en) * 1946-11-23 1950-12-05 Mcgraw Electric Co Method of making paper tubes

Also Published As

Publication number Publication date
JPS5074857A (en) 1975-06-19
FR2249717B1 (en) 1976-12-31
IT1022104B (en) 1978-03-20
FR2249717A1 (en) 1975-05-30
DE2442309A1 (en) 1975-05-22
GB1482106A (en) 1977-08-03
US3849906A (en) 1974-11-26

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