CA1028979A - Regeneration of spent etchant - Google Patents

Regeneration of spent etchant

Info

Publication number
CA1028979A
CA1028979A CA163,197A CA163197A CA1028979A CA 1028979 A CA1028979 A CA 1028979A CA 163197 A CA163197 A CA 163197A CA 1028979 A CA1028979 A CA 1028979A
Authority
CA
Canada
Prior art keywords
regeneration
spent etchant
etchant
spent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA163,197A
Other languages
English (en)
French (fr)
Other versions
CA163197S (en
Inventor
Michael Gulla
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shipley Co Inc
Original Assignee
Shipley Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shipley Co Inc filed Critical Shipley Co Inc
Application granted granted Critical
Publication of CA1028979A publication Critical patent/CA1028979A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
    • C25C1/12—Electrolytic production, recovery or refining of metals by electrolysis of solutions of copper
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/46—Regeneration of etching compositions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Electrochemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)
CA163,197A 1972-02-09 1973-02-08 Regeneration of spent etchant Expired CA1028979A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US22489472A 1972-02-09 1972-02-09

Publications (1)

Publication Number Publication Date
CA1028979A true CA1028979A (en) 1978-04-04

Family

ID=22842662

Family Applications (1)

Application Number Title Priority Date Filing Date
CA163,197A Expired CA1028979A (en) 1972-02-09 1973-02-08 Regeneration of spent etchant

Country Status (6)

Country Link
US (1) US3788915A (sv)
JP (1) JPS4896430A (sv)
CA (1) CA1028979A (sv)
DE (1) DE2306524A1 (sv)
FR (1) FR2171340B1 (sv)
GB (1) GB1417246A (sv)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5124537A (en) * 1974-08-26 1976-02-27 Hitachi Ltd Etsuchinguyokuno saiseihoho
US4107011A (en) * 1975-03-17 1978-08-15 Vladimir Ilich Kucherenko Method of regeneration of spent etching solutions
US4177119A (en) * 1976-03-09 1979-12-04 Solex Research Corporation Process for recovery of waste H2 SO4 and HCl
US4113588A (en) * 1976-03-09 1978-09-12 Solex Research Corporation Of Japan Process for recovery of waste H2 SO4 and HCl
US4073708A (en) * 1976-06-18 1978-02-14 The Boeing Company Apparatus and method for regeneration of chromosulfuric acid etchants
US4092211A (en) * 1976-11-18 1978-05-30 Northern Telecom Limited Control of etch rate of silicon dioxide in boiling phosphoric acid
DE2850542C2 (de) * 1978-11-22 1982-07-01 Kernforschungsanlage Jülich GmbH, 5170 Jülich Verfahren zum Ätzen von Oberflächen aus Kupfer oder Kupferlegierungen
DE2850564C2 (de) * 1978-11-22 1982-12-23 Kernforschungsanlage Jülich GmbH, 5170 Jülich Verfahren und Vorrichtung zum Regenerieren einer Kupfer(II)-Chlorid und/oder Eisen(III)-Chlorid enthaltenden Ätzlösung in einer Elektrolysezelle
CS218296B1 (en) * 1980-10-30 1983-02-25 Antonin Stehlik Method of continuous regeneration of the iron trichloride solution
JPS5931868A (ja) * 1982-08-13 1984-02-21 Toshiba Corp 金属板のエツチング方法
GB2131454B (en) * 1982-12-07 1986-06-25 Jury Ivanovich Naumov Process for regeneration of iron-copper chloride etching solution
DE3340343A1 (de) * 1983-04-13 1984-10-18 Kernforschungsanlage Jülich GmbH, 5170 Jülich Verfahren und anlage zum regenerieren einer ammoniakalischen aetzloesung
US4482426A (en) * 1984-04-02 1984-11-13 Rca Corporation Method for etching apertures into a strip of nickel-iron alloy
US4572824A (en) * 1984-11-01 1986-02-25 General Electric Company Process for recovery of zirconium and acid from spent etching solutions
US4944851A (en) * 1989-06-05 1990-07-31 Macdermid, Incorporated Electrolytic method for regenerating tin or tin-lead alloy stripping compositions
US5227010A (en) * 1991-04-03 1993-07-13 International Business Machines Corporation Regeneration of ferric chloride etchants
US7404904B2 (en) * 2001-10-02 2008-07-29 Melvin Stanley Method and apparatus to clean particulate matter from a toxic fluid
CN112626567B (zh) * 2020-11-23 2022-03-29 江苏净源新材料有限公司 一种利用蚀刻液回收铜制备纳米铜粉的方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2748071A (en) * 1951-08-30 1956-05-29 Technograph Printed Circuits L Apparatus for regeneration of etching media

Also Published As

Publication number Publication date
FR2171340B1 (sv) 1975-01-17
US3788915A (en) 1974-01-29
GB1417246A (en) 1975-12-10
JPS4896430A (sv) 1973-12-10
DE2306524A1 (de) 1973-08-23
FR2171340A1 (sv) 1973-09-21

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