CA1026143A - Materiel photographique servant a la fabrication de photomasques - Google Patents

Materiel photographique servant a la fabrication de photomasques

Info

Publication number
CA1026143A
CA1026143A CA210,843A CA210843A CA1026143A CA 1026143 A CA1026143 A CA 1026143A CA 210843 A CA210843 A CA 210843A CA 1026143 A CA1026143 A CA 1026143A
Authority
CA
Canada
Prior art keywords
photomask
same
photographic material
producing
forming photographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA210,843A
Other languages
English (en)
Other versions
CA210843S (en
Inventor
Masamichi Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of CA1026143A publication Critical patent/CA1026143A/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
    • G03C5/26—Processes using silver-salt-containing photosensitive materials or agents therefor
    • G03C5/40—Chemically transforming developed images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CA210,843A 1973-10-09 1974-10-07 Materiel photographique servant a la fabrication de photomasques Expired CA1026143A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11362973A JPS532727B2 (fr) 1973-10-09 1973-10-09

Publications (1)

Publication Number Publication Date
CA1026143A true CA1026143A (fr) 1978-02-14

Family

ID=14617057

Family Applications (1)

Application Number Title Priority Date Filing Date
CA210,843A Expired CA1026143A (fr) 1973-10-09 1974-10-07 Materiel photographique servant a la fabrication de photomasques

Country Status (6)

Country Link
US (1) US4362807A (fr)
JP (1) JPS532727B2 (fr)
CA (1) CA1026143A (fr)
DE (1) DE2448172C2 (fr)
FR (1) FR2246888A1 (fr)
GB (1) GB1481623A (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030209514A1 (en) * 1997-04-04 2003-11-13 Infineon Technologies North America Corp. Etching composition and use thereof with feedback control of HF in BEOL clean
US6303262B1 (en) 1998-06-18 2001-10-16 Mitsubishi Paper Mills Ltd. Photomask material, photomask and methods for the production thereof
TW527443B (en) * 2000-07-28 2003-04-11 Infineon Technologies Corp Etching composition and use thereof with feedback control of HF in BEOL clean
EP1193721A3 (fr) * 2000-09-28 2004-06-30 Fuji Photo Film Co., Ltd. Grille d'absorption de radiation diffusée
US7666579B1 (en) * 2001-09-17 2010-02-23 Serenity Technologies, Inc. Method and apparatus for high density storage of analog data in a durable medium
WO2005076935A2 (fr) * 2004-02-05 2005-08-25 Northern Illinois University Filtrage de longueur d'onde en nanolithographie
US8618036B2 (en) * 2011-11-14 2013-12-31 International Business Machines Corporation Aqueous cerium-containing solution having an extended bath lifetime for removing mask material

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE413142C (de) * 1921-12-31 1925-05-11 Patent Udnyttelse Selskab M B Verfahren zur Herstellung von Gelatinedruckplatten
DE517517C (de) * 1927-11-14 1931-02-16 Leopold Rado Metallfilm
US2882150A (en) * 1954-10-22 1959-04-14 Eastman Kodak Co Photographic elements containing polymeric ultraviolet absorbing compounds
US2999016A (en) * 1955-03-24 1961-09-05 Keuffel & Esser Co Drawing material
US2937087A (en) * 1957-09-30 1960-05-17 Du Pont Silver halide emulsions
DE1274444B (de) * 1965-02-09 1968-08-01 Siemens Ag Verfahren zur Herstellung von Photomasken fuer Halbleiteranordnungen
US3533795A (en) * 1966-08-24 1970-10-13 Dietzgen Co Eugene Base film with improved scribe coating and photosensitive coating applied thereon
US3484154A (en) * 1966-09-23 1969-12-16 Us Army Crossed diffraction grating
US3551150A (en) * 1967-07-03 1970-12-29 Eastman Kodak Co Process for producing lithographic plates comprising etch bleaching,etching and copperizing
NL162215C (fr) * 1967-07-03 Ibm
US3561963A (en) * 1967-09-11 1971-02-09 Signetics Corp Transparent mask and method for making the same
US3639125A (en) * 1969-01-10 1972-02-01 Ibm Process for producing photographic relief patterns
JPS5022877B1 (fr) * 1969-07-28 1975-08-02
US3813255A (en) * 1970-06-09 1974-05-28 Agfa Gevaert Nv Ultraviolet-absorbing polymers compositions and filter
US3674492A (en) * 1970-12-09 1972-07-04 Bell Telephone Labor Inc Laminar photomask
US3669665A (en) * 1971-02-18 1972-06-13 Ibm Process for making resist stencils from photographic stripping films and for using same
US3864132A (en) * 1972-05-22 1975-02-04 Eastman Kodak Co Article having a hydrophilic colloid layer adhesively bonded to a hydrophobic polymer support
JPS5086336A (fr) * 1973-11-29 1975-07-11

Also Published As

Publication number Publication date
DE2448172A1 (de) 1975-08-21
JPS5070007A (fr) 1975-06-11
JPS532727B2 (fr) 1978-01-31
FR2246888A1 (fr) 1975-05-02
DE2448172C2 (de) 1984-09-13
GB1481623A (en) 1977-08-03
US4362807A (en) 1982-12-07

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