CA1014346A - Apparatus and method for image alignment - Google Patents

Apparatus and method for image alignment

Info

Publication number
CA1014346A
CA1014346A CA211,026A CA211026A CA1014346A CA 1014346 A CA1014346 A CA 1014346A CA 211026 A CA211026 A CA 211026A CA 1014346 A CA1014346 A CA 1014346A
Authority
CA
Canada
Prior art keywords
image alignment
alignment
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA211,026A
Other languages
English (en)
Other versions
CA211026S (en
Inventor
William M. Mendez
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oxy Metal Industries Corp
Original Assignee
Oxy Metal Industries Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oxy Metal Industries Corp filed Critical Oxy Metal Industries Corp
Application granted granted Critical
Publication of CA1014346A publication Critical patent/CA1014346A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23QDETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q16/00Equipment for precise positioning of tool or work into particular locations not otherwise provided for
    • B23Q16/02Indexing equipment
    • B23Q16/08Indexing equipment having means for clamping the relatively movable parts together in the indexed position
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/12Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
    • H05K3/1216Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by screen printing or stencil printing

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Screen Printers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
CA211,026A 1973-10-09 1974-10-08 Apparatus and method for image alignment Expired CA1014346A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/404,825 US3947126A (en) 1973-10-09 1973-10-09 Method for image alignment

Publications (1)

Publication Number Publication Date
CA1014346A true CA1014346A (en) 1977-07-26

Family

ID=23601212

Family Applications (1)

Application Number Title Priority Date Filing Date
CA211,026A Expired CA1014346A (en) 1973-10-09 1974-10-08 Apparatus and method for image alignment

Country Status (6)

Country Link
US (1) US3947126A (ja)
JP (1) JPS5814757B2 (ja)
CA (1) CA1014346A (ja)
DE (1) DE2448227A1 (ja)
FR (1) FR2247050B3 (ja)
GB (1) GB1485851A (ja)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3071052D1 (en) * 1979-04-03 1985-10-10 Eaton Optimetrix Inc Improved step-and-repeat projection alignment and exposure system
US4473293A (en) * 1979-04-03 1984-09-25 Optimetrix Corporation Step-and-repeat projection alignment and exposure system
US4573791A (en) * 1979-04-03 1986-03-04 Optimetrix Corporation Step-and-repeat projection alignment and exposure system
SE440204B (sv) * 1979-04-23 1985-07-22 Svecia Silkscreen Maskiner Ab Sett och anordning att injustera ett tryck pa ett material
JPS6328427Y2 (ja) * 1979-06-28 1988-08-01
JPS5613172A (en) * 1979-07-16 1981-02-09 Toppan Printing Co Ltd Retouching device for minute pattern
JPS5651384U (ja) * 1979-09-25 1981-05-07
US4452526A (en) * 1980-02-29 1984-06-05 Optimetrix Corporation Step-and-repeat projection alignment and exposure system with auxiliary optical unit
DE8007545U1 (de) * 1980-03-19 1980-06-12 Siemens Ag, 1000 Berlin Und 8000 Muenchen Justiereinrichtung an einer siebdruckmaschine
JPS57204534A (en) * 1981-06-11 1982-12-15 Fujiretsukusu Kk Positioning device for sheetlike body by pin engagement
US4514086A (en) * 1982-01-05 1985-04-30 Stine Edward V Apparatus for measuring refractive properties of lenses and other transmissive devices
US5310674A (en) * 1982-05-10 1994-05-10 Bar-Ilan University Apertured cell carrier
US5272081A (en) * 1982-05-10 1993-12-21 Bar-Ilan University System and methods for cell selection
US4523851A (en) * 1982-08-11 1985-06-18 Ncr Corporation Precision IC alignment keys and method
FR2661007B1 (fr) * 1990-04-12 1994-04-01 Etat Francais Delegue Armement Dispositif d'aiguillage optique pour faisceau laser.
US5459546A (en) * 1992-08-28 1995-10-17 Penn; Randy J. Method and apparatus for accurate alignment of semiconductor wafers in photo printers
CN103847220B (zh) * 2014-02-18 2015-12-30 昆山双特科技有限公司 一种网架与线路板定位装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3175458A (en) * 1960-02-23 1965-03-30 Motorola Inc Optical apparatus for positioning a workpiece
US3672778A (en) * 1970-12-09 1972-06-27 Ibm Optical system for positional and angular orientation determining apparatus
US3752589A (en) * 1971-10-26 1973-08-14 M Kobayashi Method and apparatus for positioning patterns of a photographic mask on the surface of a wafer on the basis of backside patterns of the wafer

Also Published As

Publication number Publication date
JPS5077864A (ja) 1975-06-25
FR2247050B3 (ja) 1977-07-15
GB1485851A (en) 1977-09-14
JPS5814757B2 (ja) 1983-03-22
DE2448227A1 (de) 1975-04-10
US3947126A (en) 1976-03-30
FR2247050A1 (ja) 1975-05-02

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