BR9814915A - MonÈmeros contendo alquileno-uréias, seuspolìmeros e látex - Google Patents
MonÈmeros contendo alquileno-uréias, seuspolìmeros e látexInfo
- Publication number
- BR9814915A BR9814915A BR9814915-6A BR9814915A BR9814915A BR 9814915 A BR9814915 A BR 9814915A BR 9814915 A BR9814915 A BR 9814915A BR 9814915 A BR9814915 A BR 9814915A
- Authority
- BR
- Brazil
- Prior art keywords
- substituted
- alicyclic
- aryl
- alkyl
- alkylene
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/04—Homopolymers or copolymers of esters
- C09D133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09D133/062—Copolymers with monomers not covered by C09D133/06
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
- C07D233/04—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
- C07D233/28—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D233/30—Oxygen or sulfur atoms
- C07D233/32—One oxygen atom
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
- C07D233/04—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
- C07D233/28—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D233/30—Oxygen or sulfur atoms
- C07D233/32—One oxygen atom
- C07D233/36—One oxygen atom with hydrocarbon radicals, substituted by nitrogen atoms, attached to ring nitrogen atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
- C08F20/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Paints Or Removers (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
"MONÈMEROS CONTENDO ALQUILENO-URéIAS, SEUSPOLìMEROS E LáTEX". Uma nova composição monomérica parapromover uma adesão úmida de polímeros de látex para tintas éfornecida. A composição consiste essencialmente de ummonómero tendo fórmula (I) onde: R^ 1^ é alquileno tendo cercade 2 ou 3 átomos de carbono; R^ 2^ é alquileno tendo cerca de 2a cerca de 10 átomos de carbono; X é oxigênio, enxofre, ou NR^3^ onde R^ 3^ é hidrogênio, alquila, alquila substituída, alicíclico,alicíclico substituído, arila, arila substituída, heteroalquila,heterocíclico; R^ 4^ tem a estrutura do resíduo de um diisocianatoalicílico onde os grupos de isocianato tem reatividades que diferemuma da outra; Y é oxigênio, enxofre, ou NR^ 5^ onde R^ 5^ éhidrogênio, alquila, alquila substituída, alicíclico, alicíclicosubstituído, arila, arila substituída, heteroalquila ou heterocíclico;R^ 6^ é alquileno, arileno, aralquileno, alcarileno ouheteroalquileno; Z é oxigênio, enxofre, ou NR^ 7^ onde R^ 7^ éhidrogênio, alquila, alquila substituída, alicíclico, alicíclicosubstituído, arila, arila substituída, heteroalquila ou heterocíclico; eR^ 8^ é hidrogênio ou metila. O monómero preferido é derivado dareação de metacrilato de hidroxietila com diisocianato de isoforonaseguido pelo reação do produto de monouretano a N-aminoetiletileno uréia. O monómero é preferivelmente copolimerizado emuma polimerização de emulsão com monómeros acrílicos e/ouvinílicos.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/014,552 US6069275A (en) | 1998-01-28 | 1998-01-28 | Monomers and polymers and latices therefrom |
PCT/US1998/027356 WO1999038848A1 (en) | 1998-01-28 | 1998-12-23 | Cyclic alkyleneureas containing monomers and polymers and latices therefrom |
Publications (1)
Publication Number | Publication Date |
---|---|
BR9814915A true BR9814915A (pt) | 2001-11-20 |
Family
ID=21766139
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR9814915-6A BR9814915A (pt) | 1998-01-28 | 1998-12-23 | MonÈmeros contendo alquileno-uréias, seuspolìmeros e látex |
Country Status (8)
Country | Link |
---|---|
US (2) | US6069275A (pt) |
EP (1) | EP1051400A1 (pt) |
JP (1) | JP2002501980A (pt) |
CN (2) | CN1110483C (pt) |
AU (1) | AU1943099A (pt) |
BR (1) | BR9814915A (pt) |
CA (1) | CA2319054A1 (pt) |
WO (1) | WO1999038848A1 (pt) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6069275A (en) * | 1998-01-28 | 2000-05-30 | Rhodia Inc. | Monomers and polymers and latices therefrom |
US6734280B1 (en) | 2000-09-14 | 2004-05-11 | Meadwestvaco Corporation | Rosin-fatty acid vinylic polyamide polymer resins |
US6437037B1 (en) | 2000-09-14 | 2002-08-20 | Westvaco Corporation | Rosin-fatty acid vinylic polyamide polymer supported latices |
US7273598B2 (en) * | 2001-01-19 | 2007-09-25 | Chevron U.S.A. Inc. | Diamondoid-containing materials for passivating layers in integrated circuit devices |
US6783589B2 (en) * | 2001-01-19 | 2004-08-31 | Chevron U.S.A. Inc. | Diamondoid-containing materials in microelectronics |
US6858700B2 (en) | 2001-01-19 | 2005-02-22 | Chervon U.S.A. Inc. | Polymerizable higher diamondoid derivatives |
US7306674B2 (en) * | 2001-01-19 | 2007-12-11 | Chevron U.S.A. Inc. | Nucleation of diamond films using higher diamondoids |
US7795468B2 (en) * | 2001-01-19 | 2010-09-14 | Chevron U.S.A. Inc. | Functionalized higher diamondoids |
CA2434921A1 (en) * | 2001-01-19 | 2002-07-25 | Chevron U.S.A. Inc. | Polymerizable higher diamondoid derivatives |
US7812079B2 (en) | 2001-02-22 | 2010-10-12 | Valspar Sourcing, Inc. | Coating compositions containing low VOC compounds |
WO2003082993A2 (en) * | 2002-03-28 | 2003-10-09 | Rhodia, Inc. | Application of imidazolidone-modified latexes to carbonyl-containing plastic substrates |
JP2004083678A (ja) * | 2002-08-26 | 2004-03-18 | Kansai Paint Co Ltd | 水性メタリック塗料 |
US7312562B2 (en) * | 2004-02-04 | 2007-12-25 | Chevron U.S.A. Inc. | Heterodiamondoid-containing field emission devices |
CN1912030B (zh) * | 2005-08-11 | 2010-07-28 | 中国石油天然气集团公司 | 高温涂敷的丙烯酸树脂涂料及制造方法 |
FR2896499A1 (fr) * | 2006-01-23 | 2007-07-27 | Arkema Sa | Compositions a base de (meth)acrylates d'alkylimidazolidone |
CN105370187B (zh) | 2008-11-18 | 2017-12-26 | 亨特道格拉斯有限公司 | 板条型卷帘 |
EP2405997B1 (en) | 2009-03-13 | 2017-05-03 | Valspar Sourcing, Inc. | Vinyl polymer wetting and dispersing agents |
JP5998624B2 (ja) * | 2011-05-16 | 2016-09-28 | セイコーエプソン株式会社 | 紫外線硬化型インクジェット組成物および印刷物 |
US9321928B2 (en) | 2011-05-17 | 2016-04-26 | Seiko Epson Corporation | Metal powder, ultraviolet ray curable ink jet composition and recorded object |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2613212A (en) * | 1950-10-26 | 1952-10-07 | Rohm & Haas | Imidazolidone derivatives |
US3356655A (en) * | 1966-08-15 | 1967-12-05 | Desoto Inc | Copolymers of ethylenically unsaturated hydroxy-functional amines |
US3509085A (en) * | 1967-11-02 | 1970-04-28 | Desoto Inc | Copolymers of ethylenically unsaturated hydroxy functional cyclic amine ethers |
US4111877A (en) * | 1976-07-29 | 1978-09-05 | Air Products & Chemicals, Inc. | Allyl esters of n-alkyl-omega-(alkyleneureido) amic acids and their synthesis and use in aqueous emulsion polymer systems |
CA1269378A (en) * | 1981-10-23 | 1990-05-22 | George Emile Abboud | Polymerisable monomers, polymer dispersions and derived paints |
US4730045A (en) * | 1982-12-09 | 1988-03-08 | Desoto, Inc. | Method for making pyrimidin-2-one and imidazol-2-one copolymerizable monomer derivatives |
US4526915A (en) * | 1983-07-08 | 1985-07-02 | Desoto, Inc. | Wet adhesion promoters for emulsion polymers |
US4487940A (en) * | 1983-07-08 | 1984-12-11 | Desoto, Inc. | Wet adhesion promoters for emulsion polymers |
US4632957A (en) * | 1984-09-04 | 1986-12-30 | Ppg Industries, Inc. | Ethylenically unsaturated ethylene and propylene ureas containing alkylene urea groups or alkylene urethane groups, useful in coating compositions |
US4861853A (en) * | 1985-12-27 | 1989-08-29 | The Sherwin-Williams Company | Isocyanate functional polymers |
EP0594596A1 (en) * | 1990-02-14 | 1994-05-04 | H.B. FULLER LICENSING & FINANCING, INC. | Copolymerizable imidazolidinone monomer |
US5496907A (en) * | 1993-03-02 | 1996-03-05 | H. B. Fuller Licensing & Financing, Inc. | Wet adhesion monomers with ureido functionality and polymers prepared therefrom |
US5371148A (en) * | 1993-06-23 | 1994-12-06 | Union Carbide Chemicals & Plastics Technology Corporation | Reactive polymers having pendant flexible side chains prepared from ethylenically unsaturated carbodiimides |
US6069275A (en) * | 1998-01-28 | 2000-05-30 | Rhodia Inc. | Monomers and polymers and latices therefrom |
-
1998
- 1998-01-28 US US09/014,552 patent/US6069275A/en not_active Expired - Fee Related
- 1998-12-23 JP JP2000530085A patent/JP2002501980A/ja active Pending
- 1998-12-23 AU AU19430/99A patent/AU1943099A/en not_active Abandoned
- 1998-12-23 BR BR9814915-6A patent/BR9814915A/pt not_active IP Right Cessation
- 1998-12-23 CN CN98813833A patent/CN1110483C/zh not_active Expired - Fee Related
- 1998-12-23 WO PCT/US1998/027356 patent/WO1999038848A1/en not_active Application Discontinuation
- 1998-12-23 EP EP98964259A patent/EP1051400A1/en not_active Withdrawn
- 1998-12-23 CA CA002319054A patent/CA2319054A1/en not_active Abandoned
-
2000
- 2000-05-26 US US09/579,027 patent/US6300410B1/en not_active Expired - Fee Related
-
2002
- 2002-11-20 CN CN02152716A patent/CN1429821A/zh active Pending
Also Published As
Publication number | Publication date |
---|---|
EP1051400A1 (en) | 2000-11-15 |
AU1943099A (en) | 1999-08-16 |
JP2002501980A (ja) | 2002-01-22 |
US6069275A (en) | 2000-05-30 |
CN1110483C (zh) | 2003-06-04 |
US6300410B1 (en) | 2001-10-09 |
CN1429821A (zh) | 2003-07-16 |
CA2319054A1 (en) | 1999-08-05 |
WO1999038848A1 (en) | 1999-08-05 |
CN1284949A (zh) | 2001-02-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
B08F | Application fees: application dismissed [chapter 8.6 patent gazette] |
Free format text: REFERENTE A 6O, 7O E 8O ANUIDADES. |
|
B08K | Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette] |
Free format text: REFERENTE AO DESPACHO 8.6 PUBLICADO NA RPI 1910 DE 14/08/2007. |