BR8903080A - Material de registro polimerizavel por radiacao e processo para preparacao de registros em relevo - Google Patents

Material de registro polimerizavel por radiacao e processo para preparacao de registros em relevo

Info

Publication number
BR8903080A
BR8903080A BR898903080A BR8903080A BR8903080A BR 8903080 A BR8903080 A BR 8903080A BR 898903080 A BR898903080 A BR 898903080A BR 8903080 A BR8903080 A BR 8903080A BR 8903080 A BR8903080 A BR 8903080A
Authority
BR
Brazil
Prior art keywords
compound
polymerisable
radiation
photoresist layer
radiation polymerizable
Prior art date
Application number
BR898903080A
Other languages
English (en)
Inventor
Ulrich Geissler
Hans Wilski
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of BR8903080A publication Critical patent/BR8903080A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C7/00—Multicolour photographic processes or agents therefor; Regeneration of such processing agents; Photosensitive materials for multicolour processes
    • G03C7/30—Colour processes using colour-coupling substances; Materials therefor; Preparing or processing such materials
    • G03C7/32—Colour coupling substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymerisation Methods In General (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Medical Uses (AREA)
  • Heat Treatment Of Strip Materials And Filament Materials (AREA)
  • Air Bags (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • ing And Chemical Polishing (AREA)
BR898903080A 1988-06-25 1989-06-23 Material de registro polimerizavel por radiacao e processo para preparacao de registros em relevo BR8903080A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE3821583A DE3821583A1 (de) 1988-06-25 1988-06-25 Durch strahlung polymerisierbares aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen

Publications (1)

Publication Number Publication Date
BR8903080A true BR8903080A (pt) 1990-02-06

Family

ID=6357315

Family Applications (1)

Application Number Title Priority Date Filing Date
BR898903080A BR8903080A (pt) 1988-06-25 1989-06-23 Material de registro polimerizavel por radiacao e processo para preparacao de registros em relevo

Country Status (9)

Country Link
EP (1) EP0351555B1 (pt)
JP (1) JPH0264541A (pt)
KR (1) KR910001452A (pt)
AT (1) ATE122160T1 (pt)
AU (1) AU3666089A (pt)
BR (1) BR8903080A (pt)
DE (2) DE3821583A1 (pt)
FI (1) FI893070A (pt)
ZA (1) ZA894592B (pt)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3274156D1 (en) * 1981-12-10 1986-12-11 Toray Industries Photosensitive polymer composition
SU1045214A1 (ru) * 1982-07-21 1983-09-30 Украинский Полиграфический Институт Им.И.Федорова Состав дл обработки фотополимерной печатной формы
JP2697738B2 (ja) * 1988-02-26 1998-01-14 マックダーミッド イメージング テクノロジー，インコーポレイテッド 光重合可能な組成物

Also Published As

Publication number Publication date
EP0351555A2 (de) 1990-01-24
EP0351555B1 (de) 1995-05-03
FI893070A0 (fi) 1989-06-22
KR910001452A (ko) 1991-01-30
AU3666089A (en) 1990-01-04
FI893070A (fi) 1989-12-26
ATE122160T1 (de) 1995-05-15
ZA894592B (en) 1990-02-28
EP0351555A3 (en) 1990-04-04
DE58909210D1 (de) 1995-06-08
JPH0264541A (ja) 1990-03-05
DE3821583A1 (de) 1989-12-28

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