BR7703742A - Processo para registro de radiacao laser - Google Patents

Processo para registro de radiacao laser

Info

Publication number
BR7703742A
BR7703742A BR7703742A BR7703742A BR7703742A BR 7703742 A BR7703742 A BR 7703742A BR 7703742 A BR7703742 A BR 7703742A BR 7703742 A BR7703742 A BR 7703742A BR 7703742 A BR7703742 A BR 7703742A
Authority
BR
Brazil
Prior art keywords
registration process
laser radiation
radiation registration
laser
registration
Prior art date
Application number
BR7703742A
Other languages
English (en)
Portuguese (pt)
Inventor
D Seeley
R Faust
S Liu
W Jeffers
Original Assignee
Hoechst Co American
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Co American filed Critical Hoechst Co American
Publication of BR7703742A publication Critical patent/BR7703742A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Dot-Matrix Printers And Others (AREA)
  • Laser Beam Printer (AREA)
  • Exposure Or Original Feeding In Electrophotography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
BR7703742A 1976-06-10 1977-06-08 Processo para registro de radiacao laser BR7703742A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US69469376A 1976-06-10 1976-06-10

Publications (1)

Publication Number Publication Date
BR7703742A true BR7703742A (pt) 1978-04-04

Family

ID=24789881

Family Applications (1)

Application Number Title Priority Date Filing Date
BR7703742A BR7703742A (pt) 1976-06-10 1977-06-08 Processo para registro de radiacao laser

Country Status (8)

Country Link
JP (1) JPS52151024A (nl)
BE (1) BE855507A (nl)
BR (1) BR7703742A (nl)
CA (1) CA1094860A (nl)
DE (1) DE2725309A1 (nl)
FR (1) FR2354575A1 (nl)
NL (1) NL7706254A (nl)
SE (1) SE7706658L (nl)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4419675A (en) * 1979-05-24 1983-12-06 American Hoechst Corporation Imaging system and method for printed circuit artwork and the like
EP0089506A3 (de) * 1982-03-18 1984-04-11 American Hoechst Corporation Lichtempfindliches Gemisch auf Basis von Diazoniumsalz-Polykondensationsprodukten und daraus hergestelltes lichtempfindliches Aufzeichnungsmaterial
EP0188205B1 (de) * 1985-01-15 1988-06-22 Ciba-Geigy Ag Polyamidester-Fotoresist-Formulierungen gesteigerter Empfindlichkeit
DE3606266A1 (de) * 1986-02-27 1987-09-03 Basf Ag Lichtempfindliches aufzeichnungselement
DE3733874A1 (de) * 1987-10-07 1989-04-27 Hell Rudolf Dr Ing Gmbh Druckformherstellung mittels auswaschbarem bildtraeger
US4940651A (en) * 1988-12-30 1990-07-10 International Business Machines Corporation Method for patterning cationic curable photoresist
US5814431A (en) 1996-01-10 1998-09-29 Mitsubishi Chemical Corporation Photosensitive composition and lithographic printing plate
JP3814961B2 (ja) 1996-08-06 2006-08-30 三菱化学株式会社 ポジ型感光性印刷版

Also Published As

Publication number Publication date
DE2725309A1 (de) 1977-12-22
SE7706658L (sv) 1977-12-11
FR2354575B1 (nl) 1980-02-15
JPS52151024A (en) 1977-12-15
CA1094860A (en) 1981-02-03
NL7706254A (nl) 1977-12-13
BE855507A (fr) 1977-12-08
FR2354575A1 (fr) 1978-01-06

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